JPH0244522Y2 - - Google Patents
Info
- Publication number
- JPH0244522Y2 JPH0244522Y2 JP19968786U JP19968786U JPH0244522Y2 JP H0244522 Y2 JPH0244522 Y2 JP H0244522Y2 JP 19968786 U JP19968786 U JP 19968786U JP 19968786 U JP19968786 U JP 19968786U JP H0244522 Y2 JPH0244522 Y2 JP H0244522Y2
- Authority
- JP
- Japan
- Prior art keywords
- hook
- side arm
- nozzle
- cassette
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 40
- 239000007789 gas Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000007664 blowing Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000008214 highly purified water Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
Description
【考案の詳細な説明】
〈産業上の利用分野〉
本考案は、半導体基板や、液晶基板等の薄板状
の基板を、現像液・エツチング液・レジスト剥離
液・洗浄液などの処理液槽内に順次浸漬して処理
する浸漬型基板処理装置において用いられるカセ
ツト搬送用フツクの液切り装置に関するものであ
る。[Detailed description of the invention] <Industrial application field> This invention is a method for placing thin substrates such as semiconductor substrates and liquid crystal substrates in a processing liquid tank containing a developing solution, an etching solution, a resist stripping solution, a cleaning solution, etc. This invention relates to a draining device for a hook for transporting cassettes used in an immersion-type substrate processing apparatus that processes substrates by sequentially dipping them.
〈従来技術〉
上記のような浸漬型基板処理装置としては、従
来より例えば第4図に示すものが知られており、
この装置においては、例えば第3図に示すような
カセツト搬送ロボツトと称する複数のカセツト搬
送装置3を備え、多数の基板1を収納したカセツ
ト2を2連式カセツト搬送装置3の揺動可能なフ
ツク31で掛持し、カセツト2を搬送・昇降して
順次各処理槽4に浸漬して乾燥までの一貫処理が
なされるように構成されている。<Prior Art> As the above-mentioned immersion type substrate processing apparatus, the one shown in FIG. 4, for example, is conventionally known.
This apparatus is equipped with a plurality of cassette transport devices 3 called cassette transport robots as shown in FIG. 31, the cassette 2 is conveyed, raised and lowered, and sequentially immersed in each processing tank 4 to perform an integrated process up to drying.
ところでこのような浸漬型基板処理装置におい
ては、カセツト2やフツク31に付着した前工程
の処理液が後工程の処理液中に混入することは望
ましくないとされているが、無視できない場合を
除き、許容される工程、例えば薬液処理工程42
〜46に対しては1台のカセツト搬送装置3aを
対応させるとともに、必要に応じてカセツト搬送
用フツク31を洗浄しうるように1つの洗浄槽4
1を設けてある。また処理槽46〜49に対して
は別のカセツト搬送装置3bを対応させるととも
に、最後の薬液処理槽46と高純度の純水を貯溜
した超純水洗浄槽48の間に前段洗浄槽47を設
け、最終の薬液処理を終えたカセツト2をこの前
段洗浄槽47であらかじめ洗浄したり、リンサー
ドライヤ49内からカセツト2を取り出す際にフ
ツク31から水滴が滴下して基板に付着するのを
避けるために、この前段洗浄槽47内に設けた液
切り装置でフツク31の水滴を吹き飛ばすように
構成されている。 By the way, in such an immersion type substrate processing apparatus, it is said that it is undesirable for the processing liquid from the previous process adhering to the cassette 2 or the hook 31 to mix into the processing liquid for the subsequent process, but unless it cannot be ignored, , an acceptable process, for example, a chemical treatment process 42
- 46 are provided with one cassette transport device 3a, and one cleaning tank 4 is provided so that the cassette transport hooks 31 can be cleaned as necessary.
