JPH0154852B2 - - Google Patents
Info
- Publication number
- JPH0154852B2 JPH0154852B2 JP56104998A JP10499881A JPH0154852B2 JP H0154852 B2 JPH0154852 B2 JP H0154852B2 JP 56104998 A JP56104998 A JP 56104998A JP 10499881 A JP10499881 A JP 10499881A JP H0154852 B2 JPH0154852 B2 JP H0154852B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- opening
- closing
- mounting shaft
- diffusion furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10499881A JPS587820A (ja) | 1981-07-07 | 1981-07-07 | 拡散炉におけるチユ−ブ入口開閉装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10499881A JPS587820A (ja) | 1981-07-07 | 1981-07-07 | 拡散炉におけるチユ−ブ入口開閉装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS587820A JPS587820A (ja) | 1983-01-17 |
JPH0154852B2 true JPH0154852B2 (enrdf_load_html_response) | 1989-11-21 |
Family
ID=14395761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10499881A Granted JPS587820A (ja) | 1981-07-07 | 1981-07-07 | 拡散炉におけるチユ−ブ入口開閉装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS587820A (enrdf_load_html_response) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60169660A (ja) * | 1984-02-14 | 1985-09-03 | Nippon Mining Co Ltd | デイ−ゼルエンジン燃料の燃焼性改良方法 |
JPH06105692B2 (ja) * | 1988-06-24 | 1994-12-21 | ソニー株式会社 | 熱処理装置 |
DE8902607U1 (de) * | 1989-03-04 | 1989-06-22 | Owis GmbH, 7813 Staufen | Vorrichtung an einer Oxidations- oder Diffusions-Ofenanlage |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57121246A (en) * | 1981-01-21 | 1982-07-28 | Hitachi Ltd | Semiconductor treating device |
JPS6311719Y2 (enrdf_load_html_response) * | 1981-03-09 | 1988-04-05 |
-
1981
- 1981-07-07 JP JP10499881A patent/JPS587820A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS587820A (ja) | 1983-01-17 |
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