JPS6431970A - Vacuum treatment equipment - Google Patents

Vacuum treatment equipment

Info

Publication number
JPS6431970A
JPS6431970A JP18802987A JP18802987A JPS6431970A JP S6431970 A JPS6431970 A JP S6431970A JP 18802987 A JP18802987 A JP 18802987A JP 18802987 A JP18802987 A JP 18802987A JP S6431970 A JPS6431970 A JP S6431970A
Authority
JP
Japan
Prior art keywords
chambers
vacuum treatment
gate valves
conveyed
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18802987A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159354B2 (OSRAM
Inventor
Hidetaka Jo
Osamu Watanabe
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd filed Critical Toshiba Corp
Priority to JP18802987A priority Critical patent/JPS6431970A/ja
Publication of JPS6431970A publication Critical patent/JPS6431970A/ja
Publication of JPH0159354B2 publication Critical patent/JPH0159354B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP18802987A 1987-07-28 1987-07-28 Vacuum treatment equipment Granted JPS6431970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18802987A JPS6431970A (en) 1987-07-28 1987-07-28 Vacuum treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18802987A JPS6431970A (en) 1987-07-28 1987-07-28 Vacuum treatment equipment

Publications (2)

Publication Number Publication Date
JPS6431970A true JPS6431970A (en) 1989-02-02
JPH0159354B2 JPH0159354B2 (OSRAM) 1989-12-15

Family

ID=16216418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18802987A Granted JPS6431970A (en) 1987-07-28 1987-07-28 Vacuum treatment equipment

Country Status (1)

Country Link
JP (1) JPS6431970A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5950330A (en) * 1990-08-29 1999-09-14 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US7089680B1 (en) 1990-08-29 2006-08-15 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
USRE39756E1 (en) * 1990-08-29 2007-08-07 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39776E1 (en) 1990-08-29 2007-08-21 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61113766A (ja) * 1984-11-09 1986-05-31 Nissin Electric Co Ltd エンドステ−シヨン

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61113766A (ja) * 1984-11-09 1986-05-31 Nissin Electric Co Ltd エンドステ−シヨン

Cited By (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6634116B2 (en) 1990-08-09 2003-10-21 Hitachi, Ltd. Vacuum processing apparatus
US6330755B1 (en) 1990-08-29 2001-12-18 Hitachi, Ltd. Vacuum processing and operating method
US6460270B2 (en) 1990-08-29 2002-10-08 Hitachi, Ltd. Vacuum processing apparatus
US6055740A (en) * 1990-08-29 2000-05-02 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6070341A (en) * 1990-08-29 2000-06-06 Hitachi, Ltd. Vacuum processing and operating method with wafers, substrates and/or semiconductors
US6108929A (en) * 1990-08-29 2000-08-29 Hitachi, Ltd. Vacuum processing apparatus
US6112431A (en) * 1990-08-29 2000-09-05 Hitachi, Ltd. Vacuum processing and operating method
US6263588B1 (en) 1990-08-29 2001-07-24 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6301802B1 (en) 1990-08-29 2001-10-16 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6301801B1 (en) 1990-08-29 2001-10-16 Shigekazu Kato Vacuum processing apparatus and operating method therefor
US6314658B2 (en) 1990-08-29 2001-11-13 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US5950330A (en) * 1990-08-29 1999-09-14 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6330756B1 (en) 1990-08-29 2001-12-18 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6332280B2 (en) 1990-08-29 2001-12-25 Hitachi, Ltd. Vacuum processing apparatus
US6446353B2 (en) 1990-08-29 2002-09-10 Hitachi, Ltd. Vacuum processing apparatus
US6457253B2 (en) 1990-08-29 2002-10-01 Hitachi, Ltd. Vacuum processing apparatus
US6484415B2 (en) 1990-08-29 2002-11-26 Hitachi, Ltd. Vacuum processing apparatus
US6463676B1 (en) 1990-08-29 2002-10-15 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6463678B2 (en) 1990-08-29 2002-10-15 Hitachi, Ltd. Substrate changing-over mechanism in a vaccum tank
US6467186B2 (en) 1990-08-29 2002-10-22 Hitachi, Ltd. Transferring device for a vacuum processing apparatus and operating method therefor
US6467187B2 (en) 1990-08-29 2002-10-22 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6470596B2 (en) 1990-08-29 2002-10-29 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6473989B2 (en) 1990-08-29 2002-11-05 Hitachi, Ltd. Conveying system for a vacuum processing apparatus
US6044576A (en) * 1990-08-29 2000-04-04 Hitachi, Ltd. Vacuum processing and operating method using a vacuum chamber
US6484414B2 (en) 1990-08-29 2002-11-26 Hitachi, Ltd. Vacuum processing apparatus
US6968630B2 (en) 1990-08-29 2005-11-29 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6487794B2 (en) 1990-08-29 2002-12-03 Hitachi, Ltd. Substrate changing-over mechanism in vacuum tank
US6487791B2 (en) 1990-08-29 2002-12-03 Hitachi, Ltd. Vacuum processing apparatus
US6490810B2 (en) 1990-08-29 2002-12-10 Hitachi, Ltd. Vacuum processing apparatus
US6499229B2 (en) 1990-08-29 2002-12-31 Hitachi, Ltd. Vacuum processing apparatus
US6505415B2 (en) 1990-08-29 2003-01-14 Hitachi, Ltd. Vacuum processing apparatus
US6588121B2 (en) 1990-08-29 2003-07-08 Hitachi, Ltd. Vacuum processing apparatus
US6625899B2 (en) 1990-08-29 2003-09-30 Hitachi, Ltd. Vacuum processing apparatus
US6012235A (en) * 1990-08-29 2000-01-11 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6655044B2 (en) 1990-08-29 2003-12-02 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6662465B2 (en) 1990-08-29 2003-12-16 Hitachi, Ltd. Vacuum processing apparatus
US6880264B2 (en) 1990-08-29 2005-04-19 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6886272B2 (en) 1990-08-29 2005-05-03 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6904699B2 (en) 1990-08-29 2005-06-14 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US6487793B2 (en) 1990-08-29 2002-12-03 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
US7089680B1 (en) 1990-08-29 2006-08-15 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
USRE39756E1 (en) * 1990-08-29 2007-08-07 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39776E1 (en) 1990-08-29 2007-08-21 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
USRE39775E1 (en) * 1990-08-29 2007-08-21 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39823E1 (en) * 1990-08-29 2007-09-11 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39824E1 (en) * 1990-08-29 2007-09-11 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
US7367135B2 (en) 1990-08-29 2008-05-06 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor

Also Published As

Publication number Publication date
JPH0159354B2 (OSRAM) 1989-12-15

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees