JPH0229729Y2 - - Google Patents

Info

Publication number
JPH0229729Y2
JPH0229729Y2 JP1982113716U JP11371682U JPH0229729Y2 JP H0229729 Y2 JPH0229729 Y2 JP H0229729Y2 JP 1982113716 U JP1982113716 U JP 1982113716U JP 11371682 U JP11371682 U JP 11371682U JP H0229729 Y2 JPH0229729 Y2 JP H0229729Y2
Authority
JP
Japan
Prior art keywords
semiconductor layer
semiconductor
layer
type
impurity concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982113716U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5936264U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1982113716U priority Critical patent/JPS5936264U/ja
Publication of JPS5936264U publication Critical patent/JPS5936264U/ja
Application granted granted Critical
Publication of JPH0229729Y2 publication Critical patent/JPH0229729Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP1982113716U 1982-07-27 1982-07-27 シヨツトキバリア半導体装置 Granted JPS5936264U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1982113716U JPS5936264U (ja) 1982-07-27 1982-07-27 シヨツトキバリア半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982113716U JPS5936264U (ja) 1982-07-27 1982-07-27 シヨツトキバリア半導体装置

Publications (2)

Publication Number Publication Date
JPS5936264U JPS5936264U (ja) 1984-03-07
JPH0229729Y2 true JPH0229729Y2 (enrdf_load_stackoverflow) 1990-08-09

Family

ID=30263134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982113716U Granted JPS5936264U (ja) 1982-07-27 1982-07-27 シヨツトキバリア半導体装置

Country Status (1)

Country Link
JP (1) JPS5936264U (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750791B2 (ja) * 1989-09-20 1995-05-31 株式会社日立製作所 半導体整流ダイオード及びそれを使つた電源装置並びに電子計算機
US7355260B2 (en) * 2004-06-30 2008-04-08 Freescale Semiconductor, Inc. Schottky device and method of forming
US7436022B2 (en) * 2005-02-11 2008-10-14 Alpha & Omega Semiconductors, Ltd. Enhancing Schottky breakdown voltage (BV) without affecting an integrated MOSFET-Schottky device layout
CN103534810B (zh) * 2011-05-18 2017-05-17 罗姆股份有限公司 半导体装置及其制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522446A (en) * 1975-06-24 1977-01-10 Ushio Inc Information reading apparatus
JPS528781A (en) * 1975-07-10 1977-01-22 Mitsubishi Electric Corp Schottky barrier diode
JPS5935183B2 (ja) * 1975-08-20 1984-08-27 サンケイ電気 (株) シヨツトキバリア半導体装置
JPS5737886A (en) * 1980-08-20 1982-03-02 Hitachi Ltd Semiconductor device

Also Published As

Publication number Publication date
JPS5936264U (ja) 1984-03-07

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