JPS5239584A - Vacuum evaporation apparatus - Google Patents

Vacuum evaporation apparatus

Info

Publication number
JPS5239584A
JPS5239584A JP11476175A JP11476175A JPS5239584A JP S5239584 A JPS5239584 A JP S5239584A JP 11476175 A JP11476175 A JP 11476175A JP 11476175 A JP11476175 A JP 11476175A JP S5239584 A JPS5239584 A JP S5239584A
Authority
JP
Japan
Prior art keywords
vacuum evaporation
evaporation apparatus
priced
low
shutter mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11476175A
Other languages
Japanese (ja)
Inventor
Hideo Matsuzaki
Kazuo Umeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11476175A priority Critical patent/JPS5239584A/en
Publication of JPS5239584A publication Critical patent/JPS5239584A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:Simple and low-priced shutter mechanism for multi-source vacuum evaporation.
JP11476175A 1975-09-25 1975-09-25 Vacuum evaporation apparatus Pending JPS5239584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11476175A JPS5239584A (en) 1975-09-25 1975-09-25 Vacuum evaporation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11476175A JPS5239584A (en) 1975-09-25 1975-09-25 Vacuum evaporation apparatus

Publications (1)

Publication Number Publication Date
JPS5239584A true JPS5239584A (en) 1977-03-26

Family

ID=14646012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11476175A Pending JPS5239584A (en) 1975-09-25 1975-09-25 Vacuum evaporation apparatus

Country Status (1)

Country Link
JP (1) JPS5239584A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282767U (en) * 1988-12-12 1990-06-26
JPH02213466A (en) * 1989-02-15 1990-08-24 Mitsubishi Electric Corp Vapor deposition device
JPH0390121A (en) * 1989-09-04 1991-04-16 Mitsubishi Electric Home Appliance Co Ltd Electrical cleaner
JP2007169691A (en) * 2005-12-20 2007-07-05 Tokki Corp Vapor deposition apparatus, and vapor deposition method of multi-component evaporation source
JP2009019233A (en) * 2007-07-11 2009-01-29 Mitsubishi Chemicals Corp Method for manufacturing thin film or powder, apparatus for manufacturing thin film or powder, method for manufacturing electrode material for non-aqueous electrolyte secondary battery, electrode for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery
JP2009221595A (en) * 2008-02-21 2009-10-01 Canon Anelva Corp Sputtering apparatus and method for controlling the same
JP2011001597A (en) * 2009-06-18 2011-01-06 Ulvac Japan Ltd Sputtering system and sputtering method
CN103993269A (en) * 2014-05-19 2014-08-20 上海和辉光电有限公司 Coating device and coating method
JP2021134405A (en) * 2020-02-28 2021-09-13 株式会社アルバック Vapor deposition apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282767U (en) * 1988-12-12 1990-06-26
JPH02213466A (en) * 1989-02-15 1990-08-24 Mitsubishi Electric Corp Vapor deposition device
JPH0390121A (en) * 1989-09-04 1991-04-16 Mitsubishi Electric Home Appliance Co Ltd Electrical cleaner
JP2007169691A (en) * 2005-12-20 2007-07-05 Tokki Corp Vapor deposition apparatus, and vapor deposition method of multi-component evaporation source
JP4703392B2 (en) * 2005-12-20 2011-06-15 トッキ株式会社 Vapor deposition equipment
JP2009019233A (en) * 2007-07-11 2009-01-29 Mitsubishi Chemicals Corp Method for manufacturing thin film or powder, apparatus for manufacturing thin film or powder, method for manufacturing electrode material for non-aqueous electrolyte secondary battery, electrode for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery
JP2009221595A (en) * 2008-02-21 2009-10-01 Canon Anelva Corp Sputtering apparatus and method for controlling the same
JP2011001597A (en) * 2009-06-18 2011-01-06 Ulvac Japan Ltd Sputtering system and sputtering method
CN103993269A (en) * 2014-05-19 2014-08-20 上海和辉光电有限公司 Coating device and coating method
JP2021134405A (en) * 2020-02-28 2021-09-13 株式会社アルバック Vapor deposition apparatus

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