JPH024138B2 - - Google Patents
Info
- Publication number
- JPH024138B2 JPH024138B2 JP21051381A JP21051381A JPH024138B2 JP H024138 B2 JPH024138 B2 JP H024138B2 JP 21051381 A JP21051381 A JP 21051381A JP 21051381 A JP21051381 A JP 21051381A JP H024138 B2 JPH024138 B2 JP H024138B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- aluminum nitride
- nitride film
- mask
- gate electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21051381A JPS58112372A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21051381A JPS58112372A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58112372A JPS58112372A (ja) | 1983-07-04 |
JPH024138B2 true JPH024138B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-01-26 |
Family
ID=16590611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21051381A Granted JPS58112372A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58112372A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5849620A (en) * | 1995-10-18 | 1998-12-15 | Abb Research Ltd. | Method for producing a semiconductor device comprising an implantation step |
-
1981
- 1981-12-26 JP JP21051381A patent/JPS58112372A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58112372A (ja) | 1983-07-04 |