1 is provided. In addition, another cassette transport device 3b is provided for the processing tanks 46 to 49, and a pre-stage washing tank 47 is provided between the last chemical processing tank 46 and an ultrapure water washing tank 48 storing highly purified water. In order to prevent water droplets from dripping from the hook 31 and adhering to the substrate when the cassette 2 that has undergone the final chemical treatment is pre-washed in this pre-stage cleaning tank 47 or when the cassette 2 is taken out from the rinser dryer 49. In addition, a liquid draining device provided in the front-stage cleaning tank 47 is configured to blow away water droplets from the hook 31.
上記洗浄槽41,47内に設けられる液切り装
置としては、従来より例えば第5図に示すものが
本出願人により提案されている(実開昭61−
153340号公報)。 As a liquid draining device provided in the cleaning tanks 41 and 47, the one shown in FIG.
Publication No. 153340).
それは洗浄槽4内に一対のカセツト搬送用フツ
ク31に対応させて2組で一対でエアナイフ10
5を設けて成り、洗浄ノズル128でジエツト洗
浄した後、当該フツク31を上昇させながらフツ
ク31に付着した水滴をエアナイフ105で吹き
飛ばすように構成されている。 The air knives 10 are arranged in two sets corresponding to a pair of cassette conveying hooks 31 in the cleaning tank 4.
5, and after jet cleaning with the cleaning nozzle 128, water droplets adhering to the hook 31 are blown away with the air knife 105 while the hook 31 is raised.
また、この従来例のものは、エアナイフ105
のエア吹出孔を、フツク31の掛持横腕部31b
の軸線方向に多数開口し、フツク31を上昇させ
ながらフツク31の揺動縦腕部31aに付着した
水滴を吹き飛ばし、第5図の実線で示す位置でフ
ツク31の上昇を止めて掛持横腕部31bに付着
した水滴を吹き飛ばして液切りをするように構成
されている。 Moreover, in this conventional example, the air knife 105
The air outlet of the hook 31 is connected to the side arm 31b of the hook 31.
is opened in the axial direction, and while the hook 31 is raised, water droplets adhering to the swinging vertical arm 31a of the hook 31 are blown away, and the raising of the hook 31 is stopped at the position shown by the solid line in FIG. It is configured to blow away water droplets adhering to the portion 31b to drain the liquid.
〈考案が解決しようとする問題点〉
しかしながら、上記従来例のものは、掛持横腕
部31bに付着した水滴の液切れ効果が十分とは
言えないという問題を残していた。<Problems to be Solved by the Invention> However, the above conventional example still has a problem in that the effect of removing water droplets adhering to the hanging side arm portion 31b is not sufficient.
上記先願の考案は、有用なものであるが、なお
若干の不都合が存在することが認められる。それ
は、ある程度大きな水滴はエア吹き付けによる衝
撃にてフツク31から即座に吹き飛ばされるが、
細かな水滴はフツク31の表面から離れにくく、
吹き飛ばしにくい点に関しての不都合である。す
なわち、細かな水滴であつても、フツク31の揺
動縦腕部31に付着した水滴は、フツク31を上
昇させる際に下方へ吹き流され、寄せ集まつて大
きな水滴となつて吹き飛ばされるから支障はない
が、しかし、掛持横腕部31bに付着した細かな
水滴は、エアナイフ105のように多数のエア吹
出孔を掛持横腕部31bの軸線方向に開口させた
ものでは、容易に吹き流すことができず、液切が
十分とは言えないという不都合がある。 Although the invention of the above-mentioned prior application is useful, it is recognized that there are still some disadvantages. This is because water droplets of a certain size are immediately blown away from the hook 31 by the impact of air blowing.
Small water droplets are difficult to separate from the surface of the hook 31,
The disadvantage is that it is difficult to blow away. That is, even if the water droplets are small, the water droplets adhering to the swinging vertical arm portion 31 of the hook 31 are blown downward when the hook 31 is raised, and are blown away as large water droplets that gather together. However, fine water droplets adhering to the hanging side arm part 31b are easily removed by an air knife 105 which has a large number of air blowing holes opening in the axial direction of the hanging side arm part 31b. There are disadvantages in that the liquid cannot be blown away and the liquid cannot be drained sufficiently.
