JPH0213822B2 - - Google Patents

Info

Publication number
JPH0213822B2
JPH0213822B2 JP59259138A JP25913884A JPH0213822B2 JP H0213822 B2 JPH0213822 B2 JP H0213822B2 JP 59259138 A JP59259138 A JP 59259138A JP 25913884 A JP25913884 A JP 25913884A JP H0213822 B2 JPH0213822 B2 JP H0213822B2
Authority
JP
Japan
Prior art keywords
channel
well
transistor
type
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59259138A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60143659A (ja
Inventor
Yoshio Sakai
Toshiaki Masuhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59259138A priority Critical patent/JPS60143659A/ja
Publication of JPS60143659A publication Critical patent/JPS60143659A/ja
Publication of JPH0213822B2 publication Critical patent/JPH0213822B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/859Complementary IGFETs, e.g. CMOS comprising both N-type and P-type wells, e.g. twin-tub

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
JP59259138A 1984-12-10 1984-12-10 相補形絶縁ゲート電界効果トランジスタ集積回路 Granted JPS60143659A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59259138A JPS60143659A (ja) 1984-12-10 1984-12-10 相補形絶縁ゲート電界効果トランジスタ集積回路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59259138A JPS60143659A (ja) 1984-12-10 1984-12-10 相補形絶縁ゲート電界効果トランジスタ集積回路

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP9770776A Division JPS5323577A (en) 1976-08-18 1976-08-18 Complementary type insulated gate effect transistor

Publications (2)

Publication Number Publication Date
JPS60143659A JPS60143659A (ja) 1985-07-29
JPH0213822B2 true JPH0213822B2 (enrdf_load_stackoverflow) 1990-04-05

Family

ID=17329851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59259138A Granted JPS60143659A (ja) 1984-12-10 1984-12-10 相補形絶縁ゲート電界効果トランジスタ集積回路

Country Status (1)

Country Link
JP (1) JPS60143659A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2554361B2 (ja) * 1988-07-13 1996-11-13 沖電気工業株式会社 半導体素子の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS555696B2 (enrdf_load_stackoverflow) * 1973-04-12 1980-02-08

Also Published As

Publication number Publication date
JPS60143659A (ja) 1985-07-29

Similar Documents

Publication Publication Date Title
JPH0832040A (ja) 半導体装置
JPH04276653A (ja) 集積回路デバイスの製造プロセス
JPS627701B2 (enrdf_load_stackoverflow)
JPH08186179A (ja) 相補型半導体装置
EP0091256B1 (en) Cmos device
JP3380117B2 (ja) 半導体装置とその製造方法
EP0583008B1 (en) Semiconductor integrated circuit device and method of manufacturing the same
JPH08125187A (ja) Soi構造mos型半導体装置およびその製造方法
KR100344489B1 (ko) 반도체집적회로장치의제조방법
KR100342804B1 (ko) 반도체 장치 및 그 제조 방법
JP2729422B2 (ja) 半導体装置
JPS628950B2 (enrdf_load_stackoverflow)
JPS638623B2 (enrdf_load_stackoverflow)
JPS6038856A (ja) 半導体装置及びその製造方法
JPH0213822B2 (enrdf_load_stackoverflow)
JP3193984B2 (ja) 高耐圧mosトランジスタ
JPS60143658A (ja) 相補形絶縁ゲート電界効果トランジスタ集積回路
JPH01164062A (ja) 半導体装置の製造方法
JPH0312473B2 (enrdf_load_stackoverflow)
JPH067556B2 (ja) Mis型半導体装置
JPH02138756A (ja) 半導体装置およびその製造方法
JPS61194764A (ja) 半導体装置の製造方法
JPH1126766A (ja) Mos型電界効果トランジスタおよびその製造方法
JP2953915B2 (ja) 半導体集積回路装置及びその製造方法
KR960003863B1 (ko) 불순물이 도프된 매입영역을 가진 반도체장치 및 그 제조방법