JPH0237688B2 - - Google Patents

Info

Publication number
JPH0237688B2
JPH0237688B2 JP59269986A JP26998684A JPH0237688B2 JP H0237688 B2 JPH0237688 B2 JP H0237688B2 JP 59269986 A JP59269986 A JP 59269986A JP 26998684 A JP26998684 A JP 26998684A JP H0237688 B2 JPH0237688 B2 JP H0237688B2
Authority
JP
Japan
Prior art keywords
substrate
resist
cooling
baking
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59269986A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61147528A (ja
Inventor
Yasuo Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP59269986A priority Critical patent/JPS61147528A/ja
Priority to EP85116113A priority patent/EP0185366B1/en
Priority to DE8585116113T priority patent/DE3580978D1/de
Priority to KR1019850009520A priority patent/KR900003362B1/ko
Publication of JPS61147528A publication Critical patent/JPS61147528A/ja
Priority to US07/129,907 priority patent/US4946764A/en
Publication of JPH0237688B2 publication Critical patent/JPH0237688B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP59269986A 1984-12-21 1984-12-21 レジスト処理装置 Granted JPS61147528A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59269986A JPS61147528A (ja) 1984-12-21 1984-12-21 レジスト処理装置
EP85116113A EP0185366B1 (en) 1984-12-21 1985-12-17 Method of forming resist pattern
DE8585116113T DE3580978D1 (de) 1984-12-21 1985-12-17 Verfahren zur herstellung von resistmustern.
KR1019850009520A KR900003362B1 (ko) 1984-12-21 1985-12-18 레지스트 패턴의 형성방법과 그에 따른 레지스트막의 처리장치
US07/129,907 US4946764A (en) 1984-12-21 1987-12-07 Method of forming resist pattern and resist processing apparatus used in this method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59269986A JPS61147528A (ja) 1984-12-21 1984-12-21 レジスト処理装置

Publications (2)

Publication Number Publication Date
JPS61147528A JPS61147528A (ja) 1986-07-05
JPH0237688B2 true JPH0237688B2 (en, 2012) 1990-08-27

Family

ID=17479975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59269986A Granted JPS61147528A (ja) 1984-12-21 1984-12-21 レジスト処理装置

Country Status (1)

Country Link
JP (1) JPS61147528A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6379636U (en, 2012) * 1986-11-13 1988-05-26
JPH06103663B2 (ja) * 1987-01-21 1994-12-14 東京エレクトロン株式会社 処理装置
JPH06103665B2 (ja) * 1987-01-29 1994-12-14 東京エレクトロン株式会社 処理装置
JPH07111948B2 (ja) * 1987-12-23 1995-11-29 東京エレクトロン九州株式会社 ベーキング装置
JPH05315236A (ja) * 1991-05-17 1993-11-26 Fujitsu Ltd 被処理基板の加熱方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127857Y2 (en, 2012) * 1979-07-30 1986-08-19
JPS5627149A (en) * 1979-08-13 1981-03-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Table
JPS5950439U (ja) * 1982-09-27 1984-04-03 キヤノン株式会社 半導体露光装置
JPS59132618A (ja) * 1983-01-19 1984-07-30 Toshiba Corp レジストパタ−ンの形成方法及びその装置

Also Published As

Publication number Publication date
JPS61147528A (ja) 1986-07-05

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term