JPH0145218B2 - - Google Patents
Info
- Publication number
- JPH0145218B2 JPH0145218B2 JP56021542A JP2154281A JPH0145218B2 JP H0145218 B2 JPH0145218 B2 JP H0145218B2 JP 56021542 A JP56021542 A JP 56021542A JP 2154281 A JP2154281 A JP 2154281A JP H0145218 B2 JPH0145218 B2 JP H0145218B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- stencil mask
- thickness
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 16
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 16
- 239000011229 interlayer Substances 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229910052745 lead Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 208000031481 Pathologic Constriction Diseases 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 229910020174 Pb-In Inorganic materials 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 208000037804 stenosis Diseases 0.000 description 1
- 230000036262 stenosis Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56021542A JPS57136321A (en) | 1981-02-18 | 1981-02-18 | Manufacture of resist stencil mask for lift-off |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56021542A JPS57136321A (en) | 1981-02-18 | 1981-02-18 | Manufacture of resist stencil mask for lift-off |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57136321A JPS57136321A (en) | 1982-08-23 |
| JPH0145218B2 true JPH0145218B2 (fr) | 1989-10-03 |
Family
ID=12057860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56021542A Granted JPS57136321A (en) | 1981-02-18 | 1981-02-18 | Manufacture of resist stencil mask for lift-off |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57136321A (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60130183A (ja) * | 1983-12-19 | 1985-07-11 | Agency Of Ind Science & Technol | ジヨセフソン集積回路作製用レジストステンシルマスク |
| JPH0294807A (ja) * | 1988-09-30 | 1990-04-05 | Mitsubishi Mining & Cement Co Ltd | 弾性表面波装置の製法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5158072A (ja) * | 1974-11-18 | 1976-05-21 | Matsushita Electric Ind Co Ltd | Handotaisochinoseizohoho |
| JPS5330799A (en) * | 1976-09-01 | 1978-03-23 | Fujitsu Ltd | Resist exposure |
-
1981
- 1981-02-18 JP JP56021542A patent/JPS57136321A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5158072A (ja) * | 1974-11-18 | 1976-05-21 | Matsushita Electric Ind Co Ltd | Handotaisochinoseizohoho |
| JPS5330799A (en) * | 1976-09-01 | 1978-03-23 | Fujitsu Ltd | Resist exposure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57136321A (en) | 1982-08-23 |
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