JPH0247030U - - Google Patents

Info

Publication number
JPH0247030U
JPH0247030U JP12585888U JP12585888U JPH0247030U JP H0247030 U JPH0247030 U JP H0247030U JP 12585888 U JP12585888 U JP 12585888U JP 12585888 U JP12585888 U JP 12585888U JP H0247030 U JPH0247030 U JP H0247030U
Authority
JP
Japan
Prior art keywords
cylindrical
electrode
processing apparatus
plasma processing
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12585888U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12585888U priority Critical patent/JPH0247030U/ja
Publication of JPH0247030U publication Critical patent/JPH0247030U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP12585888U 1988-09-26 1988-09-26 Pending JPH0247030U (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12585888U JPH0247030U (OSRAM) 1988-09-26 1988-09-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12585888U JPH0247030U (OSRAM) 1988-09-26 1988-09-26

Publications (1)

Publication Number Publication Date
JPH0247030U true JPH0247030U (OSRAM) 1990-03-30

Family

ID=31376835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12585888U Pending JPH0247030U (OSRAM) 1988-09-26 1988-09-26

Country Status (1)

Country Link
JP (1) JPH0247030U (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008181704A (ja) * 2007-01-23 2008-08-07 National Institute Of Advanced Industrial & Technology 高密度プラズマ処理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58200538A (ja) * 1982-05-19 1983-11-22 Hitachi Ltd ドライエツチング装置
JPS6063919A (ja) * 1983-09-17 1985-04-12 Anelva Corp 表面処理装置
JPS60195939A (ja) * 1984-03-19 1985-10-04 Hitachi Ltd プラズマ処理装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58200538A (ja) * 1982-05-19 1983-11-22 Hitachi Ltd ドライエツチング装置
JPS6063919A (ja) * 1983-09-17 1985-04-12 Anelva Corp 表面処理装置
JPS60195939A (ja) * 1984-03-19 1985-10-04 Hitachi Ltd プラズマ処理装置
JPS61226925A (ja) * 1985-04-01 1986-10-08 Anelva Corp 放電反応装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008181704A (ja) * 2007-01-23 2008-08-07 National Institute Of Advanced Industrial & Technology 高密度プラズマ処理装置

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