JPH0154854B2 - - Google Patents
Info
- Publication number
- JPH0154854B2 JPH0154854B2 JP60084106A JP8410685A JPH0154854B2 JP H0154854 B2 JPH0154854 B2 JP H0154854B2 JP 60084106 A JP60084106 A JP 60084106A JP 8410685 A JP8410685 A JP 8410685A JP H0154854 B2 JPH0154854 B2 JP H0154854B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- pattern
- stage
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 75
- 238000005286 illumination Methods 0.000 claims description 18
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 35
- 230000003287 optical effect Effects 0.000 description 15
- 235000012431 wafers Nutrition 0.000 description 15
- 239000004973 liquid crystal related substance Substances 0.000 description 10
- 238000012546 transfer Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60084106A JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60084106A JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61242021A JPS61242021A (ja) | 1986-10-28 |
JPH0154854B2 true JPH0154854B2 (ko) | 1989-11-21 |
Family
ID=13821266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60084106A Granted JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61242021A (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63175859A (ja) * | 1987-01-16 | 1988-07-20 | Ushio Inc | 液晶基板製作の露光方式 |
KR0184095B1 (ko) * | 1993-12-07 | 1999-04-15 | 사토 후미오 | 표시소자 및 그 제조방법 |
JP4508354B2 (ja) * | 2000-04-28 | 2010-07-21 | キヤノン株式会社 | 走査露光装置および走査露光方法 |
US20080055577A1 (en) * | 2006-08-30 | 2008-03-06 | Asml Netherlands B.V. | Lithographic apparatus and method |
JP5210052B2 (ja) * | 2008-06-02 | 2013-06-12 | ルネサスエレクトロニクス株式会社 | 半導体デバイスの製造方法 |
-
1985
- 1985-04-19 JP JP60084106A patent/JPS61242021A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61242021A (ja) | 1986-10-28 |
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