JPH0254373B2 - - Google Patents
Info
- Publication number
- JPH0254373B2 JPH0254373B2 JP58104904A JP10490483A JPH0254373B2 JP H0254373 B2 JPH0254373 B2 JP H0254373B2 JP 58104904 A JP58104904 A JP 58104904A JP 10490483 A JP10490483 A JP 10490483A JP H0254373 B2 JPH0254373 B2 JP H0254373B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing
- amount
- plasma processing
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Plasma Technology (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58104904A JPS59230033A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
ZA844315A ZA844315B (en) | 1983-06-14 | 1984-06-07 | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
AU29217/84A AU544534B2 (en) | 1983-06-14 | 1984-06-08 | Plasma coating |
US06/619,174 US4576692A (en) | 1983-06-14 | 1984-06-11 | Method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
DE8484106753T DE3463001D1 (en) | 1983-06-14 | 1984-06-13 | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
EP84106753A EP0129199B1 (en) | 1983-06-14 | 1984-06-13 | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58104904A JPS59230033A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59230033A JPS59230033A (ja) | 1984-12-24 |
JPH0254373B2 true JPH0254373B2 (enrdf_load_stackoverflow) | 1990-11-21 |
Family
ID=14393114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58104904A Granted JPS59230033A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS59230033A (enrdf_load_stackoverflow) |
ZA (1) | ZA844315B (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230034A (ja) * | 1983-06-14 | 1984-12-24 | Toyota Motor Corp | プラズマ処理方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230034A (ja) * | 1983-06-14 | 1984-12-24 | Toyota Motor Corp | プラズマ処理方法 |
-
1983
- 1983-06-14 JP JP58104904A patent/JPS59230033A/ja active Granted
-
1984
- 1984-06-07 ZA ZA844315A patent/ZA844315B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
JPS59230033A (ja) | 1984-12-24 |
ZA844315B (en) | 1985-02-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0129199B1 (en) | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus | |
JP4393844B2 (ja) | プラズマ成膜装置及びプラズマ成膜方法 | |
EP1506063B1 (en) | Atomisation of a precursor into an excitation medium for coating a remote substrate | |
US20050227018A1 (en) | Application of a coating forming material onto at least one substrate | |
JPH1060660A (ja) | 中空体の内側被覆方法及び装置 | |
JP2001203097A (ja) | プラズマ密度計測装置および方法並びにこれを利用したプラズマ処理装置および方法 | |
CN107533947A (zh) | 具有固态发生器的微波等离子体处理容器设备和调节方法 | |
JPH0773997A (ja) | プラズマcvd装置と該装置を用いたcvd処理方法及び該装置内の洗浄方法 | |
EP0120307A2 (en) | Apparatus and method for plasma treatment of resin material | |
JPH09192479A (ja) | プラズマ処理装置および方法 | |
JPH0254373B2 (enrdf_load_stackoverflow) | ||
JPH0254374B2 (enrdf_load_stackoverflow) | ||
JPH0254375B2 (enrdf_load_stackoverflow) | ||
US5716877A (en) | Process gas delivery system | |
JPS62228482A (ja) | 低温プラズマ処理装置 | |
JPH0129141B2 (enrdf_load_stackoverflow) | ||
EP0152511B1 (en) | Apparatus and method for plasma treatment of resin material | |
JPH0496B2 (enrdf_load_stackoverflow) | ||
JP3092559B2 (ja) | プラズマ処理装置及びこの装置のガスの導入方法 | |
JPH09272978A (ja) | プラズマcvd法による薄膜の形成方法 | |
JP2003218035A (ja) | 放電プラズマ処理方法 | |
JPH0495B2 (enrdf_load_stackoverflow) | ||
JPS59103341A (ja) | プラズマ処理装置 | |
JPS608049A (ja) | プラズマ処理方法 | |
JPH0521988B2 (enrdf_load_stackoverflow) |