JPH02175861A - アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 - Google Patents
アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法Info
- Publication number
- JPH02175861A JPH02175861A JP63137514A JP13751488A JPH02175861A JP H02175861 A JPH02175861 A JP H02175861A JP 63137514 A JP63137514 A JP 63137514A JP 13751488 A JP13751488 A JP 13751488A JP H02175861 A JPH02175861 A JP H02175861A
- Authority
- JP
- Japan
- Prior art keywords
- alkaline earth
- earth metal
- arc chamber
- chamber
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 title claims abstract description 17
- 230000015572 biosynthetic process Effects 0.000 title 1
- 150000002500 ions Chemical class 0.000 claims abstract description 38
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 16
- 150000001540 azides Chemical class 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 16
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000011148 porous material Substances 0.000 claims description 16
- 238000000605 extraction Methods 0.000 claims description 12
- 150000001341 alkaline earth metal compounds Chemical class 0.000 claims description 7
- -1 alkaline earth metal azide Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 abstract 1
- 229910001422 barium ion Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- IVRMZWNICZWHMI-UHFFFAOYSA-N Azide Chemical compound [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63137514A JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63137514A JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02175861A true JPH02175861A (ja) | 1990-07-09 |
JPH0472343B2 JPH0472343B2 (enrdf_load_stackoverflow) | 1992-11-18 |
Family
ID=15200452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63137514A Granted JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02175861A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008311125A (ja) * | 2007-06-15 | 2008-12-25 | Nec Electronics Corp | 気化装置およびこれを備えたイオン源装置 |
JP2021506081A (ja) * | 2017-12-12 | 2021-02-18 | アプライド マテリアルズ インコーポレイテッドApplied Materials, Inc. | イオン源および傍熱型陰極イオン源 |
-
1988
- 1988-06-06 JP JP63137514A patent/JPH02175861A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008311125A (ja) * | 2007-06-15 | 2008-12-25 | Nec Electronics Corp | 気化装置およびこれを備えたイオン源装置 |
JP2021506081A (ja) * | 2017-12-12 | 2021-02-18 | アプライド マテリアルズ インコーポレイテッドApplied Materials, Inc. | イオン源および傍熱型陰極イオン源 |
Also Published As
Publication number | Publication date |
---|---|
JPH0472343B2 (enrdf_load_stackoverflow) | 1992-11-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2190086A1 (en) | An Electron Jet Vapor Deposition System | |
US4298798A (en) | Method and apparatus for producing negative ions | |
JP3444793B2 (ja) | ガス放電パネルの製造方法 | |
JPH02175861A (ja) | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 | |
Inoue et al. | Effect of filament material and area on the extracted current from a volume H-ion source | |
JP3647507B2 (ja) | ガスクラスターおよびガスクラスターイオンの 形成方法 | |
JP2849771B2 (ja) | スパッタ型イオン源 | |
JPS5489983A (en) | Device and method for vacuum deposition compound | |
US5480286A (en) | Exhaust apparatus and vacuum pumping unit including the exhaust apparatus | |
KR900008155B1 (ko) | 박막형성방법 및 그 장치 | |
JPH01290758A (ja) | 酸化物薄膜の製造方法 | |
JP2623715B2 (ja) | 薄膜形成装置 | |
JP2605148B2 (ja) | 酸化物薄膜の製造方法 | |
US3502259A (en) | Stabilized ion-pumping system | |
JPH11238485A (ja) | イオン注入方法 | |
EP0499239B1 (en) | Ion pump and vacuum pumping unit using the same | |
JP3087176B1 (ja) | イオン源 | |
JPH0577138B2 (enrdf_load_stackoverflow) | ||
JPS60125368A (ja) | 薄膜蒸着装置 | |
JP3169278B2 (ja) | 薄膜形成方法及び薄膜形成装置 | |
Inouet et al. | I Effect of filament material and area on the extracted current I from | |
JPS584920A (ja) | 半導体の製造方法 | |
JPH04289161A (ja) | 膜形成装置 | |
JPS59217332A (ja) | 二酸化硅素膜の製造方法 | |
JPH01139758A (ja) | 薄膜蒸着方法および薄膜蒸着装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |