JPH0143720B2 - - Google Patents
Info
- Publication number
- JPH0143720B2 JPH0143720B2 JP59138569A JP13856984A JPH0143720B2 JP H0143720 B2 JPH0143720 B2 JP H0143720B2 JP 59138569 A JP59138569 A JP 59138569A JP 13856984 A JP13856984 A JP 13856984A JP H0143720 B2 JPH0143720 B2 JP H0143720B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- film
- sapphire substrate
- silicon carbide
- crystal film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59138569A JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59138569A JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6117497A JPS6117497A (ja) | 1986-01-25 |
JPH0143720B2 true JPH0143720B2 (enrdf_load_stackoverflow) | 1989-09-22 |
Family
ID=15225197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59138569A Granted JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6117497A (enrdf_load_stackoverflow) |
-
1984
- 1984-07-04 JP JP59138569A patent/JPS6117497A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6117497A (ja) | 1986-01-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS58130517A (ja) | 単結晶薄膜の製造方法 | |
US6274403B1 (en) | Process for producing heteropitaxial diamond layers on Si-substrates | |
Hu et al. | Effects of hydrogen surface pretreatment of silicon dioxide on the nucleation and surface roughness of polycrystalline silicon films prepared by rapid thermal chemical vapor deposition | |
JPH0556851B2 (enrdf_load_stackoverflow) | ||
JPH04174517A (ja) | ダイヤモンド半導体の製造方法 | |
JPH0143720B2 (enrdf_load_stackoverflow) | ||
JPS5840820A (ja) | シリコン単結晶膜形成法 | |
JPS6126501B2 (enrdf_load_stackoverflow) | ||
JPH082999A (ja) | 窒化アルミニウム薄膜製造法 | |
JP3157280B2 (ja) | 半導体装置の製造方法 | |
US20240417883A1 (en) | Underlying substrate, single crystal diamond laminate substrate, and manufacturing method thereof | |
JPH0645257A (ja) | 半導体薄膜形成方法 | |
JP3215674B2 (ja) | イオンビームを用いた酸化物基板の表面前処理方法及びそれを利用した窒化物薄膜形成方法 | |
JPH0637355B2 (ja) | 炭化珪素単結晶膜の製造方法 | |
JP2001244199A (ja) | ベータ鉄シリサイドの成膜方法 | |
JP2881929B2 (ja) | アルミナ膜の製造方法 | |
JPS5893228A (ja) | 半導体単結晶薄膜の製造方法 | |
JPH01145806A (ja) | 有機金属気相成長装置 | |
JP3183939B2 (ja) | 酸化亜鉛単結晶薄膜の製造方法 | |
JP2566488B2 (ja) | 薄膜製造方法 | |
JPH01238111A (ja) | シリコンカーバイド半導体膜の製造方法 | |
JPH02191319A (ja) | Soi構造の形成方法 | |
JPH05255859A (ja) | 薄膜形成装置 | |
CN119506825A (zh) | 一种单晶衬底制备工艺和金刚石形核工艺 | |
CN111048404A (zh) | 一种缓冲层结构及其制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |