CN217043660U - Quick washing unit is used in wafer production - Google Patents
Quick washing unit is used in wafer production Download PDFInfo
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- CN217043660U CN217043660U CN202122154881.0U CN202122154881U CN217043660U CN 217043660 U CN217043660 U CN 217043660U CN 202122154881 U CN202122154881 U CN 202122154881U CN 217043660 U CN217043660 U CN 217043660U
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Abstract
The utility model provides a rapid flushing device for wafer production, which comprises a flushing box, a wafer overturning and clamping mechanism and a flushing mechanism; a cleaning cavity is formed in the washing box, the wafer overturning and clamping mechanism comprises a first clamping block and a second clamping block which are arranged on the left side and the right side of the cleaning cavity, and clamping grooves for placing wafers are formed in the surfaces, close to each other, of the second clamping block and the second clamping block; one end of the first clamping block, which is far away from the second clamping block, is fixedly connected with a connecting rotating shaft, and the connecting rotating shaft is rotationally connected with the inner wall of the cleaning cavity; and one end of the second clamping block, which is far away from the first clamping block, is fixedly connected with a driving rotating shaft. This washing unit treats abluent wafer through upset fixture and carries out the centre gripping when in-service use to drive the wafer and carry out 360 degrees rotations, through washing mechanism to lasting the wafer of upset in-process and lasting, abundant washing, improve wafer cleaning efficiency and quality.
Description
Technical Field
The utility model relates to a quick washing unit especially relates to a quick washing unit is used in wafer production.
Background
In a semiconductor manufacturing process, a wafer is cleaned in order to remove organic substances or particles such as a photoresist film or a polymer film on the surface of the wafer. In the cleaning process, the cleaning liquid sprayed on the wafer is not well discharged, and a bad influence is generated on the wafer, resulting in a poor cleaning effect and a low cleaning efficiency, thereby degrading the manufacturing quality of the semiconductor.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a wafer production is with quick washing unit to solve the problem that proposes in the above-mentioned background art.
In order to achieve the above purpose, the utility model provides a following technical scheme: a quick washing device for wafer production comprises a washing box, a wafer overturning and clamping mechanism and a washing mechanism; a cleaning cavity is formed in the washing box, the wafer overturning and clamping mechanism comprises a first clamping block and a second clamping block which are arranged on the left side and the right side of the cleaning cavity, and clamping grooves for placing wafers are formed in the surfaces, close to each other, of the first clamping block and the second clamping block; one end of the first clamping block, which is far away from the second clamping block, is fixedly connected with a connecting rotating shaft, and the connecting rotating shaft is rotationally connected with the inner wall of the cleaning cavity; one end of the second clamping block, which is far away from the first clamping block, is fixedly connected with a driving rotating shaft; the flushing mechanism comprises a flushing water pipe arranged at the top end of the flushing tank, the flushing water pipe is arranged on the inner wall of the flushing tank in a surrounding mode, and a cleaning spray head with a downward opening is arranged on the flushing water pipe.
Preferably, the clamping groove is internally provided with a clamping piece, and the clamping piece is connected with a locking screw.
Preferably, one end of the locking screw rod, which is far away from the clamping piece, penetrates through the corresponding clamping block and is connected with a control handle.
Preferably, the top end of the flushing tank is hinged with a sealing cover, and the top end of the sealing cover is provided with a lifting handle.
Preferably, the driving rotating shaft penetrates through the flushing tank and is connected with a first gear, the bottom end of the first gear is connected with a second gear in a meshing transmission mode, and the second gear is connected with a driving motor.
Preferably, the first gear, the second gear and the driving motor are all installed in a control box, the control box is installed on one side of the flushing box, a controller is installed at the top end of the control box, and the controller is connected with the control end of the driving motor.
Preferably, one side of the bottom of the flushing tank is provided with a water outlet which is communicated with a water drainage pipe.
Preferably, the inner wall of the clamping groove and the outer wall of the clamping piece are both provided with protective gaskets.
Compared with the prior art, the technical scheme of the utility model following beneficial effect has:
the utility model provides a pair of quick washing unit is used in wafer production, this washing unit treat abluent wafer through upset fixture and carry out the centre gripping when in-service use to drive the wafer and carry out 360 degrees rotations, continuously wash the wafer that lasts among the switching process through washing mechanism, the discharge of the washing liquid of being convenient for reduces the damage to the wafer, improves wafer cleaning efficiency and quality
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the application and, together with the description, serve to explain the application and are not intended to limit the application. In the drawings:
fig. 1 is a schematic view of the overall structure of the present invention in a turning state;
fig. 2 is a schematic view of the detailed structure of the present invention in the initial state;
fig. 3 is a front view of the present invention.
Illustration of the drawings:
in the figure: 1. a flushing tank; 2. a cleaning chamber; 3. a first clamping block; 4. a second clamping block; 5. a clamping groove; 6. connecting the rotating shaft; 7. driving the rotating shaft; 8. flushing the water pipe; 9. cleaning the spray head; 10. a clamping piece; 11. locking the screw rod; 12. a control handle; 13. a sealing cover; 14. lifting the handle; 15. a first gear; 16. a second gear; 17. a drive motor; 18. a control box; 19. a drain pipe; 20. and a controller.
