JPS5786831A - Pattern forming material - Google Patents
Pattern forming materialInfo
- Publication number
- JPS5786831A JPS5786831A JP16360380A JP16360380A JPS5786831A JP S5786831 A JPS5786831 A JP S5786831A JP 16360380 A JP16360380 A JP 16360380A JP 16360380 A JP16360380 A JP 16360380A JP S5786831 A JPS5786831 A JP S5786831A
- Authority
- JP
- Japan
- Prior art keywords
- average molecular
- resin
- superior
- resolution
- forming material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16360380A JPS5786831A (en) | 1980-11-20 | 1980-11-20 | Pattern forming material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16360380A JPS5786831A (en) | 1980-11-20 | 1980-11-20 | Pattern forming material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5786831A true JPS5786831A (en) | 1982-05-31 |
JPH0145611B2 JPH0145611B2 (ja) | 1989-10-04 |
Family
ID=15777058
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16360380A Granted JPS5786831A (en) | 1980-11-20 | 1980-11-20 | Pattern forming material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5786831A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6097347A (ja) * | 1983-11-01 | 1985-05-31 | Hitachi Chem Co Ltd | 画像形成性感光性組成物 |
EP0224911A2 (en) * | 1985-12-06 | 1987-06-10 | Toray Industries, Inc. | High-molecular-weight soluble novolak resin and process for preparation thereof |
FR2710762A1 (fr) * | 1993-09-15 | 1995-04-07 | Nat Res Dev | Agent photorésistant et procédé pour le préparer. |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5074427A (ja) * | 1973-10-23 | 1975-06-19 | ||
JPS54155826A (en) * | 1978-05-23 | 1979-12-08 | Western Electric Co | Method of producing radiation sensitive resist and product therefor |
JPS55163602A (en) * | 1979-06-05 | 1980-12-19 | Pioneer Electronic Corp | Arm pipe |
JPS6248211A (ja) * | 1985-08-27 | 1987-03-02 | 松下電工株式会社 | コ−ドリ−ル |
-
1980
- 1980-11-20 JP JP16360380A patent/JPS5786831A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5074427A (ja) * | 1973-10-23 | 1975-06-19 | ||
JPS54155826A (en) * | 1978-05-23 | 1979-12-08 | Western Electric Co | Method of producing radiation sensitive resist and product therefor |
JPS55163602A (en) * | 1979-06-05 | 1980-12-19 | Pioneer Electronic Corp | Arm pipe |
JPS6248211A (ja) * | 1985-08-27 | 1987-03-02 | 松下電工株式会社 | コ−ドリ−ル |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6097347A (ja) * | 1983-11-01 | 1985-05-31 | Hitachi Chem Co Ltd | 画像形成性感光性組成物 |
EP0224911A2 (en) * | 1985-12-06 | 1987-06-10 | Toray Industries, Inc. | High-molecular-weight soluble novolak resin and process for preparation thereof |
FR2710762A1 (fr) * | 1993-09-15 | 1995-04-07 | Nat Res Dev | Agent photorésistant et procédé pour le préparer. |
Also Published As
Publication number | Publication date |
---|---|
JPH0145611B2 (ja) | 1989-10-04 |
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