JPH0238921B2 - - Google Patents

Info

Publication number
JPH0238921B2
JPH0238921B2 JP59198483A JP19848384A JPH0238921B2 JP H0238921 B2 JPH0238921 B2 JP H0238921B2 JP 59198483 A JP59198483 A JP 59198483A JP 19848384 A JP19848384 A JP 19848384A JP H0238921 B2 JPH0238921 B2 JP H0238921B2
Authority
JP
Japan
Prior art keywords
refractive index
layer
wavelength
index material
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59198483A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6177002A (ja
Inventor
Yasushi Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59198483A priority Critical patent/JPS6177002A/ja
Publication of JPS6177002A publication Critical patent/JPS6177002A/ja
Publication of JPH0238921B2 publication Critical patent/JPH0238921B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59198483A 1984-09-25 1984-09-25 光反射防止膜 Granted JPS6177002A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59198483A JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59198483A JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Publications (2)

Publication Number Publication Date
JPS6177002A JPS6177002A (ja) 1986-04-19
JPH0238921B2 true JPH0238921B2 (enrdf_load_stackoverflow) 1990-09-03

Family

ID=16391860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59198483A Granted JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Country Status (1)

Country Link
JP (1) JPS6177002A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2586509B2 (ja) * 1987-09-01 1997-03-05 ミノルタ株式会社 反射防止膜
JP2590924B2 (ja) * 1987-09-01 1997-03-19 ミノルタ株式会社 反射防止膜
JPH06140707A (ja) * 1992-10-27 1994-05-20 Showa Koki Seizo Kk 潮解性光学結晶の反射防止膜
US5661596A (en) * 1994-02-03 1997-08-26 Canon Kabushiki Kaisha Antireflection film and exposure apparatus using the same
JPH08220304A (ja) 1995-02-13 1996-08-30 Tadahiro Omi 光学物品及びそれを用いた露光装置又は光学系並びにその製造方法
JP3924806B2 (ja) * 1996-06-10 2007-06-06 株式会社ニコン 反射防止膜
KR100709045B1 (ko) * 1999-11-05 2007-04-18 아사히 가라스 가부시키가이샤 자외 및 진공자외 영역의 반사방지 기초체
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
JP2005257769A (ja) * 2004-03-09 2005-09-22 Canon Inc 光学薄膜、光学素子及びそれを用いた露光装置及び露光方法
KR20100095134A (ko) 2009-02-20 2010-08-30 엘지이노텍 주식회사 발광소자 및 그 제조방법

Also Published As

Publication number Publication date
JPS6177002A (ja) 1986-04-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term