JPH0257156B2 - - Google Patents
Info
- Publication number
- JPH0257156B2 JPH0257156B2 JP26164485A JP26164485A JPH0257156B2 JP H0257156 B2 JPH0257156 B2 JP H0257156B2 JP 26164485 A JP26164485 A JP 26164485A JP 26164485 A JP26164485 A JP 26164485A JP H0257156 B2 JPH0257156 B2 JP H0257156B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode
- dust
- charge
- charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 36
- 239000000428 dust Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 4
- 238000012986 modification Methods 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 238000000427 thin-film deposition Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims 4
- 238000000407 epitaxy Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26164485A JPS62124284A (ja) | 1985-11-21 | 1985-11-21 | 除塵方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26164485A JPS62124284A (ja) | 1985-11-21 | 1985-11-21 | 除塵方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62124284A JPS62124284A (ja) | 1987-06-05 |
| JPH0257156B2 true JPH0257156B2 (ko) | 1990-12-04 |
Family
ID=17364761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26164485A Granted JPS62124284A (ja) | 1985-11-21 | 1985-11-21 | 除塵方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62124284A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2701363B2 (ja) * | 1988-09-12 | 1998-01-21 | 三菱電機株式会社 | 半導体装置の製造方法及びそれに使用する薄膜形成装置 |
| KR100219758B1 (ko) * | 1992-06-29 | 1999-09-01 | 구라우치 노리타카 | 알루미늄 합금제 오일펌프 |
| GB0128408D0 (en) * | 2001-11-27 | 2002-01-16 | Univ Southampton | Method of charging and distributing particles |
-
1985
- 1985-11-21 JP JP26164485A patent/JPS62124284A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62124284A (ja) | 1987-06-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |