JPS5770530A - Resist material for forming fine pattern - Google Patents

Resist material for forming fine pattern

Info

Publication number
JPS5770530A
JPS5770530A JP14653680A JP14653680A JPS5770530A JP S5770530 A JPS5770530 A JP S5770530A JP 14653680 A JP14653680 A JP 14653680A JP 14653680 A JP14653680 A JP 14653680A JP S5770530 A JPS5770530 A JP S5770530A
Authority
JP
Japan
Prior art keywords
resist material
compound
contg
high molecular
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14653680A
Other languages
Japanese (ja)
Inventor
Hidekatsu Obara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP14653680A priority Critical patent/JPS5770530A/en
Publication of JPS5770530A publication Critical patent/JPS5770530A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Abstract

PURPOSE:To accurately obtain a fine pattern with electromagnetic waves having shorter wavelengths than the ultraviolet region by adding a high molecular compound contg. phenoxy or pnenyl groups and a bisazide compound in a specified amount to the amount of the high molecular compound. CONSTITUTION:A resist material contg. a condensate of phenol or a phenol deriv. such as novolak and formadehyde, a high molecular compound such as polyvinylphenol or a (co)polymer contg. phenyl groups such as polystyrene and 0.5-30wt% bisazide compound to the amount of the polymer as far ultraviolet sensitive components is prepared. the preferred bisazide compound is 3,3'-diazidodiphenylsulfone, 4,4'-diazidodiphenylsulfone or 3,3'-dichloro-4,4'-diazidodiphenylmethane. This resist material gives a fine resit pattern having high accuracy and superior dry etching resistance on a semiconductor substrate with far ultraviolet rays, electon beams or the like.
JP14653680A 1980-10-20 1980-10-20 Resist material for forming fine pattern Pending JPS5770530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14653680A JPS5770530A (en) 1980-10-20 1980-10-20 Resist material for forming fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14653680A JPS5770530A (en) 1980-10-20 1980-10-20 Resist material for forming fine pattern

Publications (1)

Publication Number Publication Date
JPS5770530A true JPS5770530A (en) 1982-05-01

Family

ID=15409861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14653680A Pending JPS5770530A (en) 1980-10-20 1980-10-20 Resist material for forming fine pattern

Country Status (1)

Country Link
JP (1) JPS5770530A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57160128A (en) * 1981-03-30 1982-10-02 Hitachi Ltd Fine pattern forming method
EP0083078A2 (en) * 1981-12-25 1983-07-06 Hitachi, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS5923341A (en) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd Resin composition
EP0135900A2 (en) * 1983-09-16 1985-04-03 Olin Hunt Specialty Products, Inc. Aqueous developable negative resist compositions
JPH0623992U (en) * 1992-04-21 1994-03-29 殖産住宅相互株式会社 Working equipment for building materials

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57160128A (en) * 1981-03-30 1982-10-02 Hitachi Ltd Fine pattern forming method
EP0083078A2 (en) * 1981-12-25 1983-07-06 Hitachi, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS5923341A (en) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd Resin composition
EP0135900A2 (en) * 1983-09-16 1985-04-03 Olin Hunt Specialty Products, Inc. Aqueous developable negative resist compositions
JPH0623992U (en) * 1992-04-21 1994-03-29 殖産住宅相互株式会社 Working equipment for building materials

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