JPH0213822B2 - - Google Patents
Info
- Publication number
- JPH0213822B2 JPH0213822B2 JP59259138A JP25913884A JPH0213822B2 JP H0213822 B2 JPH0213822 B2 JP H0213822B2 JP 59259138 A JP59259138 A JP 59259138A JP 25913884 A JP25913884 A JP 25913884A JP H0213822 B2 JPH0213822 B2 JP H0213822B2
- Authority
- JP
- Japan
- Prior art keywords
- channel
- well
- transistor
- type
- impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/859—Complementary IGFETs, e.g. CMOS comprising both N-type and P-type wells, e.g. twin-tub
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59259138A JPS60143659A (ja) | 1984-12-10 | 1984-12-10 | 相補形絶縁ゲート電界効果トランジスタ集積回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59259138A JPS60143659A (ja) | 1984-12-10 | 1984-12-10 | 相補形絶縁ゲート電界効果トランジスタ集積回路 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9770776A Division JPS5323577A (en) | 1976-08-18 | 1976-08-18 | Complementary type insulated gate effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60143659A JPS60143659A (ja) | 1985-07-29 |
JPH0213822B2 true JPH0213822B2 (enrdf_load_stackoverflow) | 1990-04-05 |
Family
ID=17329851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59259138A Granted JPS60143659A (ja) | 1984-12-10 | 1984-12-10 | 相補形絶縁ゲート電界効果トランジスタ集積回路 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60143659A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2554361B2 (ja) * | 1988-07-13 | 1996-11-13 | 沖電気工業株式会社 | 半導体素子の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS555696B2 (enrdf_load_stackoverflow) * | 1973-04-12 | 1980-02-08 |
-
1984
- 1984-12-10 JP JP59259138A patent/JPS60143659A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60143659A (ja) | 1985-07-29 |
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