JPH0245628U - - Google Patents

Info

Publication number
JPH0245628U
JPH0245628U JP12498288U JP12498288U JPH0245628U JP H0245628 U JPH0245628 U JP H0245628U JP 12498288 U JP12498288 U JP 12498288U JP 12498288 U JP12498288 U JP 12498288U JP H0245628 U JPH0245628 U JP H0245628U
Authority
JP
Japan
Prior art keywords
gas injection
gas
chamber
electrode
large number
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12498288U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12498288U priority Critical patent/JPH0245628U/ja
Publication of JPH0245628U publication Critical patent/JPH0245628U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12498288U 1988-09-22 1988-09-22 Pending JPH0245628U (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12498288U JPH0245628U (OSRAM) 1988-09-22 1988-09-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12498288U JPH0245628U (OSRAM) 1988-09-22 1988-09-22

Publications (1)

Publication Number Publication Date
JPH0245628U true JPH0245628U (OSRAM) 1990-03-29

Family

ID=31375184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12498288U Pending JPH0245628U (OSRAM) 1988-09-22 1988-09-22

Country Status (1)

Country Link
JP (1) JPH0245628U (OSRAM)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046029A (ja) * 1983-08-24 1985-03-12 Hitachi Ltd 半導体製造装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置
JPS62299031A (ja) * 1986-06-18 1987-12-26 Nec Corp 平行平板型エツチング装置の電極構造
JPS6317529A (ja) * 1986-07-09 1988-01-25 Toshiba Corp エツチング装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046029A (ja) * 1983-08-24 1985-03-12 Hitachi Ltd 半導体製造装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置
JPS62299031A (ja) * 1986-06-18 1987-12-26 Nec Corp 平行平板型エツチング装置の電極構造
JPS6317529A (ja) * 1986-07-09 1988-01-25 Toshiba Corp エツチング装置

Similar Documents

Publication Publication Date Title
JP2000331995A5 (OSRAM)
JPH0245628U (OSRAM)
JPH0245629U (OSRAM)
JPS61238981A (ja) 高周波エツチングの均一化方法
JPS6255564U (OSRAM)
JPH0242427U (OSRAM)
JPS59187136U (ja) 半導体薄膜形成装置
JPH0374663U (OSRAM)
JPH02294029A (ja) ドライエッチング装置
JPS6057936A (ja) 回転磁場を利用した多面柱状エツチング電極
JPH0244326U (OSRAM)
JPH0379422U (OSRAM)
JPS6346839U (OSRAM)
JPH0176033U (OSRAM)
JPH0247030U (OSRAM)
JPH0254228U (OSRAM)
JPS6351436U (OSRAM)
JPS60174242U (ja) リアクテイブイオンエツチング装置
JPH0254229U (OSRAM)
JPH0637052A (ja) 半導体加工装置
JPS59129872U (ja) プラズマエツチング装置
JPS61190132U (OSRAM)
KR20010036406A (ko) 건식각 장치
JPH0323631A (ja) 反応性ドライエッチング装置
JPS6274332U (OSRAM)