CN216928502U - Acid-base washing tank type machine - Google Patents
Acid-base washing tank type machine Download PDFInfo
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- CN216928502U CN216928502U CN202123390225.7U CN202123390225U CN216928502U CN 216928502 U CN216928502 U CN 216928502U CN 202123390225 U CN202123390225 U CN 202123390225U CN 216928502 U CN216928502 U CN 216928502U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses an acid-base tank washing machine which comprises a cleaning machine main body, wherein an inner frame is arranged inside the cleaning machine main body, an outer groove is arranged between the inner frame and the cleaning machine main body, an inner groove is formed inside the inner frame, cross beams with equal intervals are fixed at the bottom of the inner frame, a filtering partition plate is arranged at the top end of each cross beam, right-angle seats are fixed at the corner positions of the top end of each filtering partition plate, a carrying platform is arranged at the top end of each filtering partition plate, grabbing rods are arranged on the outer walls of two sides of each carrying platform, a flower basket is arranged inside each carrying platform, and a liquid inlet main pipe is arranged on the outer wall of one side of the cleaning machine main body. The utility model not only ensures that the cleaning liquid overflowing from the inner groove does not leak outside, avoids the damage of the wafer caused by excessive soaking, improves the use safety of the equipment through a closed structure, but also meets the requirement of carrying and cleaning wafers with different specifications.
Description
Technical Field
The utility model relates to the technical field of wafer cleaning, in particular to an acid-base washing tank type machine.
Background
The wafer manufacturing process usually includes multiple processes of photolithography, etching, heat treatment, etc., and after photolithography, it needs to be cleaned to remove surface impurities, otherwise, the wafer may be irreversibly damaged in the next process, mainly cleaning the contamination generated by contacting various organic matters, particles and metals on the wafer surface, and the wet cleaning method usually adopted includes RCA cleaning method, dilution chemical method, IMEC cleaning method, single wafer cleaning, etc., wherein the RCA cleaning method relies on solvent, acid, surfactant and water, and the contamination of wafer surface contaminants, organic matters and metal ions is sprayed, purified, oxidized, etched and dissolved without damaging the wafer surface features. Each use of chemicals is followed by thorough cleaning in Ultra Pure Water (UPW), during which an acid and alkaline sink machine is used.
The existing acid-base washing tank type machine on the market is relatively complex in structure and single in wafer cleaning size, mechanical problems can occur during work to cause machine halt, and the wafer is soaked in cleaning liquid for a long time to cause damage or even scrapping.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide an acid and alkali washing trough machine, which aims to solve the problems that the acid and alkali washing trough machine in the background technology is complex in structure, and a wafer is easily scrapped after being soaked in a cleaning solution for a long time.
In order to achieve the purpose, the utility model provides the following technical scheme: an acid-base washing tank type machine comprises a cleaning machine main body, wherein an inner frame is arranged inside the cleaning machine main body, an outer tank is arranged between the inner frame and the cleaning machine main body, an inner tank is arranged inside the inner frame, cross beams with equal intervals are fixed at the bottom of the inner frame, a filtering baffle is arranged at the top end of each cross beam, right-angle seats are fixed at the corner positions of the top ends of the filtering baffle, a carrying platform is placed at the top end of the filtering baffle, grabbing rods are arranged on the outer walls of the two sides of the carrying platform, a flower basket is arranged inside the carrying platform, a liquid inlet main pipe is arranged on the outer wall of one side of the cleaning machine main body, a liquid inlet auxiliary pipe is arranged on the outer wall of the cleaning machine main body on one side of the liquid inlet main pipe, one ends of the liquid inlet main pipe and the liquid inlet auxiliary pipe extend to the inside of the inner frame, and liquid discharge pipes are arranged on the two sides of the bottom end of the cleaning machine main body, the both sides on inside casing top all are provided with the multiunit zigzag overflow mouth, the equidistant distribution of zigzag overflow mouth along the horizontal direction of inside casing, one side of cleaning machine main part is provided with the support frame, the both sides of cleaning machine main part all are fixed with the layer board, just the inside of layer board is rotated and is installed the backup pad, just the top of backup pad is fixed with the door plant.
Preferably, the length ratio of the liquid inlet main pipe to the liquid inlet auxiliary pipe is three to four, and a plurality of liquid outlet holes are formed in the upper surfaces of the liquid inlet main pipe and the liquid inlet auxiliary pipe.
Preferably, a first positioning seat is fixed at one side of the bottom of the support frame, a second positioning seat is fixed at the bottom of the support frame at one side of the first positioning seat, and the first positioning seat and the second positioning seat are in a symmetrical structure about the center line of the support frame.
Preferably, the back movable mounting of first locating seat has flexible driving piece, flexible driving piece's piston rod top is fixed with the joint, the both sides of support frame bottom all are fixed with the bearing frame, just the inside of bearing frame is rotated and is installed the main shaft, the one end of main shaft is fixed with the swing arm, the swing arm is connected with the outer wall fixed connection who connects.
Preferably, a middle shaft is rotatably mounted inside the supporting plate, a connecting plate is fixed at one end of the middle shaft, the top end of the connecting plate is fixedly connected with the bottom end of the supporting plate, and the middle shaft in the other group of supporting plates is fixedly connected with one end of the main shaft.
Preferably, the telescopic driving member can adopt an electric push rod, an air cylinder or a hydraulic cylinder.
Compared with the prior art, the utility model has the beneficial effects that: the acid-base washing tank type machine not only ensures that cleaning liquid overflowing from the inner tank cannot leak outwards, avoids damage caused by excessive soaking of wafers, improves the use safety of equipment through a closed structure, but also meets the requirement of carrying and cleaning wafers of different specifications;
(1) through the arrangement of the mutually matched structures of the liquid inlet main pipe, the liquid inlet auxiliary pipe and the like, in the process of injecting the cleaning liquid, the cleaning liquid enters the inner groove from the liquid inlet main pipe and the liquid inlet auxiliary pipe, and the redundant cleaning liquid flows into the outer groove from the zigzag overflow port of the inner frame and is discharged through the liquid discharge pipe until the cleaning of the cleaning wafer is finished, and the cleaning liquid can uniformly overflow along the outer wall of the inner frame in the cleaning process through the zigzag overflow port in the process; the lower part of the outer groove and the inner groove are designed integrally, so that the cleaning liquid overflowing from the inner groove cannot leak outwards, and the wafer is prevented from being damaged due to excessive soaking;
(2) through the arrangement of the structures of the telescopic driving piece, the swing arm and the like which are matched with each other, the swing arm is pulled to rotate through the telescopic driving piece, when the telescopic driving piece extends, the telescopic driving piece drives the swing arm to rotate anticlockwise through the joint, namely the door plate rotates anticlockwise, so that the cleaning machine main body is in an open state, and through automatic opening and closing of the door plate, the possible damage of liquid medicine to an operator is effectively avoided, and the use safety of equipment is improved;
(3) through being provided with the structure of grabbing pole and transport platform etc. mutually supporting, the rectangular seat adopts many sizes fluting design, satisfies different specification flower baskets and transport platform and places, and transport platform both sides outer wall all is equipped with grabs the pole, and the manipulator accessible is grabbed the pole and is carried transport platform, and the manipulator of being convenient for snatchs and safety and stability.
