JPH0254375B2 - - Google Patents
Info
- Publication number
- JPH0254375B2 JPH0254375B2 JP58104906A JP10490683A JPH0254375B2 JP H0254375 B2 JPH0254375 B2 JP H0254375B2 JP 58104906 A JP58104906 A JP 58104906A JP 10490683 A JP10490683 A JP 10490683A JP H0254375 B2 JPH0254375 B2 JP H0254375B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing
- plasma processing
- gas
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012545 processing Methods 0.000 claims description 89
- 238000000034 method Methods 0.000 claims description 12
- 230000010355 oscillation Effects 0.000 claims description 12
- 238000003672 processing method Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 17
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 10
- 229910001882 dioxygen Inorganic materials 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- -1 polypropylene Polymers 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000012806 monitoring device Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104906A JPS59230035A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
| AU29217/84A AU544534B2 (en) | 1983-06-14 | 1984-06-08 | Plasma coating |
| US06/619,174 US4576692A (en) | 1983-06-14 | 1984-06-11 | Method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
| DE8484106753T DE3463001D1 (en) | 1983-06-14 | 1984-06-13 | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
| EP84106753A EP0129199B1 (en) | 1983-06-14 | 1984-06-13 | A method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104906A JPS59230035A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59230035A JPS59230035A (ja) | 1984-12-24 |
| JPH0254375B2 true JPH0254375B2 (enrdf_load_stackoverflow) | 1990-11-21 |
Family
ID=14393163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58104906A Granted JPS59230035A (ja) | 1983-06-14 | 1983-06-14 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59230035A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0777609B2 (ja) * | 1986-01-08 | 1995-08-23 | 株式会社日立製作所 | 放電洗浄装置 |
-
1983
- 1983-06-14 JP JP58104906A patent/JPS59230035A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59230035A (ja) | 1984-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4576692A (en) | Method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus | |
| JP4393844B2 (ja) | プラズマ成膜装置及びプラズマ成膜方法 | |
| KR960014434B1 (ko) | 플라즈마 처리장치 | |
| US4365587A (en) | Apparatus for forming organic polymer thin films utilizing microwave induced plasmas | |
| JPH1060660A (ja) | 中空体の内側被覆方法及び装置 | |
| US20050227018A1 (en) | Application of a coating forming material onto at least one substrate | |
| CN107533947A (zh) | 具有固态发生器的微波等离子体处理容器设备和调节方法 | |
| EP0120307A2 (en) | Apparatus and method for plasma treatment of resin material | |
| JPH0254375B2 (enrdf_load_stackoverflow) | ||
| JPH0254374B2 (enrdf_load_stackoverflow) | ||
| JPH0254373B2 (enrdf_load_stackoverflow) | ||
| JPH0129141B2 (enrdf_load_stackoverflow) | ||
| US4690097A (en) | Apparatus and method for plasma treatment of resin material | |
| US5716877A (en) | Process gas delivery system | |
| EP0152511B1 (en) | Apparatus and method for plasma treatment of resin material | |
| JPS62228482A (ja) | 低温プラズマ処理装置 | |
| JPH0496B2 (enrdf_load_stackoverflow) | ||
| JP3372911B2 (ja) | 電子ビーム描画装置の鏡筒内洗浄装置 | |
| US6764550B2 (en) | Apparatus for evaluating plasma polymerized polymer layer using UV spectrometer | |
| US4786522A (en) | Method for plasma treatment of resin material | |
| JPH0441172Y2 (enrdf_load_stackoverflow) | ||
| JPS59103341A (ja) | プラズマ処理装置 | |
| JPH0495B2 (enrdf_load_stackoverflow) | ||
| JPS608049A (ja) | プラズマ処理方法 | |
| JP2003218035A (ja) | 放電プラズマ処理方法 |