さらに上記従来例のものは、多数のエア吹出孔
より不活性ガス等の高価なエアを吹き出すもので
あるため、そのエアの消費量も多くなり、ランニ
ングコストの面でコスト高となる。 Furthermore, since the conventional device described above blows out expensive air such as inert gas from a large number of air blowing holes, the amount of air consumed is large, resulting in high running costs.
本考案は、このような問題点を解決することを
目的とする。 The present invention aims to solve these problems.
〈問題点を解決するための手段〉
上記目的を達成するために本考案に係る液切り
装置は次のように構成される。<Means for Solving the Problems> In order to achieve the above object, the liquid draining device according to the present invention is configured as follows.
即ち、洗浄槽内に少なくとも一組以上のガスノ
ズルを設け、カセツト搬送用フツクに付着した洗
浄液を除去するように構成したカセツト搬送用フ
ツクの液切り装置において、
ガスノズルがフツクの掛持横腕部に対向するよ
うに配置され水平移動可能に設けられた移動ノズ
ルを備えて成り、掛持横腕部に付着した洗浄液を
当該横腕部に沿つて吹き流すように構成したこと
を特徴とするものである。 That is, in a liquid draining device for a cassette transport hook, which is configured to include at least one set of gas nozzles in a cleaning tank and to remove cleaning liquid adhering to the cassette transport hook, the gas nozzle is attached to the side arm of the hook. It is characterized by comprising movable nozzles that are arranged to face each other and are horizontally movable, and configured to blow away the cleaning liquid attached to the hanging side arm part along the side arm part. be.
〈作用〉
フツクの掛持横腕部が移動ノズルに対応する高
さでフツクの上昇を止め、移動ノズルをフツクの
掛持横腕部に沿つて移動させながらガスを当該横
腕部に吹きつけると、横腕部に付着していた洗浄
液は横腕部に沿つて吹き流され、その風下側へ吹
き寄せられてその一端より吹き飛ばされる。これ
により、十分な流切れ効果が得られ、エアの消費
も節約できる。<Operation> The hook stops rising when the hanging side arm of the hook is at a height corresponding to the moving nozzle, and the moving nozzle is moved along the hook's hanging side arm while blowing gas to the corresponding side arm. As a result, the cleaning liquid adhering to the side arm is blown away along the side arm, blown toward the leeward side of the side arm, and blown away from one end of the side arm. This provides a sufficient flow-off effect and saves on air consumption.
〈実施例〉
以下、本考案に係るカセツト搬送フツクの液切
り装置の1実施例を図面に基づいて説明する。<Embodiment> Hereinafter, one embodiment of a liquid draining device for a cassette transport hook according to the present invention will be described based on the drawings.
第1図は本考案の液切り装置を備える洗浄槽内
を示す縦断正面図、第2図はその縦断側面図であ
る。 FIG. 1 is a longitudinal sectional front view showing the inside of a cleaning tank equipped with a liquid draining device of the present invention, and FIG. 2 is a longitudinal sectional side view thereof.
本実施例の液切り装置は2連式カセツト搬送装
置3の一対のフツク31,31の各揺動縦腕部3
1aに対応させて設けられた2組で一対の固定ノ
ズル5,5・5,5と、これらの固定ノズルの下
方に位置し、一対のフツク31,31の各掛持横
腕部31b,31bに対向するように、かつ、水
平移動可能に設けられた2組で一対の移動ノズル
10,10・10,10とを備えて成る。 The liquid draining device of this embodiment has a pair of swinging vertical arms 3 of a pair of hooks 31, 31 of a double cassette conveying device 3.
