JPH0236060B2 - - Google Patents
Info
- Publication number
- JPH0236060B2 JPH0236060B2 JP59191672A JP19167284A JPH0236060B2 JP H0236060 B2 JPH0236060 B2 JP H0236060B2 JP 59191672 A JP59191672 A JP 59191672A JP 19167284 A JP19167284 A JP 19167284A JP H0236060 B2 JPH0236060 B2 JP H0236060B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gaas
- layer
- temperature
- buffer layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P14/2905—
-
- H10P14/24—
-
- H10P14/3221—
-
- H10P14/3421—
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59191672A JPS6170715A (ja) | 1984-09-14 | 1984-09-14 | 化合物半導体の成長方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59191672A JPS6170715A (ja) | 1984-09-14 | 1984-09-14 | 化合物半導体の成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6170715A JPS6170715A (ja) | 1986-04-11 |
| JPH0236060B2 true JPH0236060B2 (OSRAM) | 1990-08-15 |
Family
ID=16278536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59191672A Granted JPS6170715A (ja) | 1984-09-14 | 1984-09-14 | 化合物半導体の成長方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6170715A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH058961U (ja) * | 1991-07-15 | 1993-02-05 | スタンレー電気株式会社 | 表面実装型led |
| JPH0579586U (ja) * | 1991-05-28 | 1993-10-29 | エムケー精工株式会社 | 発光ダイオード表示装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2676144B2 (ja) * | 1987-07-27 | 1997-11-12 | 日本電信電話株式会社 | 砒化ガリウムの成長方法 |
| EP0603780B1 (en) * | 1992-12-21 | 1998-04-29 | Nippon Steel Corporation | Method of growing compound semiconductor on silicon wafer |
| US5833749A (en) * | 1995-01-19 | 1998-11-10 | Nippon Steel Corporation | Compound semiconductor substrate and process of producing same |
| JP2010225981A (ja) * | 2009-03-25 | 2010-10-07 | Fujitsu Ltd | 光半導体素子、集積素子、光半導体素子の製造方法 |
| US10096473B2 (en) * | 2016-04-07 | 2018-10-09 | Aixtron Se | Formation of a layer on a semiconductor substrate |
-
1984
- 1984-09-14 JP JP59191672A patent/JPS6170715A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0579586U (ja) * | 1991-05-28 | 1993-10-29 | エムケー精工株式会社 | 発光ダイオード表示装置 |
| JPH058961U (ja) * | 1991-07-15 | 1993-02-05 | スタンレー電気株式会社 | 表面実装型led |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6170715A (ja) | 1986-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4177084A (en) | Method for producing a low defect layer of silicon-on-sapphire wafer | |
| JPS58130517A (ja) | 単結晶薄膜の製造方法 | |
| JP3270945B2 (ja) | ヘテロエピタキシャル成長方法 | |
| JPH0562911A (ja) | 半導体超格子の製造方法 | |
| US5252173A (en) | Process for growing semiconductor layer on substrate | |
| JPH0236060B2 (OSRAM) | ||
| JP3157280B2 (ja) | 半導体装置の製造方法 | |
| JPH0310595B2 (OSRAM) | ||
| JPH02139918A (ja) | ヘテロ構造体の製造方法 | |
| JPS6012775B2 (ja) | 異質基板上への単結晶半導体層形成方法 | |
| JP2003171200A (ja) | 化合物半導体の結晶成長法、及び化合物半導体装置 | |
| JP2874262B2 (ja) | 半導体装置の製造方法 | |
| KR100329776B1 (ko) | 실리콘웨이퍼의표면결함제거를위한반도체소자제조방법 | |
| JPS62279625A (ja) | エピタキシヤル成長法 | |
| JPH0222812A (ja) | 化合物半導体層の成長方法 | |
| JPH02105517A (ja) | 半導体装置の製造方法 | |
| JP2696928B2 (ja) | ヘテロエピタキシャル成長方法 | |
| JP2000306915A (ja) | シリコンウエハの製造方法 | |
| JP2985413B2 (ja) | 化合物半導体装置の製造方法 | |
| JPS60236213A (ja) | 半導体基盤の製造方法 | |
| JPH047819A (ja) | GaAs薄膜 | |
| EP0312202A1 (en) | Crystal formation method | |
| JPH04124814A (ja) | Soi基板の作製方法 | |
| JPH06188164A (ja) | エピタキシャル成長用基板及びエピタキシャル成長方法 | |
| JPH0613328A (ja) | 化合物半導体薄膜の成長方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |