JPH0256656B2 - - Google Patents

Info

Publication number
JPH0256656B2
JPH0256656B2 JP1672083A JP1672083A JPH0256656B2 JP H0256656 B2 JPH0256656 B2 JP H0256656B2 JP 1672083 A JP1672083 A JP 1672083A JP 1672083 A JP1672083 A JP 1672083A JP H0256656 B2 JPH0256656 B2 JP H0256656B2
Authority
JP
Japan
Prior art keywords
protective layer
liquid
photoresist
substrate
photoresist substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1672083A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59142551A (ja
Inventor
Reiji Muto
Yoshio Nakano
Masao Tomita
Yukio Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP1672083A priority Critical patent/JPS59142551A/ja
Publication of JPS59142551A publication Critical patent/JPS59142551A/ja
Publication of JPH0256656B2 publication Critical patent/JPH0256656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1672083A 1983-02-02 1983-02-02 フオトレジスト基板の処理装置 Granted JPS59142551A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1672083A JPS59142551A (ja) 1983-02-02 1983-02-02 フオトレジスト基板の処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1672083A JPS59142551A (ja) 1983-02-02 1983-02-02 フオトレジスト基板の処理装置

Publications (2)

Publication Number Publication Date
JPS59142551A JPS59142551A (ja) 1984-08-15
JPH0256656B2 true JPH0256656B2 (cs) 1990-11-30

Family

ID=11924096

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1672083A Granted JPS59142551A (ja) 1983-02-02 1983-02-02 フオトレジスト基板の処理装置

Country Status (1)

Country Link
JP (1) JPS59142551A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021864A (ja) * 1988-06-10 1990-01-08 Fuji Photo Film Co Ltd 感光性平版印刷版処理装置
EP0747773A4 (en) * 1994-12-27 1997-06-18 Mitsubishi Chem Corp Method and apparatus for treating developer for pigment-containing nonsilver photosensitive material, and automatic developing machine

Also Published As

Publication number Publication date
JPS59142551A (ja) 1984-08-15

Similar Documents

Publication Publication Date Title
EP1952427B2 (de) Vorrichtung und verfahren für nasschemisches prozessieren flacher, dünner substrate im durchlaufverfahren
US4922938A (en) Apparatus for single side spray processing of printed circuit boards
JP6329342B2 (ja) 洗浄方法及び洗浄装置
JPH0256656B2 (cs)
JPS6331120B2 (cs)
JP5957650B2 (ja) 除染方法およびドライアイス打ち込みシステム並びに除染システム
JP3732435B2 (ja) 洗浄装置
JP2004296810A (ja) 基板のエッチング装置及びエッチング方法
JPH0314670Y2 (cs)
JPH0331961Y2 (cs)
JP2003024865A (ja) フィルム基板の湿式処理方法及び湿式処理装置
KR101882916B1 (ko) 마스크 제조 시스템
JP2606150B2 (ja) ウエット処理装置
KR101860413B1 (ko) 마스크 제조 시스템
JPH05228450A (ja) 枠の洗浄装置
JP3113192B2 (ja) 液晶用基板の液体噴射装置
WO2005013342A1 (ja) レジスト除去装置
JP3595606B2 (ja) 基板表面処理装置
JPH07212011A (ja) プリント回路基板洗浄装置
KR101891206B1 (ko) 마스크 제조용 롤 시트 가공장치 및 그를 구비하는 마스크 제조 시스템
JPH02283012A (ja) 有機被膜除去装置
KR20250062832A (ko) 마스크 제조 시스템
JPH0662533U (ja) 剥膜装置
TW548527B (en) Photoresist stripper device and the method used
JPH0992960A (ja) レジスト膜の剥離装置