JPH0251852B2 - - Google Patents
Info
- Publication number
- JPH0251852B2 JPH0251852B2 JP60044676A JP4467685A JPH0251852B2 JP H0251852 B2 JPH0251852 B2 JP H0251852B2 JP 60044676 A JP60044676 A JP 60044676A JP 4467685 A JP4467685 A JP 4467685A JP H0251852 B2 JPH0251852 B2 JP H0251852B2
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- tank
- material tank
- supply device
- auxiliary container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4467685A JPS61205629A (ja) | 1985-03-08 | 1985-03-08 | 原料供給装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4467685A JPS61205629A (ja) | 1985-03-08 | 1985-03-08 | 原料供給装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61205629A JPS61205629A (ja) | 1986-09-11 |
JPH0251852B2 true JPH0251852B2 (enrdf_load_stackoverflow) | 1990-11-08 |
Family
ID=12698043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4467685A Granted JPS61205629A (ja) | 1985-03-08 | 1985-03-08 | 原料供給装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61205629A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7229792B2 (ja) | 2018-02-05 | 2023-02-28 | 株式会社フジクラ | 多孔質ガラス微粒子体の製造方法、多孔質ガラス微粒子体の製造装置、およびガラス母材の製造方法 |
US11393703B2 (en) * | 2018-06-18 | 2022-07-19 | Applied Materials, Inc. | Apparatus and method for controlling a flow process material to a deposition chamber |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135146A (ja) * | 1982-02-03 | 1983-08-11 | Fujikura Ltd | 光フアイバ母材の製造方法 |
JPS605029A (ja) * | 1983-06-21 | 1985-01-11 | Agency Of Ind Science & Technol | 光学ガラス製造用気化原料供給方法 |
-
1985
- 1985-03-08 JP JP4467685A patent/JPS61205629A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61205629A (ja) | 1986-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR920009064B1 (ko) | 광학 예비 성형물 제조의 증기 이송 제어 방법 및 장치 | |
KR100265017B1 (ko) | 에피택셜 성장용 기체의 공급 방법 및 그의장치 | |
JPS61254242A (ja) | 原料供給装置 | |
JPH0251852B2 (enrdf_load_stackoverflow) | ||
JP5473421B2 (ja) | 液体原料のバブリング気化供給方法及び装置 | |
US20010000160A1 (en) | Method for treatment of semiconductor substrates | |
GB1385283A (en) | Method of vaporizing a liquid stream | |
JP2866374B1 (ja) | エピタキシャル成長用ガスの供給方法及びその装置 | |
KR890000171B1 (ko) | 입자층의 냉각 및 유동화 방법 | |
US4536227A (en) | Method of and apparatus for producing a controlled unsaturated vapor pressure of a volatile liquid in a heat treatment chamber | |
KR100378497B1 (ko) | 처리기용 가스 분배 시스템 및 반도체 기판의 처리 방법 | |
EP1057792B1 (en) | A process and apparatus for vaporizing a liquid glass precursor for the manufacture of optical fibre preforms | |
JPS63134531A (ja) | ガラス微粒子合成装置 | |
JPS62169410A (ja) | 気相成長装置 | |
JP3707104B2 (ja) | 原料供給装置及び原料供給方法 | |
JPH0212142B2 (enrdf_load_stackoverflow) | ||
JP2004338996A (ja) | 気体材料の供給法及び装置、並びにそれを用いたガラス微粒子堆積体及びガラス材料の製造法 | |
JP3063113B2 (ja) | 化学気相成長装置 | |
KR100282488B1 (ko) | 예열수단을 갖는 반도체장치 제조용 가스공급장치 | |
JPS6342733A (ja) | 吸熱反応装置 | |
JPH0688574B2 (ja) | 低温液化ガス流下装置 | |
JPH0636476Y2 (ja) | 有機金属供給用恒温槽 | |
JPS63151625A (ja) | ガラス原料ガス発生装置 | |
JPH07194961A (ja) | 原料供給装置 | |
JPH0834623A (ja) | シリカガラスの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |