JP2009049106A - Cleaning device and cleaning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To excellently dry an object to be cleaned. <P>SOLUTION: A cleaning device includes: a drying means for drying the object to be cleaned by jetting a drying agent to the object to be cleaned subjected to cleaning by the cleaning device; a moving means for moving the drying means along the object to be cleaned; a first drying agent injection port provided in the drying means; and a second drying agent injection port provided below the first drying agent injection port and on a rear side in the moving direction during drying process. Further, a third drying agent injection port is formed between the first drying agent injection port and second drying agent injection port in the vertical direction and in the front-rear direction. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a cleaning apparatus and a cleaning method.

  2. Description of the Related Art Conventionally, for example, in a substrate processing apparatus that performs a cleaning process on a semiconductor wafer, a transport mechanism for transporting the inside of the apparatus by holding a plurality of semiconductor wafers by a holder is provided, and contaminants attached to the holder are removed. A cleaning mechanism for cleaning was provided.

  This cleaning mechanism reciprocates a cleaning / drying unit that integrates a cleaning unit that sprays a cleaning liquid toward a holder as a body to be cleaned and a drying unit that sprays a desiccant toward the holder along the holder. In the drying means, a plurality of desiccant injection ports for injecting the desiccant toward the side portion of the holding body are vertically arranged in a vertical row.

  The cleaning mechanism sprays the cleaning liquid from the cleaning liquid spray port toward the holding body when the cleaning / drying means moves forward, and then performs the cleaning operation of the holding body, and then holds it from the desiccant spray port when the cleaning / drying means returns. The desiccant was sprayed toward the body to perform the drying operation of the holding body, and the cleaning of the holding body was completed by the reciprocating movement of the washing and drying means.

JP 2006-26609 A

  However, in the conventional cleaning mechanism, since the drying agent spray ports of the drying means are vertically arranged in a vertical line, the drying means simultaneously sprays the desiccant from the upper side to the lower side of the holding body while holding the holding body. The cleaning liquid that has flowed down by the desiccant sprayed on the upper side of the holding body adheres to the lower side of the holding body, and the holding body may not be dried well. .

  Accordingly, in the present invention according to claim 1, in the cleaning apparatus, a drying unit that sprays a desiccant toward the cleaned object to be cleaned to dry the cleaned object, and the drying unit is disposed along the cleaned object. A moving means for moving, a first desiccant injection port provided in the drying means, a lower side than the first desiccant injection port, and a rear side with respect to the moving direction during drying. And having a second desiccant jet.

  Moreover, in this invention which concerns on Claim 2, in this invention which concerns on the said Claim 1, 3rd drying is carried out between the up-down direction and the front-back direction of a said 1st desiccant injection port and a 2nd desiccant injection port. It was decided to form an agent injection port.

  Moreover, in this invention which concerns on Claim 3, after wash | cleaning a to-be-cleaned body, the drying means which sprays a desiccant toward a to-be-cleaned body is moved along a to-be-cleaned body, and the to-be-cleaned body is dried. In the method, a first desiccant injection port provided in the drying means, and a second side provided below the first desiccant injection port and on the rear side with respect to the moving direction during drying. It was decided to spray the desiccant from the desiccant spray port toward the object to be cleaned.

  Moreover, in this invention which concerns on Claim 4, in this invention which concerns on the said Claim 3, it formed in the up-down direction and the front-back direction of the said 1st desiccant injection port and the 2nd desiccant injection port. It was decided to spray the desiccant from the desiccant spraying port toward the object to be cleaned.

  And in this invention, there exists an effect described below.

  That is, in the present invention, since the second desiccant spray port is provided below the first desiccant spray port and on the rear side with respect to the moving direction during drying, the first drying agent is provided. After the desiccant is sprayed from the agent spray port to the object to be cleaned, the desiccant is sprayed from the second desiccant spray port to the object to be cleaned. The cleaning liquid that has flowed down by the desiccant sprayed from the desiccant spray port to the upper side of the object to be cleaned is then dried by the desiccant sprayed from the second desiccant spray port to the lower side of the object to be cleaned. And the object to be cleaned can be satisfactorily dried.

  In the following, specific embodiments of the present invention will be described with reference to the drawings, taking as an example a substrate processing apparatus for performing a cleaning process and a drying process on a semiconductor wafer (substrate).

  As shown in FIG. 1, the substrate processing apparatus 1 includes a carrier loading / unloading unit 4 that loads and unloads a carrier 3 that houses a plurality of semiconductor wafers (hereinafter referred to as “wafer 2”), and a carrier 3. A wafer carry-in / out unit 5 for carrying in and out the wafer 2 and a wafer processing unit 6 for carrying out a cleaning process and a drying process for the wafer 2.

  The carrier loading / unloading unit 4 forms a sealed opening / closing door 8 on a carrier stage 7 on which the carrier 3 is placed, and a carrier transport mechanism 9, a carrier stock 10, and a carrier mounting table 11 are arranged inside the opening / closing door 8. is doing.

  The carrier loading / unloading unit 4 temporarily stores the carrier 3 placed on the carrier stage 7 by the carrier carrying mechanism 9 in the carrier stock 10 as necessary, and carries the carrier 3 on the carrier placing table 11. Yes. The carrier loading / unloading unit 4 requires the carrier 3 mounted on the carrier mounting table 11, contrary to the time of loading, for the carrier 3 containing the wafer 2 that has been processed by the wafer processing unit 6. Accordingly, the carrier is temporarily stored in the carrier stock 10 by the carrier transport mechanism 9 and is transported to the carrier stage 7.

  The wafer loading / unloading section 5 forms a sealed opening / closing door 12 between the carrier loading / unloading section 4, and a wafer loading / unloading mechanism 13 and a start end of the wafer transfer mechanism 14 are arranged inside the opening / closing door 12. Has been established.

In the wafer loading / unloading section 5, the wafer 2 accommodated in the carrier 3 placed on the carrier mounting table 11 of the carrier loading / unloading section 4 is loaded into the wafer conveyance mechanism 14 by the wafer loading / unloading mechanism 13, and the wafer conveyance mechanism The wafer 2 is transferred to the wafer processing unit 6 by 14, while the wafer 2 that has been processed by the wafer processing unit 6 is transferred from the wafer processing unit 6 to the wafer loading / unloading mechanism 13 by the wafer transfer mechanism 14, and the wafer is loaded / unloaded. The mechanism 13 is adapted to carry out the wafer transfer mechanism 14 from the wafer transfer mechanism 14 to the carrier 3 mounted on the carrier mounting table 11 of the carrier loading / unloading unit 4.

  The wafer processing unit 6 includes first to third wafer cleaning devices 15, 16, and 17 that perform cleaning processing on the wafer 2, a wafer cleaning and drying device 18 that performs cleaning processing and drying processing on the wafer 2, and a wafer transfer mechanism 14. A cleaning device 20 for cleaning the holding body 19 that holds the wafer 2 provided on the wafer 2 is disposed side by side, and a wafer transfer mechanism 14 is disposed along each of the devices 15, 16, 17, 18, 20. Yes.

  In the wafer processing unit 6, the wafer transfer mechanism 14 transfers the wafer 2 from the wafer carry-in / out unit 5 to the first to third wafer cleaning devices 15, 16, 17 and the wafer cleaning / drying device 18. A cleaning process and a drying process are performed, and then the processed wafer 2 is transferred again to the wafer loading / unloading section 5 by the wafer transfer mechanism 14.

  In the wafer processing unit 6, the holder 19 of the wafer transport mechanism 14 is cleaned by the cleaning device 20 so that the contaminants attached to the holder 19 are not transferred to the wafer 2.

  As shown in FIG. 2, the cleaning device 20 has a casing 21 disposed in front of the wafer transfer mechanism 14, and an opening 22 through which the holding body 19 of the wafer transfer mechanism 14 is inserted on the side surface and the front surface of the casing 21. The holding body 19 is accommodated in the casing 21 through the opening 22.

  Further, the cleaning device 20 is provided with a cleaning / drying means 23 movably by the moving means 24 along the holding body 19 accommodated in the casing 21, and an air ejection means 25 is provided inside the casing 21. .

  The configuration of the wafer transfer mechanism 14, the cleaning / drying means 23, and the air ejection means 25 will be described below.

  First, the configuration of the wafer transfer mechanism 14 will be described. The wafer transfer mechanism 14 is arranged along the first to third wafer cleaning apparatuses 15, 16, 17 and the wafer cleaning / drying apparatus 18, as shown in FIGS. The holding body 19 is formed on the movable body 26 formed so as to be movable. The holder 19 includes a lower holder 27 that holds the lower portion of the wafer 2 and a pair of left and right holders 28 and 29 that hold the left and right sides of the wafer 2. A holding groove 30 for holding the wafers 2 one by one is formed on the top of 29 in a line.

  The lower holding body 27 is attached via a fixed arm 32 to a fixed shaft 31 protruding from the center of the moving body 26. The left and right holding bodies 28 and 29 are attached to the rotation shafts 33 and 34 projecting from the left and right side portions of the moving body 26 via the rotation arms 35 and 36, respectively. Thus, the lower holding body 27 is fixed to the moving body 26, and the left and right holding bodies 28 and 29 are attached to the moving body 26 so as to be rotatable. The left and right holding bodies 28 and 29 rotate and rotate the rotation shafts 33 and 34 to hold the rotation arms 35 and 36 to the left and right outside when holding the wafer 2 as shown in FIG. The holding posture is set to hold the left and right end portions of the wafer 2 with the groove 30 facing inward (the state indicated by the one-dot chain line in FIG. 3). On the other hand, during cleaning, the rotating arms 35 and 36 are suspended downward to hold the holding groove. The cleaning posture 30 can be changed to a holding posture and a cleaning posture (indicated by a solid line in FIG. 3). Here, the left and right holders 28 and 29 move outward in the holding posture and the left and right intervals are increased, while in the cleaning posture, the left and right holders 28 and 29 move inward and the left and right intervals are reduced. The size is smaller than the holding posture. Thus, the size of the cleaning device 20 can be reduced by making the cleaning posture of the left and right holding bodies 28 and 29 smaller than the holding posture.

  Next, the configuration of the cleaning / drying means 23 will be described. The cleaning / drying means 23 includes a cleaning unit 37, a cleaning / drying unit 38, a drying unit 39, and a cover plate 40 as shown in FIGS. 2 and 4-8. They are integrally attached in order, and are reciprocated integrally along the holding body 19 by the moving means 24, and when moving forward (in FIG. 2, from the front end side (left side) to the base end side (right side) of the holding body 19 When moving, the cleaning liquid is sprayed from the cleaning unit 37 and the cleaning / drying unit 38 toward the holding body 19 to clean the holding body 19, and when returning (in FIG. 2, the base end side of the holding body 19 (right side) ) From the cleaning / drying unit 38 and the drying unit 39 toward the holding body 19 to dry the post-cleaning to complete a series of cleaning operations. I have to.

  The cleaning unit 37 is formed by arranging three openings 42, 43, and 44 through which the holding bodies 27, 28, and 29 are inserted side by side in a rectangular plate unit body 41, and the left and right sides of the openings 42, 43, and 44. Three cleaning liquid injection ports 45a, 45b, and 45c are formed in the vertical direction at intervals on the side, and a communication passage 46 that communicates with each of the cleaning liquid injection ports 45a, 45b, and 45c is formed in the unit body 41. A pure water supply source 47 that supplies pure water to the communication passage 46 is connected to the communication passage 46 via an open / close valve 48. Thus, the cleaning unit 37 opens the open / close valve 48, so that the pure water supplied from the pure water supply source 47 is used as the cleaning liquid from the cleaning liquid injection ports 45a, 45b, 45c of the openings 42, 43, 44. It is made to inject toward the side part of each holding body 27,28,29.

  The washing / drying unit 38 has three two-fluid mixing nozzles 50, 51, 52 attached to a rectangular plate-shaped unit main body 49, and a pure water supply source 47 and nitrogen gas to each of the two-fluid mixing nozzles 50, 51, 52. A nitrogen gas supply source 53 to be supplied is connected to each other through open / close valves 54 and 55, and the injection ports 56, 57 and 58 of the two-fluid mixing nozzles 50, 51 and 52 are connected to the holding bodies 27, 28, It is located just above 29. Thus, the cleaning / drying unit 38 opens the both open / close valves 54 and 55 to open the pure water supplied from the pure water supply source 47 and the nitrogen gas supplied from the nitrogen gas supply source 53, respectively. Mixing with the fluid mixing nozzles 50, 51, 52, and spraying the mixed fluid as cleaning liquid from the injection ports 56, 57, 58 of each of the two fluid mixing nozzles 50, 51, 52 toward the upper portions of the holding bodies 27, 28, 29 Like to do. The cleaning / drying unit 38 dries the nitrogen gas supplied from the nitrogen gas supply source 53 by closing the pure water side opening / closing valve 54 and opening only the nitrogen gas side opening / closing valve 55. As an agent, the two-fluid mixing nozzles 50, 51, and 52 are jetted from the jet ports 56, 57, and 58 toward the upper portions of the holding bodies 27, 28, and 29, respectively.

  Here, in the cleaning / drying unit 38, the injection ports 56 and 58 of the left and right two-fluid mixing nozzles 50 and 52 are disposed directly above the left and right holding bodies 28 and 29, and the left and right holding bodies 28 and 29 are held during cleaning. Since the cleaning posture is such that the groove 30 is inclined outward, the cleaning liquid is jetted in a state of being inclined outward relative to the holding grooves 30 of the left and right holding bodies 28 and 29.

  The drying unit 39 includes three openings 60, 61, and 62 that are inserted through the holding bodies 27, 28, and 29 in a rectangular plate-shaped unit body 59, and are arranged on the left and right sides of the openings 60, 61, and 62. Four desiccant spray ports 63a, 63b, 63c, and 63d are formed on the side with a space therebetween, and the unit body 59 is connected to each desiccant spray port 63a, 63b, 63c, and 63d. A passage 64 is formed, and a nitrogen gas supply source 53 is connected to the communication passage 64 through an open / close valve 65. Thereby, the drying unit 39 opens the open / close valve 65, so that the nitrogen gas supplied from the nitrogen gas supply source 53 is used as the desiccant, and the desiccant injection ports 63a, 63b, The spray is made from 63c, 63d toward the side portions of the holding bodies 27, 28, 29.

  In this drying unit 39, as shown in FIG. 5, the four desiccant injection ports 63a, 63b, 63c, 63d are moved in the direction of drying in order from the upper side (in FIG. 2, the base end side of the holder 19 ( It is formed so as to be located on the front side with respect to the direction (moving from the right side) to the tip side (left side), and the desiccant injection port 63a formed at the uppermost part is formed with the other desiccant injection ports 63b, 63c, 63d. The other desiccant spray ports 63b, 63c, 63d are formed below the desiccant spray ports 63b, 63c formed above, with respect to the moving direction of the drying means during drying. It is formed in front of the desiccant injection ports 63c and 63d with respect to the moving direction of the drying means during drying. As a result, the drying unit 39 is configured to inject the desiccant from the desiccant injection ports 63a, 63b, 63c, and 63d toward the side portions of the holding bodies 27, 28, and 29 in order from the upper side. The desiccant sprayed from the formed desiccant spray port 63a is sprayed to each holding body 27, 28, 29 before the desiccant sprayed from the other desiccant spray ports 63b, 63c, 63d, and other drying Each holding body prior to the desiccant sprayed from the desiccant spray ports 63c, 63d formed below the desiccant spray ports 63b, 63c formed above the desiccant spray ports 63b, 63c, 63d. 27, 28, 29 is injected.

  As described above, in the drying unit 39, the second desiccant spray port is provided on the lower side of the first desiccant spray port 63a provided on the upper side and on the rear side with respect to the moving direction of the drying means during drying. The third desiccant spray port 63b is formed between the first desiccant spray port 63a and the second desiccant spray port 63d in the vertical direction and the front-rear direction (the moving direction of the drying means during drying). , 63c is formed, and the desiccant is sprayed from the first desiccant spray port 63a toward the side portions of the holding bodies 27, 28, 29, and then the third desiccant spray ports 63b, 63c The desiccant is sprayed toward the side portions of the holding bodies 27, 28, and 29, and then the desiccant is sprayed toward the side portions of the holding bodies 27, 28, and 29 from the second desiccant spray port 63d. I am doing so. Thus, in the drying unit 39, the cleaning liquid that has flowed down by the desiccant sprayed from the upper desiccant injection ports 63a, 63b, 63c onto the upper sides of the holding bodies 27, 28, 29 is subsequently transferred to the lower side. It is possible to dry with the desiccant sprayed from the desiccant spray outlets 63b, 63c, 63d to the lower side of each holding body 27, 28, 29, and it is possible to dry each holding body 27, 28, 29 well it can.

  The cover plate 40 is formed with three openings 66, 67, 68 through which the holding bodies 27, 28, 29 are inserted, and prevents the cleaning liquid from scattering.

  Next, the structure of the air jetting means 25 will be described. The air jetting means 25 includes an upper air jetting unit 69 arranged at the upper part of the casing 21 and a side part arranged at the upper part of the opening 22 on the side surface side of the casing 21. An air jet unit 70 and a front air jet unit 71 disposed above the opening 22 on the front side of the casing 21, and an air supply source 72 that supplies air to each unit 69, 70, 71 is opened and closed It is connected through 73.

  In the upper air ejection unit 69, air is ejected downward to the entire interior of the casing 21, thereby forming an atmosphere in which the interior of the casing 21 generally flows downward to prevent scattering of the cleaning liquid. In the side air ejection unit 70 and the front air ejection unit 71, air is ejected downward from the upper part of the opening 22 of the casing 21, and an air curtain is formed in the opening 22 so that the cleaning liquid leaks from the opening 22. Is preventing.

  The cleaning device 20 is configured as described above, and cleans the holding body 19 as follows.

  First, the cleaning device 20 moves the cleaning / drying means 23 to the rear end side (left side in FIG. 2) of the casing 21 by the moving means 24, and the holding body 19 of the wafer transfer mechanism 14 is cleaned from the holding position. After the posture is changed, the moving body 26 of the wafer transfer mechanism 14 is moved, and the holding body 19 is accommodated in the casing 21.

  Next, the cleaning device 20 ejects air from the upper air ejection unit 69, the side air ejection unit 70, and the front air ejection unit 71 by the air ejection means 25, and the cleaning and drying means 23 is removed from the casing 21 by the moving means 24. By moving from the rear end side to the front end side (in FIG. 2, from the front end side (left side) to the base end side (right side) of the holding body 19, the open / close valve 48 is opened, thereby providing a pure water supply source. The pure water supplied from 47 is sprayed from the cleaning liquid injection ports 45a, 45b, 45c of the openings 42, 43, 44 of the cleaning unit 37 toward the side portions of the holding bodies 27, 28, 29 as a cleaning liquid, and the open / close valve By opening 54 and 55, the pure water supplied from the pure water supply source 47 and the nitrogen gas supplied from the nitrogen gas supply source 53 are mixed into the two-fluid mixing nozzles 50, 51, 52 is mixed, and the mixed fluid is used as a cleaning liquid. Injected from 6,57,58 toward the upper portions of the holding bodies 27,28,29.

