JPS6349210B2 - - Google Patents

Info

Publication number
JPS6349210B2
JPS6349210B2 JP14854581A JP14854581A JPS6349210B2 JP S6349210 B2 JPS6349210 B2 JP S6349210B2 JP 14854581 A JP14854581 A JP 14854581A JP 14854581 A JP14854581 A JP 14854581A JP S6349210 B2 JPS6349210 B2 JP S6349210B2
Authority
JP
Japan
Prior art keywords
solution
resist
parts
phma
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14854581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5849942A (ja
Inventor
Kunio Hibino
Takakatsu Morimoto
Katsumi Ogawa
Shinichi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56148545A priority Critical patent/JPS5849942A/ja
Publication of JPS5849942A publication Critical patent/JPS5849942A/ja
Publication of JPS6349210B2 publication Critical patent/JPS6349210B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP56148545A 1981-09-18 1981-09-18 遠紫外線露光用レジスト材料 Granted JPS5849942A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56148545A JPS5849942A (ja) 1981-09-18 1981-09-18 遠紫外線露光用レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56148545A JPS5849942A (ja) 1981-09-18 1981-09-18 遠紫外線露光用レジスト材料

Publications (2)

Publication Number Publication Date
JPS5849942A JPS5849942A (ja) 1983-03-24
JPS6349210B2 true JPS6349210B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=15455156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56148545A Granted JPS5849942A (ja) 1981-09-18 1981-09-18 遠紫外線露光用レジスト材料

Country Status (1)

Country Link
JP (1) JPS5849942A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1679324B1 (en) 2003-09-30 2014-03-05 Mitsubishi Rayon Co., Ltd. Flowability improver for engineering plastics, thermoplastic resin compositions containing the same, and molded articles of the compositions
KR101443407B1 (ko) 2006-12-25 2014-09-24 미츠비시 레이온 가부시키가이샤 유동성 향상제, 방향족 폴리카보네이트계 수지 조성물, 및 그 성형품
US8642699B2 (en) 2008-03-11 2014-02-04 Mitsubishi Rayon Co., Ltd. Fluidity improver for aromatic polycarbonate resin, process for producing the fluidity improver for aromatic polycarbonate resin, aromatic polycarbonate resin composition, and molded product

Also Published As

Publication number Publication date
JPS5849942A (ja) 1983-03-24

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