JPH0237114B2 - - Google Patents
Info
- Publication number
- JPH0237114B2 JPH0237114B2 JP54165953A JP16595379A JPH0237114B2 JP H0237114 B2 JPH0237114 B2 JP H0237114B2 JP 54165953 A JP54165953 A JP 54165953A JP 16595379 A JP16595379 A JP 16595379A JP H0237114 B2 JPH0237114 B2 JP H0237114B2
- Authority
- JP
- Japan
- Prior art keywords
- conductivity type
- source
- electrode
- field effect
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs
- H10D30/603—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended drain IGFETs [EDMOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/65—Lateral DMOS [LDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
- H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/351—Substrate regions of field-effect devices
- H10D62/357—Substrate regions of field-effect devices of FETs
- H10D62/364—Substrate regions of field-effect devices of FETs of IGFETs
- H10D62/378—Contact regions to the substrate regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/254—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes extend entirely through the semiconductor bodies, e.g. via-holes for back side contacts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/512—Disposition of the gate electrodes, e.g. buried gates
- H10D64/513—Disposition of the gate electrodes, e.g. buried gates within recesses in the substrate, e.g. trench gates, groove gates or buried gates
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16595379A JPS5688363A (en) | 1979-12-20 | 1979-12-20 | Field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16595379A JPS5688363A (en) | 1979-12-20 | 1979-12-20 | Field effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5688363A JPS5688363A (en) | 1981-07-17 |
JPH0237114B2 true JPH0237114B2 (enrdf_load_stackoverflow) | 1990-08-22 |
Family
ID=15822147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16595379A Granted JPS5688363A (en) | 1979-12-20 | 1979-12-20 | Field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5688363A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0564693U (ja) * | 1992-02-03 | 1993-08-27 | 碧南特殊機械株式会社 | 窯業製品の乾燥台車 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58111373A (ja) * | 1981-12-21 | 1983-07-02 | テキサス・インスツルメンツ・インコ−ポレイテツド | D―mos半導体装置 |
JPS6076160A (ja) * | 1983-10-03 | 1985-04-30 | Seiko Epson Corp | 半導体集積回路 |
JPS60229368A (ja) * | 1984-04-27 | 1985-11-14 | Olympus Optical Co Ltd | 固体撮像装置 |
US4809045A (en) * | 1985-09-30 | 1989-02-28 | General Electric Company | Insulated gate device |
US4857977A (en) * | 1987-08-24 | 1989-08-15 | General Electric Comapny | Lateral metal-oxide-semiconductor controlled triacs |
JPH01140773A (ja) * | 1987-11-27 | 1989-06-01 | Hitachi Ltd | 絶縁ゲート形トランジスタ |
JP3307481B2 (ja) * | 1993-11-05 | 2002-07-24 | 三菱電機株式会社 | 半導体装置 |
TW400560B (en) * | 1996-12-23 | 2000-08-01 | Koninkl Philips Electronics Nv | Semiconductor device |
TW366543B (en) * | 1996-12-23 | 1999-08-11 | Nxp Bv | Semiconductor device |
JP3120389B2 (ja) | 1998-04-16 | 2000-12-25 | 日本電気株式会社 | 半導体装置 |
DE19828494B4 (de) | 1998-06-26 | 2005-07-07 | Robert Bosch Gmbh | MOSFET-Bauelement mit Schutzvorrichtung gegen Durchschalten eines parasitären Transistors |
EP1538677A1 (en) | 2003-12-05 | 2005-06-08 | STMicroelectronics S.r.l. | LDMOS structure and method of making the same |
EP1538678B1 (en) * | 2003-12-05 | 2008-07-16 | STMicroelectronics S.r.l. | DMOS structure and method of making the same |
JP5078273B2 (ja) * | 2006-03-31 | 2012-11-21 | 株式会社リコー | 半導体装置 |
JP5700649B2 (ja) * | 2011-01-24 | 2015-04-15 | 旭化成エレクトロニクス株式会社 | 半導体装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5045574A (enrdf_load_stackoverflow) * | 1973-08-24 | 1975-04-23 |
-
1979
- 1979-12-20 JP JP16595379A patent/JPS5688363A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0564693U (ja) * | 1992-02-03 | 1993-08-27 | 碧南特殊機械株式会社 | 窯業製品の乾燥台車 |
Also Published As
Publication number | Publication date |
---|---|
JPS5688363A (en) | 1981-07-17 |
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