1a, a pair of fixed nozzles 5, 5, 5, 5, and a pair of hooks 31, 31, each holding side arm part 31b, 31b located below these fixed nozzles. The nozzle is provided with a pair of moving nozzles 10, 10 and 10, 10, which are provided so as to face each other and to be horizontally movable.
各固定ノズル5は第2図に示すように、その両
端を固定具8,8によつて水平に支持されたエア
パイプ6と、このエアパイプ6に突設され、揺動
縦腕部31aに向けて斜め下向へエア吹き出すよ
うに設けられた複数のエア噴出具7とを具備して
成り、洗浄装置本体の下方に配設されている第1
のガス供給弁21によつてチツ素ガスが供給され
るようになつている。 As shown in FIG. 2, each fixed nozzle 5 includes an air pipe 6 whose both ends are horizontally supported by fixing devices 8, 8, and which is protruded from the air pipe 6 and extends toward the swinging vertical arm portion 31a. The first air blowing device 7 is provided with a plurality of air blowing devices 7 provided to blow air diagonally downward, and is disposed below the main body of the cleaning device.
Ni gas is supplied by a gas supply valve 21 .
また、2組一対の移動ノズル10,10・1
0,10は、各一組10,10がゴニオヘツド1
3によつて角度調節可能に立設された角パイプ1
2,12と、角パイプ12,12の上端に固設さ
れ、フツク31の横腕部31bに向けてエアを吹
き出すように設けられたエア噴出具11,11を
具備して成り、上記固定ノズル5と同様に、第2
のチツ素ガス供給弁22によつてチツ素ガスが供
給されるようになつている。 In addition, two pairs of moving nozzles 10, 10.1
0, 10, each pair 10, 10 is goniohead 1
Square pipe 1 installed vertically so that the angle can be adjusted by 3
2, 12, and air blowing devices 11, 11 fixedly installed at the upper ends of the square pipes 12, 12 so as to blow air toward the side arm portion 31b of the hook 31, the fixed nozzle 5, the second
Nitrogen gas is supplied by a nitrogen gas supply valve 22.
一対のゴニオヘツド13,13は、それぞれ中
間支持部材14,14を介して支持枠15に固定
され、支持枠15はエアシリンダ17によつて水
平移動可能に設けられた移動枠16の上端に固定
され、エアシリンダ17を三位置切換弁18で伸
縮駆動することによる移動ノズル10,10,1
0,10を同時に水平移動するように構成されて
いる。 The pair of goniometer heads 13, 13 are fixed to a support frame 15 via intermediate support members 14, 14, respectively, and the support frame 15 is fixed to the upper end of a movable frame 16 provided horizontally movably by an air cylinder 17. , movable nozzles 10, 10, 1 by telescopically driving the air cylinder 17 with the three-position switching valve 18.
It is configured to horizontally move 0 and 10 at the same time.
上記固定ノズル5には、処理槽4の前面に設け
たエア中継具23を介してエア供給路24が接続
され、また、移動ノズル10には移動板16に設
けたエア中継具25を介してエア供給路26が接
続され、前記エア供給弁21,22を切換作動す
ることにより順次固定ノズル5と移動ノズル10
とにエアを切換えて供給するように構成されてい
る。 An air supply path 24 is connected to the fixed nozzle 5 via an air relay 23 provided on the front surface of the processing tank 4, and an air supply path 24 is connected to the movable nozzle 10 via an air relay 25 provided on the movable plate 16. The air supply path 26 is connected, and by switching and operating the air supply valves 21 and 22, the fixed nozzle 5 and the movable nozzle 10 are sequentially connected.
It is configured to switch and supply air.
上記移動ノズル10のエア噴出具11には、フ
ツク31の横腕部31bの軸線方向に向かう正面
向きよりも、後述する排気ダクト40の向きへ若
干傾斜させてエア噴出孔が開口されており、移動
ノズル10,10をフツクの横腕部31bに沿つ
て移動させながらエアを吹き付けると、横腕部3
1bに付着している洗浄液を当該横腕部31bに
沿つて吹き流すようになつている。 The air blowing device 11 of the movable nozzle 10 has an air blowing hole opened at a slight angle toward the exhaust duct 40, which will be described later, rather than facing forward in the axial direction of the horizontal arm portion 31b of the hook 31. When air is blown while moving the movable nozzles 10, 10 along the side arm part 31b of the hook, the side arm part 3
The cleaning liquid adhering to 1b is blown away along the side arm portion 31b.
なお、図中符号28はフツクに洗浄液を噴射す
る洗浄液噴射ノズルであり、カセツト搬送装置3
を下降させることによりフツク31を洗浄槽4内
に挿入しながら弁28aを開いて洗浄液を噴射さ
せてフツク31を洗浄し、洗浄液は洗浄槽4の下
壁より連出したドレイン29より排出されるよう
になつている。 In addition, the reference numeral 28 in the figure is a cleaning liquid spray nozzle that sprays cleaning liquid onto the hook, and is connected to the cassette conveying device 3.
While inserting the hook 31 into the cleaning tank 4 by lowering it, the valve 28a is opened to spray cleaning liquid to clean the hook 31, and the cleaning liquid is discharged from the drain 29 extending from the lower wall of the cleaning tank 4. It's becoming like that.
次に上記実施例装置の動作について説明する。 Next, the operation of the apparatus of the above embodiment will be explained.
洗浄後の洗浄液が付着したフツク31は、第2
図の仮想線で示す下限位置にある。カセツト搬送
装置3を上昇させながら、ガス供給弁21を開い
て固定ノズル5よりエアをフツク31の縦腕部3
1aに向けて噴出させると、縦腕部31aに付着
していた洗浄液はその縦腕部31aに沿つて流下
する。次いで、フツク31の横腕部31bが第1
図、第2図の実線で示す位置まで上昇した高さで
フツク31の上昇を止める。必要により、フツク
31の横腕部31bを実線位置以上に上昇させ、
縦腕部31aに付着した液滴を完全に流下させた
後、再び横腕部31bを実線位置に下降して止め
るようにしても良い。この状態でエアシリンダ1
7を伸長作動させておいてから、エアシリンダ1
7を縮めさせることにより、移動ノズル10をフ
ツク31の横腕部31bに沿つて水平移動させる
のであるが、このエアシリンダ17を縮める際
に、ガス供給弁22を開いて移動ノズル10より
チツ素ガスをこの横腕部31bに向けて吹き付け
る。そうすると、横腕部31bに付着していた洗
浄液は横腕部31bに沿つて吹き流され、風下側
に吹き寄せられ、ついてはその一端部より吹き飛
ばされる。なお、符号40は移動ノズル10の風
下側に対応させて洗浄槽4の前面壁より連出して
設けた排気ダクトである。 The hook 31 to which the cleaning liquid has adhered after cleaning is
It is at the lower limit position shown by the imaginary line in the figure. While raising the cassette transfer device 3, open the gas supply valve 21 and supply air from the fixed nozzle 5 to the vertical arm 3 of the hook 31.
When the cleaning liquid is ejected toward 1a, the cleaning liquid adhering to the vertical arm portion 31a flows down along the vertical arm portion 31a. Next, the side arm portion 31b of the hook 31
The hook 31 stops rising when it has risen to the position shown by the solid line in FIGS. If necessary, raise the side arm 31b of the hook 31 above the solid line position,
After the droplets adhering to the vertical arm portion 31a have completely flowed down, the horizontal arm portion 31b may be lowered again to the solid line position and stopped. In this state, air cylinder 1
7 is extended, then air cylinder 1
By retracting the air cylinder 7, the movable nozzle 10 is moved horizontally along the side arm 31b of the hook 31. When the air cylinder 17 is retracted, the gas supply valve 22 is opened to supply nitrogen from the movable nozzle 10. Gas is blown toward this side arm portion 31b. Then, the cleaning liquid adhering to the side arm part 31b is blown away along the side arm part 31b, blown toward the leeward side, and then blown away from one end thereof. Note that the reference numeral 40 is an exhaust duct that extends from the front wall of the cleaning tank 4 so as to correspond to the leeward side of the movable nozzle 10.
上記実施例装置は、洗浄槽4内に洗浄液を貯溜
しないタイプのもの、つまり、フツクのみを洗浄
するタイプのもの(例えば第4図の41)につい
て説明したが、カセツトごと洗浄することが可能
な洗浄槽(例えば第4図の47)においても適用
しうる。この場合には、各一組の固定ノズル5,
5のうち、内側のものを第1図の仮想線で示す位
置まで回転可能に設け、カセツトの挿入に際し邪
魔にならない位置へ退避させるように構成すると
もに、移動ノズル10を適宜移動可能の設ける。 The above-mentioned example device has been described as a type in which no cleaning liquid is stored in the cleaning tank 4, that is, a type in which only the hook is cleaned (for example, 41 in Fig. 4), but it is also possible to clean the entire cassette. It can also be applied to a cleaning tank (for example, 47 in FIG. 4). In this case, each set of fixed nozzles 5,
5, the inner nozzle is provided rotatably to the position shown by the imaginary line in FIG. 1, and is configured to be retracted to a position where it does not get in the way when inserting the cassette, and a movable nozzle 10 is provided so as to be movable as appropriate.
また、上記固定ノズル5は洗浄液の種類によつ
ては、必ずしも必要ではない。つまり、縦腕部3
1bに付着した洗浄液が自然流下し易い性質のも
の(例えばアルコール等)の場合には、この固定
ノズル5を省くこともできる。さらに、カセツト
搬送用フツクは上記一対の挟持式フツクに限ら
ず、単一の掛持可能なフツクでも本考案に係る液
切り装置を適用することが可能である。また、上
記実施例では固定ノズル5や移動ノズル10から
吹き出すガスをチツ素ガスとしたが、空気でもよ
く、ガスの種類は限定しない。 Furthermore, the fixed nozzle 5 is not necessarily required depending on the type of cleaning liquid. In other words, the vertical arm 3
If the cleaning liquid attached to 1b is of a nature that tends to flow down naturally (for example, alcohol, etc.), this fixed nozzle 5 can be omitted. Further, the hook for transporting the cassette is not limited to the above-mentioned pair of clamping type hooks, but the liquid draining device according to the present invention can also be applied to a single hook that can be hooked. Further, in the above embodiment, the gas blown out from the fixed nozzle 5 and the movable nozzle 10 was nitrogen gas, but air may be used, and the type of gas is not limited.
〈考案の効果〉
本考案によれば、洗浄槽内に略水平移動可能に
設けた移動ノズルによつてフツクの掛持横腕部に
付着した洗浄液を当該横腕部に沿つて吹き流しな
がら風下側へ吹き寄せて、フツクの一端より吹き
飛ばすように構成されていることから、液切れ効
果に優れる。また、多数のエア吹出孔は不要であ
り、不活性ガス等の高価なガスを無駄に消費する
こともないから、ランニングコストの低減を図る
こともできる。<Effects of the invention> According to the invention, the cleaning liquid adhering to the hanging side arm of the hook is blown away along the side arm of the hook by the movable nozzle provided in the cleaning tank so as to be able to move approximately horizontally, while cleaning the cleaning liquid on the leeward side. The structure is such that the liquid is blown towards the end of the hook and then blown away from one end of the hook, so it has an excellent liquid draining effect. Further, since a large number of air blowing holes are not required and expensive gas such as inert gas is not wasted, running costs can be reduced.
第1図は本考案に係る液切り装置を備える洗浄
槽内を示す縦断正面図、第2図はその縦断側面
図、第3図〜第5図は従来例に関するもので、第
3図は2連式カセツト搬送装置の斜視図、第4図
は浸漬型基板処理装置の斜視図、第5図は液切り
装置の従来例を示す縦断正面図である。
4……洗浄槽、5……固定ノズル、10……移
動ノズル、17……エアシリンダ、21……第1
のガス供給弁、22……第2のガス供給弁、28
……洗浄液供給バルブ、31……カセツト搬送用
フツク、31a……揺動縦腕部、31b……掛持
横腕部。
Fig. 1 is a longitudinal sectional front view showing the inside of a cleaning tank equipped with a liquid draining device according to the present invention, Fig. 2 is a longitudinal sectional side view thereof, Figs. 3 to 5 are related to a conventional example, and Fig. 3 is a FIG. 4 is a perspective view of a continuous cassette conveying device, FIG. 4 is a perspective view of an immersion type substrate processing device, and FIG. 5 is a longitudinal sectional front view showing a conventional example of a liquid draining device. 4...Cleaning tank, 5...Fixed nozzle, 10...Moving nozzle, 17...Air cylinder, 21...First
gas supply valve, 22...second gas supply valve, 28
. . . Cleaning liquid supply valve, 31 . . . Cassette transport hook, 31 a .
Claims (1)
を設け、カセツト搬送用フツクに付着した洗浄
液を除去するように構成したカセツト搬送用フ
ツクの液切り装置において、 ガスノズルがフツクの掛持横腕部に対向する
ように配置され水平移動可能に設けられた移動
ノズルを備えて成り、掛持横腕部に付着した洗
浄液を当該横腕部に沿つて吹き流すように構成
したことを特徴とするカセツト搬送用フツクの
液切り装置。 2 ガスノズルがフツクの揺動継腕部に対向する
ように配置された少なくとも一組の固定ノズル
を含んで成り、ガス供給弁を介して順次固定ノ
ズルと移動ノズルとにガスを切換えて供給する
ように構成した実用新案登録請求の範囲第1項
の記載のカセツト搬送用フツクの液切り装置。[Scope of Claim for Utility Model Registration] 1. In a draining device for a cassette transport hook, which is configured to include at least one set of gas nozzles in a cleaning tank and remove cleaning liquid adhering to the cassette transport hook, the gas nozzle is attached to the hook. The movable nozzle is arranged so as to be horizontally movable and is arranged to face the side arm of the hanger, and is configured to blow away the cleaning liquid adhering to the side arm of the hanger along the side arm. A liquid draining device for a hook for transporting a cassette. 2. The gas nozzle includes at least one set of fixed nozzles arranged to face the swinging joint of the hook, and the gas is sequentially switched and supplied to the fixed nozzle and the movable nozzle via a gas supply valve. A liquid draining device for a hook for transporting a cassette as set forth in claim 1 of the registered utility model claim.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968786U JPH0244522Y2 (en) | 1986-12-29 | 1986-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968786U JPH0244522Y2 (en) | 1986-12-29 | 1986-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63108630U JPS63108630U (en) | 1988-07-13 |
| JPH0244522Y2 true JPH0244522Y2 (en) | 1990-11-27 |
Family
ID=31161543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19968786U Expired JPH0244522Y2 (en) | 1986-12-29 | 1986-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0244522Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009049106A (en) * | 2007-08-16 | 2009-03-05 | Tokyo Electron Ltd | Cleaning device and cleaning method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2504916B2 (en) * | 1993-09-20 | 1996-06-05 | 株式会社芝浦製作所 | Substrate cleaning equipment |
| JP2009087958A (en) * | 2006-01-06 | 2009-04-23 | Tokyo Electron Ltd | Cleaning/drying treatment method, apparatus, and program |
-
1986
- 1986-12-29 JP JP19968786U patent/JPH0244522Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009049106A (en) * | 2007-08-16 | 2009-03-05 | Tokyo Electron Ltd | Cleaning device and cleaning method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63108630U (en) | 1988-07-13 |
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