JPH0252342U - - Google Patents

Info

Publication number
JPH0252342U
JPH0252342U JP12947388U JP12947388U JPH0252342U JP H0252342 U JPH0252342 U JP H0252342U JP 12947388 U JP12947388 U JP 12947388U JP 12947388 U JP12947388 U JP 12947388U JP H0252342 U JPH0252342 U JP H0252342U
Authority
JP
Japan
Prior art keywords
epitaxial wafer
probe
metal stage
metal
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12947388U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12947388U priority Critical patent/JPH0252342U/ja
Publication of JPH0252342U publication Critical patent/JPH0252342U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【図面の簡単な説明】
第１図はこの考案によるエピタキシヤルウエハ
の不純物濃度評価装置の一実施例の構成を示す模
式図、第２図は従来のエピタキシヤルウエハの不
純物濃度評価装置の構成例を示す模式図である。 図において、１００は供試エピタキシヤルウエ
ハ、１０１は基板、１０２は低不純物濃度層、２
０１は金属ステージ、２０２はプローブ、２０３
は絶縁層、３００は容量測定器である。なお、図
中、同一符号は同一、又は相当部分を示す。

Claims (1)

    【実用新案登録請求の範囲】
  1. その表面に厚さが１μｍ以下で均一な絶縁層を
    有する円柱形の金属よりなるプローブと、金属ス
    テージと、電圧バイアスを変化できる容量測定器
    とを備え、上記プローブが金属ステージに対し平
    行に配置され、その間隔が自由に調整できる機構
    を持ち、かつ金属ステージとプローブとの間に供
    試エピタキシヤルウエハが挿入できるように構成
    したことを特徴とするエピタキシヤルウエハの不
    純物濃度評価装置。
JP12947388U 1988-09-30 1988-09-30 Pending JPH0252342U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12947388U JPH0252342U (ja) 1988-09-30 1988-09-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12947388U JPH0252342U (ja) 1988-09-30 1988-09-30

Publications (1)

Publication Number Publication Date
JPH0252342U true JPH0252342U (ja) 1990-04-16

Family

ID=31383781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12947388U Pending JPH0252342U (ja) 1988-09-30 1988-09-30

Country Status (1)

Country Link
JP (1) JPH0252342U (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146831A (ja) * 2002-10-22 2004-05-20 Solid State Measurements Inc 半導体ウェハの荷電キャリア寿命測定方法及び測定装置
JP2004274036A (ja) * 2003-02-10 2004-09-30 Solid State Measurements Inc 半導体ウエハの電気特性を測定する装置と方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146831A (ja) * 2002-10-22 2004-05-20 Solid State Measurements Inc 半導体ウェハの荷電キャリア寿命測定方法及び測定装置
JP2004274036A (ja) * 2003-02-10 2004-09-30 Solid State Measurements Inc 半導体ウエハの電気特性を測定する装置と方法

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