JPH0196091A - 半導体結晶の液相エピタキシャル成長装置 - Google Patents

半導体結晶の液相エピタキシャル成長装置

Info

Publication number
JPH0196091A
JPH0196091A JP25384287A JP25384287A JPH0196091A JP H0196091 A JPH0196091 A JP H0196091A JP 25384287 A JP25384287 A JP 25384287A JP 25384287 A JP25384287 A JP 25384287A JP H0196091 A JPH0196091 A JP H0196091A
Authority
JP
Japan
Prior art keywords
melt
crystal
substrate
liquid phase
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25384287A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0572359B2 (enrdf_load_stackoverflow
Inventor
Masaaki Sakata
雅昭 坂田
Kiyotaka Benzaki
辨崎　清隆
Hideo Kusuzawa
楠澤　英夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP25384287A priority Critical patent/JPH0196091A/ja
Publication of JPH0196091A publication Critical patent/JPH0196091A/ja
Publication of JPH0572359B2 publication Critical patent/JPH0572359B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP25384287A 1987-10-09 1987-10-09 半導体結晶の液相エピタキシャル成長装置 Granted JPH0196091A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25384287A JPH0196091A (ja) 1987-10-09 1987-10-09 半導体結晶の液相エピタキシャル成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25384287A JPH0196091A (ja) 1987-10-09 1987-10-09 半導体結晶の液相エピタキシャル成長装置

Publications (2)

Publication Number Publication Date
JPH0196091A true JPH0196091A (ja) 1989-04-14
JPH0572359B2 JPH0572359B2 (enrdf_load_stackoverflow) 1993-10-12

Family

ID=17256893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25384287A Granted JPH0196091A (ja) 1987-10-09 1987-10-09 半導体結晶の液相エピタキシャル成長装置

Country Status (1)

Country Link
JP (1) JPH0196091A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491174A (enrdf_load_stackoverflow) * 1972-04-14 1974-01-08
JPS6127976U (ja) * 1984-07-25 1986-02-19 株式会社ボッシュオートモーティブ システム 圧縮機における脈動減衰装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491174A (enrdf_load_stackoverflow) * 1972-04-14 1974-01-08
JPS6127976U (ja) * 1984-07-25 1986-02-19 株式会社ボッシュオートモーティブ システム 圧縮機における脈動減衰装置

Also Published As

Publication number Publication date
JPH0572359B2 (enrdf_load_stackoverflow) 1993-10-12

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