  At this time, in the cleaning / drying unit 38, the cleaning liquid is inclined relative to the holding grooves 30 of the left and right holders 28 and 29 from the ejection ports 56 and 58 of the left and right two-fluid mixing nozzles 50 and 52. I try to spray. Therefore, the cleaning liquid flows down smoothly along the inclined holding grooves 30, the contaminants can flow down together with the cleaning liquid, and the left and right holding bodies 28, 29 can be cleaned well.

  As described above, in the cleaning / drying unit 38, in the cleaning device 20 as the holder cleaning mechanism for cleaning the holder 19, the holding posture for holding the wafer 2 by the left and right holders 28 and 29 (use of the left and right holders 28 and 29). Use posture) and a cleaning posture (left and right holding body 28) in which the holding surfaces (holding grooves 30) of the left and right holding bodies 28 and 29 holding the wafer 2 are inclined with respect to the cleaning liquid injection ports (injection ports 56 and 58). , 29, the use surface (holding groove 30) can be changed to the cleaning liquid injection port (cleaning posture inclined with respect to the cleaning liquid injection port 56, 58), so that the left and right two fluids can be mixed. The cleaning liquid is sprayed from the injection ports 56 and 58 of the nozzles 50 and 52 in a state inclined relative to the holding grooves 30 of the left and right holding bodies 28 and 29, and the cleaning liquid is along the inclined holding grooves 30. Therefore, the contaminants can flow well together with the cleaning liquid. The cleaning of the bearing member 28, 29 can be performed well. In particular, in the cleaning / drying unit 38, the posture is changed so that the interval between the left and right holding bodies 28 and 29 in the cleaning posture is narrower than the interval between the left and right holding bodies 28 and 29 in the holding posture (use posture). Since the posture is made smaller than the holding posture (use posture), the cleaning device 20 can be miniaturized.

  After that, the cleaning device 20 moves the cleaning / drying means 23 to the front end side of the casing 21 (in FIG. 2, the base end side (right side) in FIG. 2) by the moving means 24, and then stops the cleaning / drying means 23. By bringing 54 and 55 into a closed state, the spraying of the cleaning liquid is stopped.

  Next, the cleaning device 20 moves the cleaning / drying means 23 from the front end side to the rear end side of the casing 21 by the moving means 24 (from the base end side (right side) to the front end side (left side) in FIG. 2). The pure water side open / close valve 54 is closed and only the nitrogen gas side open / close valve 55 is opened, so that the nitrogen gas supplied from the nitrogen gas supply source 53 is washed as a desiccant. By spraying from the spray ports 56, 57, 58 of the two-fluid mixing nozzles 50, 51, 52 of the drying unit 38 toward the upper portions of the holding bodies 27, 28, 29, and opening the open / close valve 65, Using the nitrogen gas supplied from the nitrogen gas supply source 53 as a desiccant, the side portions of the holding bodies 27, 28, 29 from the desiccant injection ports 63a, 63b, 63c, 63d of the openings 60, 61, 62 of the drying unit 39 Inject toward

  At this time, in the drying unit 39, the four desiccant injection ports 63a, 63b, 63c, 63d are sequentially moved from the upper side in the direction of movement during drying (in FIG. 2, from the proximal end side (right side) of the holder 19 to the distal end. It is formed so as to be located on the front side with respect to the side (the direction of movement to the left side), from the desiccant injection ports 63a, 63b, 63c, 63d toward the side portions of the respective holding bodies 27, 28, 29 The desiccant is sprayed in order from the upper side. Therefore, the cleaning liquid that has flowed down by the desiccant sprayed on the upper side of each holding body 27, 28, 29 can be dried with the desiccant sprayed on the lower side of each holding body 27, 28, 29. In addition, the holders 27, 28, and 29 can be satisfactorily dried.

