JPH0577138B2 - - Google Patents
Info
- Publication number
- JPH0577138B2 JPH0577138B2 JP63308070A JP30807088A JPH0577138B2 JP H0577138 B2 JPH0577138 B2 JP H0577138B2 JP 63308070 A JP63308070 A JP 63308070A JP 30807088 A JP30807088 A JP 30807088A JP H0577138 B2 JPH0577138 B2 JP H0577138B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- filament
- metal
- generation chamber
- plasma generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 50
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 47
- 150000002500 ions Chemical class 0.000 claims description 39
- 238000000605 extraction Methods 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 description 20
- 229910021645 metal ion Inorganic materials 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 239000012159 carrier gas Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- -1 Ta and Ti Chemical class 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63308070A JPH02155148A (ja) | 1988-12-06 | 1988-12-06 | イオン源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63308070A JPH02155148A (ja) | 1988-12-06 | 1988-12-06 | イオン源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02155148A JPH02155148A (ja) | 1990-06-14 |
| JPH0577138B2 true JPH0577138B2 (enrdf_load_stackoverflow) | 1993-10-26 |
Family
ID=17976517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63308070A Granted JPH02155148A (ja) | 1988-12-06 | 1988-12-06 | イオン源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02155148A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023154377A (ja) * | 2022-04-06 | 2023-10-19 | 日新イオン機器株式会社 | 気化器及びこれを備えたイオン源、アルミニウム含有蒸気の生成方法 |
-
1988
- 1988-12-06 JP JP63308070A patent/JPH02155148A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02155148A (ja) | 1990-06-14 |
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