JPH0159354B2 - - Google Patents
Info
- Publication number
- JPH0159354B2 JPH0159354B2 JP62188029A JP18802987A JPH0159354B2 JP H0159354 B2 JPH0159354 B2 JP H0159354B2 JP 62188029 A JP62188029 A JP 62188029A JP 18802987 A JP18802987 A JP 18802987A JP H0159354 B2 JPH0159354 B2 JP H0159354B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- vacuum processing
- unloading
- chambers
- load
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18802987A JPS6431970A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18802987A JPS6431970A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6431970A JPS6431970A (en) | 1989-02-02 |
| JPH0159354B2 true JPH0159354B2 (OSRAM) | 1989-12-15 |
Family
ID=16216418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18802987A Granted JPS6431970A (en) | 1987-07-28 | 1987-07-28 | Vacuum treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6431970A (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2644912B2 (ja) | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | 真空処理装置及びその運転方法 |
| USRE39756E1 (en) * | 1990-08-29 | 2007-08-07 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
| US7089680B1 (en) | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
| USRE39824E1 (en) * | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61113766A (ja) * | 1984-11-09 | 1986-05-31 | Nissin Electric Co Ltd | エンドステ−シヨン |
-
1987
- 1987-07-28 JP JP18802987A patent/JPS6431970A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6431970A (en) | 1989-02-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |