JPH0418428U - - Google Patents
Info
- Publication number
- JPH0418428U JPH0418428U JP5834990U JP5834990U JPH0418428U JP H0418428 U JPH0418428 U JP H0418428U JP 5834990 U JP5834990 U JP 5834990U JP 5834990 U JP5834990 U JP 5834990U JP H0418428 U JPH0418428 U JP H0418428U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- wafer
- introduction nozzle
- cvd apparatus
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 8
- 238000001816 cooling Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 2
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5834990U JPH0418428U (it) | 1990-06-01 | 1990-06-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5834990U JPH0418428U (it) | 1990-06-01 | 1990-06-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0418428U true JPH0418428U (it) | 1992-02-17 |
Family
ID=31583880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5834990U Pending JPH0418428U (it) | 1990-06-01 | 1990-06-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0418428U (it) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936050A (ja) * | 1995-07-25 | 1997-02-07 | Mitsubishi Electric Corp | 常圧cvd装置 |
-
1990
- 1990-06-01 JP JP5834990U patent/JPH0418428U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936050A (ja) * | 1995-07-25 | 1997-02-07 | Mitsubishi Electric Corp | 常圧cvd装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2003517198A5 (it) | ||
US5985089A (en) | Plasma etch system | |
JPH0418428U (it) | ||
JP2792886B2 (ja) | 化学気相成長装置 | |
JPH0460552U (it) | ||
JP2003188078A5 (it) | ||
JPH0521866Y2 (it) | ||
JPH01169028U (it) | ||
JPH0356129U (it) | ||
JPS62182540U (it) | ||
JPH01106564U (it) | ||
JPH0374663U (it) | ||
JPH0461117A (ja) | 枚葉式cvd装置 | |
JPH0247029U (it) | ||
JPS6165742U (it) | ||
JPH08107082A (ja) | 縦型熱処理装置 | |
JPH02131550U (it) | ||
JPH0666266B2 (ja) | バレル型気相成長装置 | |
JPH0330260U (it) | ||
JPH0662534U (ja) | 化学気相成長装置 | |
JPH0288232U (it) | ||
JPH02106460U (it) | ||
JPH0356130U (it) | ||
JPS6416633U (it) | ||
JPS63164220U (it) |