JPH0243333B2 - - Google Patents

Info

Publication number
JPH0243333B2
JPH0243333B2 JP55066769A JP6676980A JPH0243333B2 JP H0243333 B2 JPH0243333 B2 JP H0243333B2 JP 55066769 A JP55066769 A JP 55066769A JP 6676980 A JP6676980 A JP 6676980A JP H0243333 B2 JPH0243333 B2 JP H0243333B2
Authority
JP
Japan
Prior art keywords
etching
plane
silicon single
surfactant
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55066769A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56162839A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6676980A priority Critical patent/JPS56162839A/ja
Publication of JPS56162839A publication Critical patent/JPS56162839A/ja
Publication of JPH0243333B2 publication Critical patent/JPH0243333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
JP6676980A 1980-05-19 1980-05-19 Silicon etchant and etching method for silicon single crystal using the same Granted JPS56162839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6676980A JPS56162839A (en) 1980-05-19 1980-05-19 Silicon etchant and etching method for silicon single crystal using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6676980A JPS56162839A (en) 1980-05-19 1980-05-19 Silicon etchant and etching method for silicon single crystal using the same

Publications (2)

Publication Number Publication Date
JPS56162839A JPS56162839A (en) 1981-12-15
JPH0243333B2 true JPH0243333B2 (cg-RX-API-DMAC7.html) 1990-09-28

Family

ID=13325408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6676980A Granted JPS56162839A (en) 1980-05-19 1980-05-19 Silicon etchant and etching method for silicon single crystal using the same

Country Status (1)

Country Link
JP (1) JPS56162839A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855323A (ja) * 1981-09-26 1983-04-01 Toshiba Corp シリコン及びシリコン酸化膜の腐食液
KR100612985B1 (ko) * 1998-03-12 2006-10-31 삼성전자주식회사 액정 표시 장치의 제조 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548696B2 (cg-RX-API-DMAC7.html) * 1974-04-15 1980-12-08
JPS50147281A (cg-RX-API-DMAC7.html) * 1974-05-15 1975-11-26

Also Published As

Publication number Publication date
JPS56162839A (en) 1981-12-15

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