JPS6177002A - 光反射防止膜 - Google Patents

光反射防止膜

Info

Publication number
JPS6177002A
JPS6177002A JP59198483A JP19848384A JPS6177002A JP S6177002 A JPS6177002 A JP S6177002A JP 59198483 A JP59198483 A JP 59198483A JP 19848384 A JP19848384 A JP 19848384A JP S6177002 A JPS6177002 A JP S6177002A
Authority
JP
Japan
Prior art keywords
refractive index
wavelength
layer
index material
low refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59198483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0238921B2 (enrdf_load_stackoverflow
Inventor
Yasushi Taniguchi
靖 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59198483A priority Critical patent/JPS6177002A/ja
Publication of JPS6177002A publication Critical patent/JPS6177002A/ja
Publication of JPH0238921B2 publication Critical patent/JPH0238921B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59198483A 1984-09-25 1984-09-25 光反射防止膜 Granted JPS6177002A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59198483A JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59198483A JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Publications (2)

Publication Number Publication Date
JPS6177002A true JPS6177002A (ja) 1986-04-19
JPH0238921B2 JPH0238921B2 (enrdf_load_stackoverflow) 1990-09-03

Family

ID=16391860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59198483A Granted JPS6177002A (ja) 1984-09-25 1984-09-25 光反射防止膜

Country Status (1)

Country Link
JP (1) JPS6177002A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461702A (en) * 1987-09-01 1989-03-08 Minolta Camera Kk Antireflecting film
JPS6461701A (en) * 1987-09-01 1989-03-08 Minolta Camera Kk Antireflecting film
JPH06140707A (ja) * 1992-10-27 1994-05-20 Showa Koki Seizo Kk 潮解性光学結晶の反射防止膜
US5661596A (en) * 1994-02-03 1997-08-26 Canon Kabushiki Kaisha Antireflection film and exposure apparatus using the same
JPH09329702A (ja) * 1996-06-10 1997-12-22 Nikon Corp 反射防止膜
US5981075A (en) * 1995-02-13 1999-11-09 Canon Kabushiki Kaisha Optical articles and devices with a thin film containing krypton, xenon, or radon atoms
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
EP1227344A4 (en) * 1999-11-05 2005-08-31 Asahi Glass Co Ltd ANTIREFLECTION BASE FOR ULTRAVIOLET AND EXTREME ULTRAVIOLET ZONES
JP2005257769A (ja) * 2004-03-09 2005-09-22 Canon Inc 光学薄膜、光学素子及びそれを用いた露光装置及び露光方法
US8552443B2 (en) 2009-02-20 2013-10-08 Lg Innotek Co., Ltd. Light emitting device, light emitting device package and lighting system including the same

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461702A (en) * 1987-09-01 1989-03-08 Minolta Camera Kk Antireflecting film
JPS6461701A (en) * 1987-09-01 1989-03-08 Minolta Camera Kk Antireflecting film
JPH06140707A (ja) * 1992-10-27 1994-05-20 Showa Koki Seizo Kk 潮解性光学結晶の反射防止膜
US5661596A (en) * 1994-02-03 1997-08-26 Canon Kabushiki Kaisha Antireflection film and exposure apparatus using the same
US5981075A (en) * 1995-02-13 1999-11-09 Canon Kabushiki Kaisha Optical articles and devices with a thin film containing krypton, xenon, or radon atoms
US6372646B2 (en) 1995-02-13 2002-04-16 Canon Kabushiki Kaisha Optical article, exposure apparatus or optical system using it, and process for producing it
US6726814B2 (en) 1995-02-13 2004-04-27 Canon Kk Process for producing optical article
US5963365A (en) * 1996-06-10 1999-10-05 Nikon Corporation three layer anti-reflective coating for optical substrate
JPH09329702A (ja) * 1996-06-10 1997-12-22 Nikon Corp 反射防止膜
EP1227344A4 (en) * 1999-11-05 2005-08-31 Asahi Glass Co Ltd ANTIREFLECTION BASE FOR ULTRAVIOLET AND EXTREME ULTRAVIOLET ZONES
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
JP2005257769A (ja) * 2004-03-09 2005-09-22 Canon Inc 光学薄膜、光学素子及びそれを用いた露光装置及び露光方法
US8552443B2 (en) 2009-02-20 2013-10-08 Lg Innotek Co., Ltd. Light emitting device, light emitting device package and lighting system including the same

Also Published As

Publication number Publication date
JPH0238921B2 (enrdf_load_stackoverflow) 1990-09-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term