JPH02122067U - - Google Patents
Info
- Publication number
- JPH02122067U JPH02122067U JP3182589U JP3182589U JPH02122067U JP H02122067 U JPH02122067 U JP H02122067U JP 3182589 U JP3182589 U JP 3182589U JP 3182589 U JP3182589 U JP 3182589U JP H02122067 U JPH02122067 U JP H02122067U
- Authority
- JP
- Japan
- Prior art keywords
- jet
- plating
- semiconductor substrate
- cup
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
Landscapes
- Electrodes Of Semiconductors (AREA)
- Electroplating Methods And Accessories (AREA)
Description
第１図は本考案の実施例１を示す断面図、第２
図は本考案の実施例２を示す断面図、第３図は従
来例を示す断面図である。 １……噴流カツプ、２……噴流ベース、３……
電極ベース、４……電極カツプ、５……電極、６
……基板支持ピン、７……メツキ液、８……Ｏリ
ング、９……スプリング、１０……Ｎ２通路、１
１……半導体基板。
図は本考案の実施例２を示す断面図、第３図は従
来例を示す断面図である。 １……噴流カツプ、２……噴流ベース、３……
電極ベース、４……電極カツプ、５……電極、６
……基板支持ピン、７……メツキ液、８……Ｏリ
ング、９……スプリング、１０……Ｎ２通路、１
１……半導体基板。
Claims (1)
- 半導体基板の処理面にメツキ液の噴流を接触さ
せる噴流カツプと、半導体基板の裏面に電位を印
加する電極部を保持する電極カツプとを備えた噴
流式メツキ装置において、前記電極カツプに、半
導体基板の裏面へのメツキ液のまわり込みを防止
するＯリングを有することを特徴とする噴流式メ
ツキ装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3182589U JPH02122067U (ja) | 1989-03-20 | 1989-03-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3182589U JPH02122067U (ja) | 1989-03-20 | 1989-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02122067U true JPH02122067U (ja) | 1990-10-04 |
Family
ID=31257977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3182589U Pending JPH02122067U (ja) | 1989-03-20 | 1989-03-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02122067U (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177719A (ja) * | 1988-01-08 | 1989-07-14 | Yokogawa Electric Corp | 周波数標準器 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5319147A (en) * | 1976-08-07 | 1978-02-22 | Fuji Adobansu Kk | Plating device for semiconductor wafer |
| JPS5739438B2 (ja) * | 1976-09-07 | 1982-08-21 |
-
1989
- 1989-03-20 JP JP3182589U patent/JPH02122067U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5319147A (en) * | 1976-08-07 | 1978-02-22 | Fuji Adobansu Kk | Plating device for semiconductor wafer |
| JPS5739438B2 (ja) * | 1976-09-07 | 1982-08-21 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177719A (ja) * | 1988-01-08 | 1989-07-14 | Yokogawa Electric Corp | 周波数標準器 |