JPH0240747B2 - - Google Patents
Info
- Publication number
- JPH0240747B2 JPH0240747B2 JP61139314A JP13931486A JPH0240747B2 JP H0240747 B2 JPH0240747 B2 JP H0240747B2 JP 61139314 A JP61139314 A JP 61139314A JP 13931486 A JP13931486 A JP 13931486A JP H0240747 B2 JPH0240747 B2 JP H0240747B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating liquid
- wafer
- liquid
- injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13931486A JPS62297494A (ja) | 1986-06-17 | 1986-06-17 | 半導体ウェハー用メッキ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13931486A JPS62297494A (ja) | 1986-06-17 | 1986-06-17 | 半導体ウェハー用メッキ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62297494A JPS62297494A (ja) | 1987-12-24 |
JPH0240747B2 true JPH0240747B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-09-13 |
Family
ID=15242418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13931486A Granted JPS62297494A (ja) | 1986-06-17 | 1986-06-17 | 半導体ウェハー用メッキ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62297494A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0640615A (ja) * | 1992-07-23 | 1994-02-15 | Kobayashi Seisakusho:Kk | ウエブスプライス装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07113159B2 (ja) * | 1988-08-29 | 1995-12-06 | 日本電装株式会社 | めっき装置 |
JPH083153B2 (ja) * | 1990-02-26 | 1996-01-17 | 日本電装株式会社 | めっき装置 |
JP3438387B2 (ja) * | 1995-03-16 | 2003-08-18 | 株式会社デンソー | めっき装置およびめっき方法 |
KR100637890B1 (ko) | 1999-07-08 | 2006-10-23 | 가부시키가이샤 에바라 세이사꾸쇼 | 도금장치 및 도금방법 및 도금처리설비 |
US6547937B1 (en) * | 2000-01-03 | 2003-04-15 | Semitool, Inc. | Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece |
US7153400B2 (en) * | 2002-09-30 | 2006-12-26 | Lam Research Corporation | Apparatus and method for depositing and planarizing thin films of semiconductor wafers |
US7393439B2 (en) | 2003-06-06 | 2008-07-01 | Semitool, Inc. | Integrated microfeature workpiece processing tools with registration systems for paddle reactors |
US20050034977A1 (en) | 2003-06-06 | 2005-02-17 | Hanson Kyle M. | Electrochemical deposition chambers for depositing materials onto microfeature workpieces |
US7390383B2 (en) | 2003-07-01 | 2008-06-24 | Semitool, Inc. | Paddles and enclosures for enhancing mass transfer during processing of microfeature workpieces |
CN110318086A (zh) * | 2018-03-28 | 2019-10-11 | 姜力 | 电镀槽结构 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5137080Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1971-05-31 | 1976-09-10 | ||
US4418151A (en) * | 1981-03-30 | 1983-11-29 | Rohm And Haas Company | Assay process with non-boiling denaturation |
-
1986
- 1986-06-17 JP JP13931486A patent/JPS62297494A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0640615A (ja) * | 1992-07-23 | 1994-02-15 | Kobayashi Seisakusho:Kk | ウエブスプライス装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS62297494A (ja) | 1987-12-24 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |