JPH0353623B2 - - Google Patents

Info

Publication number
JPH0353623B2
JPH0353623B2 JP14759681A JP14759681A JPH0353623B2 JP H0353623 B2 JPH0353623 B2 JP H0353623B2 JP 14759681 A JP14759681 A JP 14759681A JP 14759681 A JP14759681 A JP 14759681A JP H0353623 B2 JPH0353623 B2 JP H0353623B2
Authority
JP
Japan
Prior art keywords
weight
parts
resist
solution
mipk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14759681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58134630A (ja
Inventor
Katsumi Ogawa
Kunio Hibino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14759681A priority Critical patent/JPS58134630A/ja
Publication of JPS58134630A publication Critical patent/JPS58134630A/ja
Publication of JPH0353623B2 publication Critical patent/JPH0353623B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14759681A 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料 Granted JPS58134630A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14759681A JPS58134630A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14759681A JPS58134630A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Publications (2)

Publication Number Publication Date
JPS58134630A JPS58134630A (ja) 1983-08-10
JPH0353623B2 true JPH0353623B2 (enrdf_load_stackoverflow) 1991-08-15

Family

ID=15433917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14759681A Granted JPS58134630A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Country Status (1)

Country Link
JP (1) JPS58134630A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS58134630A (ja) 1983-08-10

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