JPH0472343B2 - - Google Patents
Info
- Publication number
- JPH0472343B2 JPH0472343B2 JP63137514A JP13751488A JPH0472343B2 JP H0472343 B2 JPH0472343 B2 JP H0472343B2 JP 63137514 A JP63137514 A JP 63137514A JP 13751488 A JP13751488 A JP 13751488A JP H0472343 B2 JPH0472343 B2 JP H0472343B2
- Authority
- JP
- Japan
- Prior art keywords
- arc chamber
- chamber
- earth metal
- discharge chamber
- alkaline earth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 36
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000011148 porous material Substances 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 15
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 13
- 238000000605 extraction Methods 0.000 claims description 13
- 150000001540 azides Chemical class 0.000 claims description 12
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 11
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 150000001341 alkaline earth metal compounds Chemical class 0.000 claims description 5
- -1 alkaline earth metal azide Chemical class 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 238000009434 installation Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 2
- 229910001422 barium ion Inorganic materials 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- GLGNXYJARSMNGJ-VKTIVEEGSA-N (1s,2s,3r,4r)-3-[[5-chloro-2-[(1-ethyl-6-methoxy-2-oxo-4,5-dihydro-3h-1-benzazepin-7-yl)amino]pyrimidin-4-yl]amino]bicyclo[2.2.1]hept-5-ene-2-carboxamide Chemical compound CCN1C(=O)CCCC2=C(OC)C(NC=3N=C(C(=CN=3)Cl)N[C@H]3[C@H]([C@@]4([H])C[C@@]3(C=C4)[H])C(N)=O)=CC=C21 GLGNXYJARSMNGJ-VKTIVEEGSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940125758 compound 15 Drugs 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910001427 strontium ion Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63137514A JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63137514A JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02175861A JPH02175861A (ja) | 1990-07-09 |
| JPH0472343B2 true JPH0472343B2 (enrdf_load_stackoverflow) | 1992-11-18 |
Family
ID=15200452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63137514A Granted JPH02175861A (ja) | 1988-06-06 | 1988-06-06 | アルカリ土類金属イオン源及びアルカリ土類金属イオンの生成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02175861A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008311125A (ja) * | 2007-06-15 | 2008-12-25 | Nec Electronics Corp | 気化装置およびこれを備えたイオン源装置 |
| JP6948468B2 (ja) * | 2017-12-12 | 2021-10-13 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ， Ｉｎｃ． | イオン源および傍熱型陰極イオン源 |
-
1988
- 1988-06-06 JP JP63137514A patent/JPH02175861A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02175861A (ja) | 1990-07-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |