JPS5440078A - Ion milling device - Google Patents

Ion milling device

Info

Publication number
JPS5440078A
JPS5440078A JP10626877A JP10626877A JPS5440078A JP S5440078 A JPS5440078 A JP S5440078A JP 10626877 A JP10626877 A JP 10626877A JP 10626877 A JP10626877 A JP 10626877A JP S5440078 A JPS5440078 A JP S5440078A
Authority
JP
Japan
Prior art keywords
ion milling
milling device
wafer
irradiating
distributing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10626877A
Other languages
Japanese (ja)
Other versions
JPS5615570B2 (en
Inventor
Shunsuke Matsuyama
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10626877A priority Critical patent/JPS5440078A/en
Publication of JPS5440078A publication Critical patent/JPS5440078A/en
Publication of JPS5615570B2 publication Critical patent/JPS5615570B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To ensure a high-quality etching by distributing the wafer onto the rotary plate and then irradiating the wafer uniformly with a small beam diameter.
JP10626877A 1977-09-06 1977-09-06 Ion milling device Granted JPS5440078A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10626877A JPS5440078A (en) 1977-09-06 1977-09-06 Ion milling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10626877A JPS5440078A (en) 1977-09-06 1977-09-06 Ion milling device

Publications (2)

Publication Number Publication Date
JPS5440078A true JPS5440078A (en) 1979-03-28
JPS5615570B2 JPS5615570B2 (en) 1981-04-10

Family

ID=14429327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10626877A Granted JPS5440078A (en) 1977-09-06 1977-09-06 Ion milling device

Country Status (1)

Country Link
JP (1) JPS5440078A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS474327U (en) * 1971-02-03 1972-09-09
JPS53110378A (en) * 1977-03-09 1978-09-27 Hitachi Ltd Plasma carrying device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS474327U (en) * 1971-02-03 1972-09-09
JPS53110378A (en) * 1977-03-09 1978-09-27 Hitachi Ltd Plasma carrying device

Also Published As

Publication number Publication date
JPS5615570B2 (en) 1981-04-10

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