Detailed Description
The utility model provides a wafer production is with quick washing unit, for making the utility model discloses a purpose, technical scheme and effect are clearer, clear and definite, and it is right that the following refers to the drawing and lifts the example the utility model discloses further detailed description. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order, it being understood that the data so used may be interchanged under appropriate circumstances. Furthermore, the terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a system, article, or apparatus that comprises a list of elements is not necessarily limited to those elements explicitly listed, but may include other elements not expressly listed or inherent to such system, article, or apparatus.
Referring to fig. 1-3, the present invention provides a technical solution: a quick washing device for wafer production comprises a washing box 1, a wafer overturning and clamping mechanism and a washing mechanism; a cleaning cavity 2 is formed in the washing box 1, the wafer overturning and clamping mechanism comprises a first clamping block 3 and a second clamping block 4 which are arranged on the left side and the right side of the cleaning cavity 2, and clamping grooves 5 for placing wafers are formed in the surfaces, close to each other, of the first clamping block 3 and the second clamping block 4; one end of the first clamping block 3, which is far away from the second clamping block 4, is fixedly connected with a connecting rotating shaft 6, and the connecting rotating shaft 6 is rotatably connected with the inner wall of the cleaning cavity 2; one end of the second clamping block 4, which is far away from the first clamping block 3, is fixedly connected with a driving rotating shaft 7; the flushing mechanism comprises a flushing water pipe 8 installed at the top end of the flushing tank 1, the flushing water pipe 8 is arranged on the inner wall of the flushing tank 1 in a surrounding mode, and a cleaning spray head 9 with a downward opening is arranged on the flushing water pipe 8.
Furthermore, a clamping piece 10 is arranged inside the clamping groove 5, and a locking screw rod 11 is connected to the clamping piece 10.
Furthermore, one end of the locking screw 11, which is far away from the clamping piece 10, penetrates through the corresponding clamping block and is connected with a control handle 12.
Furthermore, the top end of the flushing tank 1 is hinged with a sealing cover 13, and the top end of the sealing cover 13 is provided with a lifting handle 14.
Furthermore, the driving rotating shaft 7 penetrates through the flushing tank 1 to be connected with a first gear 15, the bottom end of the first gear 15 is connected with a second gear 16 in a meshing transmission mode, and the second gear 16 is connected with a driving motor 17.
Furthermore, the first gear 15, the second gear 16 and the driving motor 17 are all installed in a control box 18, the control box 18 is installed on one side of the flushing box 1, a controller 20 is installed at the top end of the control box 18, and the controller 20 is connected with the control end of the driving motor 17.
Furthermore, a water outlet is arranged at one side of the bottom of the washing tank 1 and is communicated with a water drain pipe 19.
Furthermore, protective gaskets are arranged on the inner wall of the clamping groove 5 and the outer wall of the clamping piece 10.
The working principle is as follows: before cleaning the wafer, fixing the wafer, wherein the initial state of the first clamping block 3 and the second clamping block 4 is a state of turning 90 degrees, and the control handles 12 on the first clamping block 3 and the second clamping block 4 are positioned at one side of the first clamping block 3 and the second clamping block 4;
the left and right sides of the wafer are clamped in the clamping grooves 5 of the first clamping block 3 and the second clamping block 4 respectively by an operator, and then the corresponding locking screw rods 11 are driven to rotate through the control handle 12, so that the corresponding clamping pieces 10 are pushed to clamp the left and right sides of the wafer, and the purpose of fixing the wafer is achieved.
Then, the operator starts the driving motor 17 through the controller 20, so that the driving motor 17 drives the second gear 16 to rotate, the second gear 16 is in meshed transmission connection with the first gear 15, so that the first gear 15 synchronously rotates, and the purpose of driving the wafer to continuously rotate is achieved, meanwhile, the surface of the wafer is washed through the washing nozzle 9 on the washing water pipe 8, and the washed sewage is discharged through the drain pipe 19, so that the purpose of cleaning the wafer in all directions is achieved.
It is worth noting that: the whole device realizes control to the device through the controller, and the controller is common equipment and belongs to the prior mature technology, so that the electrical connection relation and the specific circuit structure are not described again.
The present invention has been described in detail with reference to the specific embodiments, but the present invention is only by way of example and is not limited to the specific embodiments described above. Any equivalent modifications and substitutions for the utility model are within the scope of the present invention for those skilled in the art. Accordingly, variations and modifications in equivalents may be made without departing from the spirit and scope of the invention, which is intended to be covered by the following claims.
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122154881.0U CN217043660U (en) | 2021-09-06 | 2021-09-06 | Quick washing unit is used in wafer production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122154881.0U CN217043660U (en) | 2021-09-06 | 2021-09-06 | Quick washing unit is used in wafer production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217043660U true CN217043660U (en) | 2022-07-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122154881.0U Active CN217043660U (en) | 2021-09-06 | 2021-09-06 | Quick washing unit is used in wafer production |
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| CN (1) | CN217043660U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116100644A (en) * | 2022-11-16 | 2023-05-12 | 抚松金隆木业集团有限公司 | A kind of anti-mildew process and processing equipment for wood boards |
| CN120734024A (en) * | 2025-09-01 | 2025-10-03 | 上海新昇半导体科技有限公司 | Semiconductor cleaning device and cleaning method |
-
2021
- 2021-09-06 CN CN202122154881.0U patent/CN217043660U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116100644A (en) * | 2022-11-16 | 2023-05-12 | 抚松金隆木业集团有限公司 | A kind of anti-mildew process and processing equipment for wood boards |
| CN120734024A (en) * | 2025-09-01 | 2025-10-03 | 上海新昇半导体科技有限公司 | Semiconductor cleaning device and cleaning method |
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