JPH0240738B2 - - Google Patents
Info
- Publication number
- JPH0240738B2 JPH0240738B2 JP62180387A JP18038787A JPH0240738B2 JP H0240738 B2 JPH0240738 B2 JP H0240738B2 JP 62180387 A JP62180387 A JP 62180387A JP 18038787 A JP18038787 A JP 18038787A JP H0240738 B2 JPH0240738 B2 JP H0240738B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reflector
- chamber
- gas introduction
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18038787A JPS6425976A (en) | 1987-07-20 | 1987-07-20 | Sputtering device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18038787A JPS6425976A (en) | 1987-07-20 | 1987-07-20 | Sputtering device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6425976A JPS6425976A (en) | 1989-01-27 |
JPH0240738B2 true JPH0240738B2 (enrdf_load_stackoverflow) | 1990-09-13 |
Family
ID=16082341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18038787A Granted JPS6425976A (en) | 1987-07-20 | 1987-07-20 | Sputtering device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6425976A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02225663A (ja) * | 1989-02-27 | 1990-09-07 | Tokuda Seisakusho Ltd | スパッタ装置 |
EP0919722B1 (en) * | 1994-04-28 | 2003-07-16 | Ebara Corporation | Regeneration of a cryopump |
GB2472101A (en) | 2009-07-24 | 2011-01-26 | Natural Adcampaign Ltd | Advertising and display structures |
-
1987
- 1987-07-20 JP JP18038787A patent/JPS6425976A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6425976A (en) | 1989-01-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6994502B2 (ja) | プラズマ処理チャンバ用プラズマスクリーン | |
KR101056219B1 (ko) | 샤워헤드 및 기판 처리 장치 | |
US5441568A (en) | Exhaust baffle for uniform gas flow pattern | |
CN100573816C (zh) | 反应腔室内衬及包含该内衬的反应腔室 | |
DE112013006223B4 (de) | Substratbearbeitungsgerät | |
US20070218701A1 (en) | Semiconductor-processing apparatus with rotating susceptor | |
US5770025A (en) | Magnetron sputtering apparatus | |
JPH0397869A (ja) | 半導体ウェーハの裏面及び端縁から付着物を除去するための方法及び装置 | |
KR100274709B1 (ko) | 막을 증착하는 방법 및 스퍼터링 장치 | |
US5210055A (en) | Method for the plasma treatment of semiconductor devices | |
JPH0240738B2 (enrdf_load_stackoverflow) | ||
US6709556B2 (en) | Plasma processing apparatus | |
KR20140100764A (ko) | 기판 처리 장치 | |
JP4327319B2 (ja) | 雛壇形シャワーヘッド、及びそのシャワーヘッドを用いた真空処理装置 | |
JPS61208222A (ja) | プラズマ処理方法及び装置 | |
JPS6353932A (ja) | 半導体ウエハ−の薄膜成長装置 | |
JP2021533275A (ja) | アーク放電を低減させた物理的気相堆積(pvd)チャンバ | |
KR101777729B1 (ko) | 플라즈마 처리 장치 및 그 처리 가스 공급 구조체 | |
JPH03107481A (ja) | プラズマ処理装置 | |
KR102291236B1 (ko) | 기판 처리 장치 | |
JPH05345980A (ja) | シートプラズマ成膜装置のアノード部構造 | |
KR200169706Y1 (ko) | 반도체 제조용 스퍼터링장치 | |
KR20100060086A (ko) | 세라믹 돔 및 이를 구비하는 플라즈마 처리 장치 | |
JPH0630850Y2 (ja) | プラズマcvd装置 | |
KR102302922B1 (ko) | 기판처리장치 |