JPS6139730B2 - - Google Patents
Info
- Publication number
- JPS6139730B2 JPS6139730B2 JP2477777A JP2477777A JPS6139730B2 JP S6139730 B2 JPS6139730 B2 JP S6139730B2 JP 2477777 A JP2477777 A JP 2477777A JP 2477777 A JP2477777 A JP 2477777A JP S6139730 B2 JPS6139730 B2 JP S6139730B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- coaxial
- discharge
- tube
- discharge tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000032258 transport Effects 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 238000001816 cooling Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 239000010453 quartz Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000010355 oscillation Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- -1 fluorine ions Chemical class 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2477777A JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2477777A JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17294783A Division JPS59103340A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
| JP17294683A Division JPS59103331A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
| JP17294883A Division JPS59103341A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53110378A JPS53110378A (en) | 1978-09-27 |
| JPS6139730B2 true JPS6139730B2 (enrdf_load_stackoverflow) | 1986-09-05 |
Family
ID=12147595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2477777A Granted JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53110378A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5440078A (en) * | 1977-09-06 | 1979-03-28 | Fujitsu Ltd | Ion milling device |
| JPS56155535A (en) * | 1980-05-02 | 1981-12-01 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma |
| US4515107A (en) * | 1982-11-12 | 1985-05-07 | Sovonics Solar Systems | Apparatus for the manufacture of photovoltaic devices |
| JP5307383B2 (ja) * | 2007-11-26 | 2013-10-02 | 株式会社アルバック | 真空処理装置 |
| CN117105521B (zh) * | 2023-10-25 | 2024-01-19 | 武汉市飞瓴光电科技有限公司 | 一种制备掺杂二氧化硅材料的装置及方法 |
-
1977
- 1977-03-09 JP JP2477777A patent/JPS53110378A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53110378A (en) | 1978-09-27 |
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