JPH0157779B2 - - Google Patents

Info

Publication number
JPH0157779B2
JPH0157779B2 JP56139353A JP13935381A JPH0157779B2 JP H0157779 B2 JPH0157779 B2 JP H0157779B2 JP 56139353 A JP56139353 A JP 56139353A JP 13935381 A JP13935381 A JP 13935381A JP H0157779 B2 JPH0157779 B2 JP H0157779B2
Authority
JP
Japan
Prior art keywords
resist
copolymer
pattern
present
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56139353A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5840827A (ja
Inventor
Katsuyuki Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56139353A priority Critical patent/JPS5840827A/ja
Priority to US06/339,414 priority patent/US4430419A/en
Priority to GB8201246A priority patent/GB2093048B/en
Priority to CA000394565A priority patent/CA1211600A/en
Priority to FR8200936A priority patent/FR2498198B1/fr
Priority to DE19823201815 priority patent/DE3201815A1/de
Priority to NLAANVRAGE8200211,A priority patent/NL186119C/xx
Publication of JPS5840827A publication Critical patent/JPS5840827A/ja
Publication of JPH0157779B2 publication Critical patent/JPH0157779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
JP56139353A 1981-01-22 1981-09-04 レジストパタ−ンの形成方法 Granted JPS5840827A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP56139353A JPS5840827A (ja) 1981-09-04 1981-09-04 レジストパタ−ンの形成方法
US06/339,414 US4430419A (en) 1981-01-22 1982-01-15 Positive resist and method for manufacturing a pattern thereof
GB8201246A GB2093048B (en) 1981-01-22 1982-01-18 Positive resist copolymer and method for manufacturing a pattern therewith
CA000394565A CA1211600A (en) 1981-01-22 1982-01-20 Positive resist and method for manufacturing a pattern thereof
FR8200936A FR2498198B1 (fr) 1981-01-22 1982-01-21 Revetement resistant positif et procede pour la formation d'un dessin de ce revetement sur un substrat
DE19823201815 DE3201815A1 (de) 1981-01-22 1982-01-21 Positives resistmaterial und verfahren zur herstellung eines musters daraus
NLAANVRAGE8200211,A NL186119C (nl) 1981-01-22 1982-01-21 Werkwijze voor het vormen van een patroon voor een positieve resist.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56139353A JPS5840827A (ja) 1981-09-04 1981-09-04 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS5840827A JPS5840827A (ja) 1983-03-09
JPH0157779B2 true JPH0157779B2 (show.php) 1989-12-07

Family

ID=15243345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56139353A Granted JPS5840827A (ja) 1981-01-22 1981-09-04 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS5840827A (show.php)

Also Published As

Publication number Publication date
JPS5840827A (ja) 1983-03-09

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