JPH0244522Y2 - - Google Patents
Info
- Publication number
- JPH0244522Y2 JPH0244522Y2 JP19968786U JP19968786U JPH0244522Y2 JP H0244522 Y2 JPH0244522 Y2 JP H0244522Y2 JP 19968786 U JP19968786 U JP 19968786U JP 19968786 U JP19968786 U JP 19968786U JP H0244522 Y2 JPH0244522 Y2 JP H0244522Y2
- Authority
- JP
- Japan
- Prior art keywords
- hook
- side arm
- nozzle
- cassette
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 40
- 239000007789 gas Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000007664 blowing Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000008214 highly purified water Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968786U JPH0244522Y2 (ko) | 1986-12-29 | 1986-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968786U JPH0244522Y2 (ko) | 1986-12-29 | 1986-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63108630U JPS63108630U (ko) | 1988-07-13 |
| JPH0244522Y2 true JPH0244522Y2 (ko) | 1990-11-27 |
Family
ID=31161543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19968786U Expired JPH0244522Y2 (ko) | 1986-12-29 | 1986-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0244522Y2 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009049106A (ja) * | 2007-08-16 | 2009-03-05 | Tokyo Electron Ltd | 洗浄装置及び洗浄方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2504916B2 (ja) * | 1993-09-20 | 1996-06-05 | 株式会社芝浦製作所 | 基板洗浄装置 |
| JP2009087958A (ja) * | 2006-01-06 | 2009-04-23 | Tokyo Electron Ltd | 洗浄・乾燥処理方法及びその装置並びにそのプログラム |
-
1986
- 1986-12-29 JP JP19968786U patent/JPH0244522Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009049106A (ja) * | 2007-08-16 | 2009-03-05 | Tokyo Electron Ltd | 洗浄装置及び洗浄方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63108630U (ko) | 1988-07-13 |
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