Drawings
FIG. 1 is a schematic perspective sectional view of the present invention;
FIG. 2 is an enlarged view of the structure at A in FIG. 1 according to the present invention;
FIG. 3 is an enlarged view of the structure at B in FIG. 1 according to the present invention;
FIG. 4 is a structural view illustrating the door panel according to the present invention in an unfolded state;
in the figure: 1. a washer body; 101. an outer tank; 102. a liquid discharge pipe; 2. an inner frame; 201. an inner tank; 202. a sawtooth-shaped overflow port; 3. a cross beam; 4. a filtering baffle plate; 401. a right-angle seat; 5. a carrying platform; 501. a grab bar; 6. a flower basket; 7. a liquid inlet main pipe; 8. a liquid inlet auxiliary pipe; 9. a support frame; 10. a second positioning seat; 11. a first positioning seat; 12. a support plate; 13. a middle shaft; 14. a connecting plate; 15. a support plate; 16. a door panel; 17. a telescopic driving member; 18. a joint; 19. a bearing seat; 20. a main shaft; 21. and (4) swinging arms.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-4, an embodiment of the present invention is shown: an acid-base tank washing machine comprises a cleaning machine main body 1, wherein an inner frame 2 is installed inside the cleaning machine main body 1, an outer tank 101 is arranged between the inner frame 2 and the cleaning machine main body 1, an inner tank 201 is arranged inside the inner frame 2, cross beams 3 with equal intervals are fixed at the bottom of the inner frame 2, a filtering partition plate 4 is installed at the top end of each cross beam 3, the filtering partition plate 4 is arranged on the upper side of the inner tank 201, foreign matters can be prevented from falling off a tank body, cleaning liquid is prevented from being directly sprayed onto the surface of a wafer, right-angled seats 401 are fixed at the corner positions of the top end of the filtering partition plate 4, a carrying platform 5 is placed at the top end of the filtering partition plate 4, grabbing rods 501 are installed on the outer walls of two sides of the carrying platform 5, a manipulator can carry out integral carrying of a flower basket 6 and the carrying platform 5 through the grabbing rods 501, and the manipulator is convenient to grab and is safe and stable;
the wafer to be cleaned is placed in the flower basket 6, and the flower basket 6 and the carrying platform 5 are placed on the filtering partition plate 4 in the inner frame 2 together by the manipulator in the workshop;
the right-angle seat 401 is used for positioning the flower basket 6 and the carrying platform 5;
the flower basket 6 is arranged inside the carrying platform 5, the liquid inlet main pipe 7 is arranged on the outer wall of one side of the cleaning machine main body 1, the liquid inlet auxiliary pipe 8 is arranged on the outer wall of the cleaning machine main body 1 on one side of the liquid inlet main pipe 7, the length ratio of the liquid inlet main pipe 7 to the liquid inlet auxiliary pipe 8 is three to four, a plurality of liquid outlet holes are formed in the upper surfaces of the liquid inlet main pipe 7 and the liquid inlet auxiliary pipe 8, one ends of the liquid inlet main pipe 7 and the liquid inlet auxiliary pipe 8 extend into the inner frame 2, cleaning liquid enters the inner groove 201 from the liquid inlet main pipe 7 and the liquid inlet auxiliary pipe 8 and submerges a wafer, the cleaning liquid is continuously injected, and the redundant cleaning liquid flows into the outer groove 101 from the zigzag overflow port 202 of the inner frame 2 and is discharged through the liquid discharge pipe 102 until the cleaning of the wafer is finished;
the lower part of the outer tank 101 and the inner tank 201 are designed in an integrated manner, so that the cleaning liquid overflowing from the inner tank 201 cannot leak outwards, and the wafer is prevented from being damaged due to excessive soaking;
the two sides of the bottom end of the cleaning machine main body 1 are both provided with the liquid discharge pipes 102, the two sides of the top end of the inner frame 2 are both provided with a plurality of groups of zigzag overflow ports 202, the zigzag overflow ports 202 are distributed at equal intervals along the horizontal direction of the inner frame 2, and the zigzag overflow ports 202 ensure that cleaning liquid can uniformly overflow along the outer wall of the inner frame 2 in the cleaning process;
a supporting frame 9 is arranged on one side of the cleaning machine main body 1, a first positioning seat 11 is fixed on one side of the bottom of the supporting frame 9, a second positioning seat 10 is fixed on the bottom of the supporting frame 9 on one side of the first positioning seat 11, and the first positioning seat 11 and the second positioning seat 10 are in a symmetrical structure relative to the central line of the supporting frame 9;
the back of the first positioning seat 11 is movably provided with a telescopic driving part 17, the first positioning seat 11 can play a role of limiting and supporting the movement of the telescopic driving part 17, the telescopic driving part 17 can adopt an electric push rod, an air cylinder or a hydraulic cylinder, and the top end of a piston rod of the telescopic driving part 17 is fixed with a joint 18;
bearing seats 19 are fixed on two sides of the bottom of the support frame 9, a main shaft 20 is rotatably installed inside the bearing seats 19, a swing arm 21 is fixed at one end of the main shaft 20, and the swing arm 21 is fixedly connected with the outer wall of the joint 18;
the swing arm 21 is pulled to rotate by the telescopic driving piece 17
The cleaning machine comprises a cleaning machine body 1, supporting plates 12, supporting plates 15 and a door panel 16, wherein the supporting plates 12 are fixed on two sides of the cleaning machine body 1, the supporting plates 12 are rotatably installed inside the supporting plates 15, the door panel 16 is fixed at the top ends of the supporting plates 15, after cleaning is finished, the door panel 16 is driven to be opened by a telescopic driving piece 17, a workshop manipulator extends into the cleaning machine body 1 to grab a carrying platform 5, and a wafer is sent to the next working procedure;
a middle shaft 13 is rotatably mounted inside the supporting plate 12, a connecting plate 14 is fixed at one end of the middle shaft 13, the top end of the connecting plate 14 is fixedly connected with the bottom end of the supporting plate 15, the middle shaft 13 in the other group of supporting plates 12 is fixedly connected with one end of the main shaft 20, when the telescopic driving piece 17 extends, the telescopic driving piece 17 drives the swing arm 21 to rotate anticlockwise through the joint 18, namely the swing arm 21 drives the main shaft 20, the middle shaft 13, the connecting plate 14, the supporting plate 15, the door panel 16 and other parts to rotate anticlockwise, and at the moment, the door panel 16 performs turning motion;
through the automatic opening and closing of the door plate 16, the injury of the liquid medicine to an operator is effectively avoided, and the use safety of the equipment is improved.
When the cleaning machine is used, firstly, a wafer to be cleaned is placed in the flower basket 6, the flower basket 6 and the carrying platform 5 are placed on the filtering partition plate 4 in the inner frame 2 together by the mechanical arm in a workshop, at the moment, the two groups of telescopic driving pieces 17 drive the door plate 16 to be closed, cleaning liquid enters the inner groove 201 from the liquid inlet main pipe 7 and the liquid inlet auxiliary pipe 8 and submerges the wafer, the cleaning liquid is continuously injected, redundant cleaning liquid flows into the outer groove 101 from the zigzag overflow port 202 of the inner frame 2 and is discharged through the liquid discharge pipe 102 until the cleaning of the wafer is finished, and the cleaning liquid can uniformly overflow along the outer wall of the inner frame 2 in the cleaning process through the zigzag overflow port 202 in the process; the lower part of the outer tank 101 and the inner tank 201 are designed in an integrated manner, so that the cleaning liquid overflowing from the inner tank cannot leak, the wafer is prevented from being damaged due to excessive soaking, after the cleaning is finished, the telescopic driving piece 17 drives the door panel 16 to be opened, and the workshop manipulator extends into the cleaning machine main body 1 to grab the carrying platform 5 and send the wafer to the next process;
the staff is when opening door plant 16, open flexible driving piece 17 through outside accuse terminal end, rotate through flexible driving piece 17 pulling swing arm 21, first reference seat 11 can play the effect of spacing support to the motion of flexible driving piece 17, when flexible driving piece 17 is elongated, flexible driving piece 17 drives swing arm 21 anticlockwise rotation through connecting 18, swing arm 21 drives main shaft 20 promptly, axis 13, the connecting plate 14, parts anticlockwise rotation such as backup pad 15 and door plant 16, door plant 16 is the turning motion this moment, the top of cleaning machine main part 1 is open state promptly, open and shut through the automation of door plant 16, effectively avoid the injury that the liquid medicine probably caused the operator, improve equipment's safety in utilization.
Claims (6)
1. The acid-base washing tank type machine is characterized by comprising a cleaning machine main body (1), an inner frame (2) is arranged inside the cleaning machine main body (1), an outer tank (101) is arranged between the inner frame (2) and the cleaning machine main body (1), an inner tank (201) is arranged inside the inner frame (2), beams (3) with equal intervals are fixed at the bottom of the inner frame (2), a filtering partition plate (4) is installed at the top end of each beam (3), right-angle seats (401) are fixed at the corner positions of the top end of each filtering partition plate (4), a carrying platform (5) is placed at the top end of each filtering partition plate (4), grabbing rods (501) are installed on the outer walls of two sides of the carrying platform (5), a flower basket (6) is arranged inside the carrying platform (5), a liquid inlet main pipe (7) is installed on the outer wall of one side of the cleaning machine main body (1), just install feed liquor auxiliary pipe (8) on the cleaning machine main part (1) outer wall of feed liquor main pipe (7) one side, the feed liquor main pipe (7) and the one end of feed liquor auxiliary pipe (8) all extend to the inside of inside casing (2), fluid-discharge tube (102) are all installed to the both sides of cleaning machine main part (1) bottom, the both sides on inside casing (2) top all are provided with multiunit zigzag overflow mouth (202), zigzag overflow mouth (202) are along the equidistant distribution of the horizontal direction of inside casing (2), one side of cleaning machine main part (1) is provided with support frame (9), the both sides of cleaning machine main part (1) all are fixed with layer board (12), just backup pad (15) are installed in the inside rotation of layer board (12), just the top of backup pad (15) is fixed with door plant (16).
2. The acid-base launder machine according to claim 1, characterized in that: the length proportion of the liquid inlet main pipe (7) and the liquid inlet auxiliary pipe (8) is three to four, and a plurality of liquid outlet holes are formed in the upper surfaces of the liquid inlet main pipe (7) and the liquid inlet auxiliary pipe (8).
3. The acid-base launder machine according to claim 1, characterized in that: one side of the bottom of the support frame (9) is fixed with a first positioning seat (11), the bottom of the support frame (9) on one side of the first positioning seat (11) is fixed with a second positioning seat (10), and the first positioning seat (11) and the second positioning seat (10) are in a symmetrical structure relative to the center line of the support frame (9).
4. An acid-base launder machine according to claim 3, characterised in that: the back movable mounting of first reference location seat (11) has flexible driving piece (17), the piston rod top of flexible driving piece (17) is fixed with joint (18), the both sides of support frame (9) bottom all are fixed with bearing frame (19), just main shaft (20) are installed in the inside rotation of bearing frame (19), the one end of main shaft (20) is fixed with swing arm (21), swing arm (21) and the outer wall fixed connection who connects (18).
5. An acid-base launder machine, according to claim 4, characterized in that: a middle shaft (13) is rotatably mounted inside the supporting plate (12), a connecting plate (14) is fixed at one end of the middle shaft (13), the top end of the connecting plate (14) is fixedly connected with the bottom end of the supporting plate (15), and the middle shaft (13) in the other group of supporting plates (12) is fixedly connected with one end of the main shaft (20).
6. The acid-base launder machine according to claim 4, characterized in that: the telescopic driving piece (17) can adopt an electric push rod, an air cylinder or a hydraulic cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123390225.7U CN216928502U (en) | 2021-12-30 | 2021-12-30 | Acid-base washing tank type machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123390225.7U CN216928502U (en) | 2021-12-30 | 2021-12-30 | Acid-base washing tank type machine |
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| Publication Number | Publication Date |
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| CN216928502U true CN216928502U (en) | 2022-07-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202123390225.7U Active CN216928502U (en) | 2021-12-30 | 2021-12-30 | Acid-base washing tank type machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115831831A (en) * | 2023-02-23 | 2023-03-21 | 苏州智程半导体科技股份有限公司 | Compact slot type machine |
-
2021
- 2021-12-30 CN CN202123390225.7U patent/CN216928502U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115831831A (en) * | 2023-02-23 | 2023-03-21 | 苏州智程半导体科技股份有限公司 | Compact slot type machine |
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