JPH0160767B2 - - Google Patents

Info

Publication number
JPH0160767B2
JPH0160767B2 JP58030829A JP3082983A JPH0160767B2 JP H0160767 B2 JPH0160767 B2 JP H0160767B2 JP 58030829 A JP58030829 A JP 58030829A JP 3082983 A JP3082983 A JP 3082983A JP H0160767 B2 JPH0160767 B2 JP H0160767B2
Authority
JP
Japan
Prior art keywords
pattern
defect
inspected
defect candidate
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58030829A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59157505A (ja
Inventor
Keiichi Okamoto
Mitsuzo Nakahata
Yukio Matsuyama
Hideaki Doi
Susumu Aiuchi
Mineo Nomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58030829A priority Critical patent/JPS59157505A/ja
Priority to US06/583,867 priority patent/US4628531A/en
Priority to EP84102032A priority patent/EP0117559B1/en
Priority to DE8484102032T priority patent/DE3484938D1/de
Publication of JPS59157505A publication Critical patent/JPS59157505A/ja
Publication of JPH0160767B2 publication Critical patent/JPH0160767B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP58030829A 1983-02-28 1983-02-28 パタ−ン検査装置 Granted JPS59157505A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58030829A JPS59157505A (ja) 1983-02-28 1983-02-28 パタ−ン検査装置
US06/583,867 US4628531A (en) 1983-02-28 1984-02-27 Pattern checking apparatus
EP84102032A EP0117559B1 (en) 1983-02-28 1984-02-27 Pattern checking apparatus
DE8484102032T DE3484938D1 (de) 1983-02-28 1984-02-27 Anlage zum ueberpruefen von mustern.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58030829A JPS59157505A (ja) 1983-02-28 1983-02-28 パタ−ン検査装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP30888990A Division JPH063541B2 (ja) 1990-11-16 1990-11-16 パターン検査装置

Publications (2)

Publication Number Publication Date
JPS59157505A JPS59157505A (ja) 1984-09-06
JPH0160767B2 true JPH0160767B2 (OSRAM) 1989-12-25

Family

ID=12314585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58030829A Granted JPS59157505A (ja) 1983-02-28 1983-02-28 パタ−ン検査装置

Country Status (4)

Country Link
US (1) US4628531A (OSRAM)
EP (1) EP0117559B1 (OSRAM)
JP (1) JPS59157505A (OSRAM)
DE (1) DE3484938D1 (OSRAM)

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CN101300473B (zh) * 2004-03-05 2012-10-31 以色列商奥宝科技股份有限公司 图案检视中偶生缺陷的验证
JP4585926B2 (ja) * 2005-06-17 2010-11-24 株式会社日立ハイテクノロジーズ パターンレイヤーデータ生成装置、それを用いたパターンレイヤーデータ生成システム、半導体パターン表示装置、パターンレイヤーデータ生成方法、及びコンピュータプログラム
JP4174504B2 (ja) * 2005-08-31 2008-11-05 アドバンスド・マスク・インスペクション・テクノロジー株式会社 試料検査装置、試料検査方法及びプログラム
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Also Published As

Publication number Publication date
DE3484938D1 (de) 1991-09-26
US4628531A (en) 1986-12-09
JPS59157505A (ja) 1984-09-06
EP0117559A2 (en) 1984-09-05
EP0117559A3 (en) 1987-10-28
EP0117559B1 (en) 1991-08-21

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