JPH0129141B2 - - Google Patents

Info

Publication number
JPH0129141B2
JPH0129141B2 JP58100277A JP10027783A JPH0129141B2 JP H0129141 B2 JPH0129141 B2 JP H0129141B2 JP 58100277 A JP58100277 A JP 58100277A JP 10027783 A JP10027783 A JP 10027783A JP H0129141 B2 JPH0129141 B2 JP H0129141B2
Authority
JP
Japan
Prior art keywords
plasma
microwave
discharge
tube
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58100277A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59226027A (ja
Inventor
Takaoki Kaneko
Kenji Fukuda
Yoshinobu Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toyota Motor Corp
Original Assignee
Toshiba Corp
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toyota Motor Corp filed Critical Toshiba Corp
Priority to JP10027783A priority Critical patent/JPS59226027A/ja
Publication of JPS59226027A publication Critical patent/JPS59226027A/ja
Publication of JPH0129141B2 publication Critical patent/JPH0129141B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP10027783A 1983-06-07 1983-06-07 プラズマ処理方法 Granted JPS59226027A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10027783A JPS59226027A (ja) 1983-06-07 1983-06-07 プラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10027783A JPS59226027A (ja) 1983-06-07 1983-06-07 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JPS59226027A JPS59226027A (ja) 1984-12-19
JPH0129141B2 true JPH0129141B2 (enrdf_load_stackoverflow) 1989-06-08

Family

ID=14269702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10027783A Granted JPS59226027A (ja) 1983-06-07 1983-06-07 プラズマ処理方法

Country Status (1)

Country Link
JP (1) JPS59226027A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0831417B2 (ja) * 1988-12-02 1996-03-27 工業技術院長 プラズマ加工堆積装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5924132U (ja) * 1982-08-09 1984-02-15 株式会社東芝 マイクロ波プラズマ処理装置

Also Published As

Publication number Publication date
JPS59226027A (ja) 1984-12-19

Similar Documents

Publication Publication Date Title
US5133826A (en) Electron cyclotron resonance plasma source
US5203960A (en) Method of operation of electron cyclotron resonance plasma source
KR100291152B1 (ko) 플라즈마발생장치
KR960014434B1 (ko) 플라즈마 처리장치
US4897285A (en) Method and apparatus for PCVD internal coating a metallic pipe by means of a microwave plasma
US4365587A (en) Apparatus for forming organic polymer thin films utilizing microwave induced plasmas
US5489362A (en) Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy
KR100443471B1 (ko) 플라즈마 처리 방법
JPH0129141B2 (enrdf_load_stackoverflow)
US20020179015A1 (en) Plasma etching system
JPH09306695A (ja) プラズマ発生装置およびこれを用いた表面処理装置
JPH07135094A (ja) マイクロ波誘導プラズマへの原料供給方法及び装置
JPH09169595A (ja) 薄膜形成方法
JPH0496B2 (enrdf_load_stackoverflow)
JPH0254375B2 (enrdf_load_stackoverflow)
EP0152511B1 (en) Apparatus and method for plasma treatment of resin material
JPS59103340A (ja) プラズマ処理装置
JPS62291922A (ja) プラズマ処理装置
JPS59103341A (ja) プラズマ処理装置
JP2697464B2 (ja) マイクロ波プラズマ処理装置
JPS59103331A (ja) プラズマ処理装置
JPH02207528A (ja) プラズマ化学反応成膜装置及びその方法
JPS59230034A (ja) プラズマ処理方法
JPS6377121A (ja) プラズマ処理装置
JP4005244B2 (ja) マイクロ波プラズマ処理装置