  Thus, in the drying unit 39, the desiccant injection port 63a formed at the top is formed on the front side with respect to the moving direction of the drying means at the time of drying than the other desiccant injection ports 63b, 63c, 63d. The desiccant sprayed from the desiccant spray port 63a formed at the top is sprayed onto the holding body 19 before the desiccant sprayed from the other desiccant spray ports 63b, 63c, 63d. The cleaning liquid flown down by the desiccant sprayed from the upper desiccant spray port 63a to the upper side of the holding body 19 is then sprayed from the other desiccant spray ports 63b, 63c, 63d to the lower side of the holding body 19 It can be dried with a desiccant, and the holder 19 can be satisfactorily dried. In particular, in the drying unit 39, the other desiccant spray ports 63b, 63c, 63d are also drying means at the time of drying than the desiccant spray ports 63c, 63d formed below the desiccant spray ports 63b, 63c formed above. The desiccant spray formed below the desiccant spray port 63b, 63c formed above the other desiccant spray ports 63b, 63c, 63d. Since the desiccant sprayed from the ports 63c and 63d is sprayed to the holding body 19 before this, it is sprayed from the desiccant spray ports 63b and 63c on the upper side to the upper side of the holding body 19 as well. The cleaning liquid flowing down by the desiccant can be dried with the desiccant sprayed from the lower desiccant spray ports 63c, 63d to the lower side of the holding body 19, and the holding body 19 can be dried well. Can do.

  Thereafter, the cleaning device 20 moves the cleaning / drying means 23 to the rear end side of the casing 21 (in FIG. 2, the front end side (left side) of the holding body 19 in FIG. By making 65 a closed state, the spray of the desiccant is stopped, and the air jetting means 25 stops the jet of air from the upper air jet unit 69, the side air jet unit 70, and the front air jet unit 71. .

  As described above, the cleaning device 20 moves the cleaning / drying means 23 back and forth along the holding body 19 by the moving means 24 and moves forward (from the front end side (left side) of the holding body 19 in FIG. The cleaning liquid is sprayed from the cleaning unit 37 and the cleaning / drying unit 38 toward the holding body 19 when moving to the end side (right side), and the holding body 19 is cleaned. A series of a drying agent is sprayed from the cleaning / drying unit 38 and the drying unit 39 toward the holding body 19 when the base end side (right side) is moved from the base end side (right side) to the support body 19 to perform drying after cleaning. The cleaning operation is completed. Thus, in the cleaning apparatus 20, the cleaning unit 37 and the cleaning / drying unit 38 cooperate to function as a cleaning unit, and the cleaning / drying unit 38 and the drying unit 39 cooperate to function as a drying unit.

  In the substrate processing apparatus 1, a second desiccant spray port 63d is formed below the first desiccant spray port 63a and on the rear side with respect to the moving direction of the drying means during drying. Yes.

  Therefore, in the substrate processing apparatus 1 configured as described above, the desiccant is sprayed from the first desiccant spray port 63a toward the side portions of the holding bodies 27, 28, 29, and then the second desiccant spray port 63d. From the first desiccant jet port 63a on the upper side and sprayed on the upper side of each holding body 27, 28, 29. The cleaning liquid flowing down by the desiccant thus dried can be dried with the desiccant sprayed from the lower second desiccant spray port 63d to the lower side of each holding body 27, 28, 29, and each holding The bodies 27, 28 and 29 can be satisfactorily dried.

  In particular, in the substrate processing apparatus 1, the second desiccant spray port is provided on the lower side of the first desiccant spray port 63 a provided on the upper side and on the rear side with respect to the moving direction of the drying means during drying. The third desiccant spray port 63b is formed between the first desiccant spray port 63a and the second desiccant spray port 63d in the vertical direction and the front-rear direction (the moving direction of the drying means during drying). 63c, the desiccant is jetted from the first desiccant jet port 63a toward the sides of the holding bodies 27, 28, 29, and then the third desiccant jet port 63b, The desiccant is sprayed from 63c toward the side portions of the holding bodies 27, 28, 29, and then the desiccant is directed from the second desiccant spray port 63d toward the side portions of the holding bodies 27, 28, 29. The cleaning liquid that has flowed down by the desiccant sprayed from the upper desiccant spray ports 63a, 63b, and 63c onto the upper sides of the holding bodies 27, 28, and 29, and then the lower desiccant Can be dried with a desiccant sprayed to the lower side of each holding body 27, 28, 29 from the agent injection port 63b, 63c, 63d, and each holding body 27, 28, 29 can be satisfactorily dried. .

The top view which shows a substrate processing apparatus. The side surface schematic diagram which shows a washing | cleaning apparatus. The side view (a) and back view (b) which show a wafer conveyance mechanism. The side view (a) and back view (b) which show a washing-drying means. Sectional view Side surface sectional drawing which shows a washing | cleaning unit. Side surface sectional drawing which shows a washing-drying unit. Side surface sectional drawing which shows a drying unit.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Wafer 3 Carrier 4 Carrier carrying in / out part 5 Wafer carrying in / out part 6 Wafer processing part 7 Carrier stage 8 Opening / closing door 9 Carrier transport mechanism 10 Carrier stock
11 Carrier mounting table 12 Open / close door
13 Wafer transfer mechanism 14 Wafer transfer mechanism
15 to 17 First to third wafer cleaning apparatuses 18 Wafer cleaning and drying apparatus
19 Holder 20 Cleaning device
21 Casing 22 Opening
23 Cleaning and drying means 24 Moving means
25 Air ejection means 26 Moving object
27 Lower holder 28, 29 Left and right holder
30 Holding groove 31 Fixed shaft
32 Fixed arm 33, 34 Rotating shaft
35, 36 Rotating arm 37 Cleaning unit
38 Cleaning and drying unit 39 Drying unit
40 Cover plate 41 Unit body
42,43,44 Opening 45a, 45b, 45c Cleaning liquid injection port
46 Communication passage 47 Pure water supply source
48 Open / close valve 49 Unit body
50,51,52 Two-fluid mixing nozzle 53 Nitrogen gas supply source
54,55 Open / close valve 56,57,58 Injection port
59 Unit body 60, 61, 62 Opening
63a, 63b, 63c, 63d Desiccant injection port 64 communication path
65 Opening / closing valve 66, 67, 68 Opening
69 Upper air ejection unit 70 Side air ejection unit
71 Front air jet unit 72 Air supply source
73 Open / close valve

Claims (4)

Drying means for drying the object to be cleaned by spraying a desiccant toward the object to be cleaned after cleaning;
Moving means for moving the drying means along the object to be cleaned;
A first desiccant spray port provided in the drying means;
A second desiccant spray port provided below the first desiccant spray port and on the rear side with respect to the moving direction during drying;
A cleaning apparatus comprising:   The cleaning device according to claim 1, wherein a third desiccant spray port is formed between the first desiccant spray port and the second desiccant spray port in the vertical direction and the front-rear direction. In the cleaning method for drying the object to be cleaned by moving the drying means for spraying the desiccant toward the object to be cleaned along the object to be cleaned after cleaning the object to be cleaned,
A first desiccant spray port provided in the drying means, and a second desiccant spray provided below the first desiccant spray port and on the rear side with respect to the moving direction during drying. A cleaning method, wherein a desiccant is sprayed from a mouth toward an object to be cleaned.   A desiccant is sprayed from the third desiccant spray port formed between the first desiccant spray port and the second desiccant spray port in the vertical direction and the front-rear direction toward the object to be cleaned. The cleaning method according to claim 3.

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