JPH0247029U - - Google Patents
Info
- Publication number
- JPH0247029U JPH0247029U JP12564588U JP12564588U JPH0247029U JP H0247029 U JPH0247029 U JP H0247029U JP 12564588 U JP12564588 U JP 12564588U JP 12564588 U JP12564588 U JP 12564588U JP H0247029 U JPH0247029 U JP H0247029U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- opening
- support plate
- size
- cvd apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 18
- 239000010409 thin film Substances 0.000 claims 2
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988125645U JPH0622980Y2 (ja) | 1988-09-28 | 1988-09-28 | Cvd装置における基板支持装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988125645U JPH0622980Y2 (ja) | 1988-09-28 | 1988-09-28 | Cvd装置における基板支持装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0247029U true JPH0247029U (it) | 1990-03-30 |
JPH0622980Y2 JPH0622980Y2 (ja) | 1994-06-15 |
Family
ID=31376432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988125645U Expired - Fee Related JPH0622980Y2 (ja) | 1988-09-28 | 1988-09-28 | Cvd装置における基板支持装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0622980Y2 (it) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006118215A1 (ja) * | 2005-04-28 | 2006-11-09 | Hitachi Kokusai Electric Inc. | 基板処理装置および半導体デバイスの製造方法 |
WO2022137301A1 (ja) * | 2020-12-21 | 2022-06-30 | 株式会社Kokusai Electric | 基板処理装置、基板保持具、半導体装置の製造方法及びプログラム |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52139766U (it) * | 1976-04-16 | 1977-10-22 | ||
JPS5376396A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Base plate securing jig for liquid phase epitaxial growth |
JPS57164524A (en) * | 1981-04-02 | 1982-10-09 | Toshiba Corp | Vapor reaction for semiconductor wafer |
JPS58108735A (ja) * | 1981-12-23 | 1983-06-28 | Fujitsu Ltd | 縦型反応管用バスケツト |
JPS59117138U (ja) * | 1983-01-27 | 1984-08-07 | 日本電気ホームエレクトロニクス株式会社 | 半導体製造装置 |
JPS611017A (ja) * | 1984-06-13 | 1986-01-07 | Kokusai Electric Co Ltd | 半導体基板の熱処理装置 |
JPS6252929U (it) * | 1985-09-21 | 1987-04-02 | ||
JPS62142839U (it) * | 1986-03-04 | 1987-09-09 | ||
JPS62147332U (it) * | 1987-03-12 | 1987-09-17 | ||
JPH01168030A (ja) * | 1987-12-24 | 1989-07-03 | Touyoko Kagaku Kk | 減圧気相成長方法 |
-
1988
- 1988-09-28 JP JP1988125645U patent/JPH0622980Y2/ja not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52139766U (it) * | 1976-04-16 | 1977-10-22 | ||
JPS5376396A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Base plate securing jig for liquid phase epitaxial growth |
JPS57164524A (en) * | 1981-04-02 | 1982-10-09 | Toshiba Corp | Vapor reaction for semiconductor wafer |
JPS58108735A (ja) * | 1981-12-23 | 1983-06-28 | Fujitsu Ltd | 縦型反応管用バスケツト |
JPS59117138U (ja) * | 1983-01-27 | 1984-08-07 | 日本電気ホームエレクトロニクス株式会社 | 半導体製造装置 |
JPS611017A (ja) * | 1984-06-13 | 1986-01-07 | Kokusai Electric Co Ltd | 半導体基板の熱処理装置 |
JPS6252929U (it) * | 1985-09-21 | 1987-04-02 | ||
JPS62142839U (it) * | 1986-03-04 | 1987-09-09 | ||
JPS62147332U (it) * | 1987-03-12 | 1987-09-17 | ||
JPH01168030A (ja) * | 1987-12-24 | 1989-07-03 | Touyoko Kagaku Kk | 減圧気相成長方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006118215A1 (ja) * | 2005-04-28 | 2006-11-09 | Hitachi Kokusai Electric Inc. | 基板処理装置および半導体デバイスの製造方法 |
JPWO2006118215A1 (ja) * | 2005-04-28 | 2008-12-18 | 株式会社日立国際電気 | 基板処理装置および半導体デバイスの製造方法 |
WO2022137301A1 (ja) * | 2020-12-21 | 2022-06-30 | 株式会社Kokusai Electric | 基板処理装置、基板保持具、半導体装置の製造方法及びプログラム |
Also Published As
Publication number | Publication date |
---|---|
JPH0622980Y2 (ja) | 1994-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |