JPH0145611B2 - - Google Patents

Info

Publication number
JPH0145611B2
JPH0145611B2 JP55163603A JP16360380A JPH0145611B2 JP H0145611 B2 JPH0145611 B2 JP H0145611B2 JP 55163603 A JP55163603 A JP 55163603A JP 16360380 A JP16360380 A JP 16360380A JP H0145611 B2 JPH0145611 B2 JP H0145611B2
Authority
JP
Japan
Prior art keywords
resist
molecular weight
pattern
sensitivity
resist layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55163603A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5786831A (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16360380A priority Critical patent/JPS5786831A/ja
Publication of JPS5786831A publication Critical patent/JPS5786831A/ja
Publication of JPH0145611B2 publication Critical patent/JPH0145611B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16360380A 1980-11-20 1980-11-20 Pattern forming material Granted JPS5786831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16360380A JPS5786831A (en) 1980-11-20 1980-11-20 Pattern forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16360380A JPS5786831A (en) 1980-11-20 1980-11-20 Pattern forming material

Publications (2)

Publication Number Publication Date
JPS5786831A JPS5786831A (en) 1982-05-31
JPH0145611B2 true JPH0145611B2 (enrdf_load_stackoverflow) 1989-10-04

Family

ID=15777058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16360380A Granted JPS5786831A (en) 1980-11-20 1980-11-20 Pattern forming material

Country Status (1)

Country Link
JP (1) JPS5786831A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097347A (ja) * 1983-11-01 1985-05-31 Hitachi Chem Co Ltd 画像形成性感光性組成物
CA2106231A1 (en) * 1993-09-15 1995-03-16 Sambasivan Venkat Eswaran Negative photoresist and a process therefor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1032392A (en) * 1973-10-23 1978-06-06 Eugene D. Feit High energy radiation curable resist and preparatory process
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
JPS6031004B2 (ja) * 1979-06-05 1985-07-19 パイオニア株式会社 ア−ムパイプ
JPS6248211A (ja) * 1985-08-27 1987-03-02 松下電工株式会社 コ−ドリ−ル

Also Published As

Publication number Publication date
JPS5786831A (en) 1982-05-31

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