JPH02140972U - - Google Patents
Info
- Publication number
- JPH02140972U JPH02140972U JP4767089U JP4767089U JPH02140972U JP H02140972 U JPH02140972 U JP H02140972U JP 4767089 U JP4767089 U JP 4767089U JP 4767089 U JP4767089 U JP 4767089U JP H02140972 U JPH02140972 U JP H02140972U
- Authority
- JP
- Japan
- Prior art keywords
- cathode electrode
- film
- plasma
- processing chamber
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989047670U JPH0630850Y2 (ja) | 1989-04-25 | 1989-04-25 | プラズマｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989047670U JPH0630850Y2 (ja) | 1989-04-25 | 1989-04-25 | プラズマｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02140972U true JPH02140972U (enrdf_load_stackoverflow) | 1990-11-26 |
| JPH0630850Y2 JPH0630850Y2 (ja) | 1994-08-17 |
Family
ID=31563804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989047670U Expired - Lifetime JPH0630850Y2 (ja) | 1989-04-25 | 1989-04-25 | プラズマｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630850Y2 (enrdf_load_stackoverflow) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944770U (ja) * | 1982-09-18 | 1984-03-24 | 日電アネルバ株式会社 | プラズマｃｖｄ装置 |
| JPS5972722A (ja) * | 1982-09-16 | 1984-04-24 | エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド | 非均質膜のデポジシヨンを防止する基板シ−ルド |
| JPS60117715A (ja) * | 1983-11-30 | 1985-06-25 | Zenko Hirose | 成膜方法 |
| JPS62185879A (ja) * | 1986-02-12 | 1987-08-14 | Kobe Steel Ltd | アモルフアスカ−ボン膜の成膜方法 |
-
1989
- 1989-04-25 JP JP1989047670U patent/JPH0630850Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5972722A (ja) * | 1982-09-16 | 1984-04-24 | エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド | 非均質膜のデポジシヨンを防止する基板シ−ルド |
| JPS5944770U (ja) * | 1982-09-18 | 1984-03-24 | 日電アネルバ株式会社 | プラズマｃｖｄ装置 |
| JPS60117715A (ja) * | 1983-11-30 | 1985-06-25 | Zenko Hirose | 成膜方法 |
| JPS62185879A (ja) * | 1986-02-12 | 1987-08-14 | Kobe Steel Ltd | アモルフアスカ−ボン膜の成膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0630850Y2 (ja) | 1994-08-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20040025788A1 (en) | Plasma processing device and exhaust ring | |
| ITMI972862A1 (it) | Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore | |
| AU2003229731A1 (en) | An atmospheric pressure plasma assembly | |
| ES8708093A1 (es) | Un aparato para la deposicion en continuo de material de aleacion semiconductora | |
| JPH02140972U (enrdf_load_stackoverflow) | ||
| JPH0452611B2 (enrdf_load_stackoverflow) | ||
| JPS57100720A (en) | Manufacture of amorphous semiconductor film | |
| JPH0240738B2 (enrdf_load_stackoverflow) | ||
| JPH077324Y2 (ja) | 皮膜形成装置 | |
| JPS5815494Y2 (ja) | 処理装置 | |
| JPS5435178A (en) | Ultrafine particle depositing apparatus | |
| GB1394655A (en) | Deposition of thin layers from the vapour phase under the simultaneous action of an ionised gas | |
| JPH01188764A (ja) | 高真空用ガスケツト | |
| JPS56121631A (en) | Film forming device | |
| JPH11350118A (ja) | 成膜装置 | |
| CN1326178C (zh) | 全方向蒸散型吸气装置 | |
| JPH0186227U (enrdf_load_stackoverflow) | ||
| JPH0778769A (ja) | 半導体製造装置 | |
| JPH05345980A (ja) | シートプラズマ成膜装置のアノード部構造 | |
| JPS57117240A (en) | High-frequency sputtering etching device | |
| JPH02106457U (enrdf_load_stackoverflow) | ||
| JPH0714823A (ja) | エッチング装置 | |
| JPH07278785A (ja) | 薄膜パターン形成装置 | |
| JPS62172718A (ja) | 堆積膜形成装置 | |
| JPH04133429U (ja) | 半導体製造装置 |