JPH0143452B2 - - Google Patents

Info

Publication number
JPH0143452B2
JPH0143452B2 JP9428881A JP9428881A JPH0143452B2 JP H0143452 B2 JPH0143452 B2 JP H0143452B2 JP 9428881 A JP9428881 A JP 9428881A JP 9428881 A JP9428881 A JP 9428881A JP H0143452 B2 JPH0143452 B2 JP H0143452B2
Authority
JP
Japan
Prior art keywords
developer
substrate
developed
supply device
constant temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9428881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57208134A (en
Inventor
Mikio Suetake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9428881A priority Critical patent/JPS57208134A/ja
Publication of JPS57208134A publication Critical patent/JPS57208134A/ja
Publication of JPH0143452B2 publication Critical patent/JPH0143452B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9428881A 1981-06-18 1981-06-18 Resist developing apparatus Granted JPS57208134A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9428881A JPS57208134A (en) 1981-06-18 1981-06-18 Resist developing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9428881A JPS57208134A (en) 1981-06-18 1981-06-18 Resist developing apparatus

Publications (2)

Publication Number Publication Date
JPS57208134A JPS57208134A (en) 1982-12-21
JPH0143452B2 true JPH0143452B2 (cs) 1989-09-20

Family

ID=14106067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9428881A Granted JPS57208134A (en) 1981-06-18 1981-06-18 Resist developing apparatus

Country Status (1)

Country Link
JP (1) JPS57208134A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10382920B2 (en) 2013-10-23 2019-08-13 Sprint Communications Company L.P. Delivery of branding content and customizations to a mobile communication device
US10506398B2 (en) 2013-10-23 2019-12-10 Sprint Communications Company Lp. Implementation of remotely hosted branding content and customizations

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59132620A (ja) * 1983-01-20 1984-07-30 Seiko Instr & Electronics Ltd 半導体ウエハ現像装置
US6265323B1 (en) 1998-02-23 2001-07-24 Kabushiki Kaisha Toshiba Substrate processing method and apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10382920B2 (en) 2013-10-23 2019-08-13 Sprint Communications Company L.P. Delivery of branding content and customizations to a mobile communication device
US10506398B2 (en) 2013-10-23 2019-12-10 Sprint Communications Company Lp. Implementation of remotely hosted branding content and customizations

Also Published As

Publication number Publication date
JPS57208134A (en) 1982-12-21

Similar Documents

Publication Publication Date Title
JPH0669019B2 (ja) 半導体製造装置
JPH0243386A (ja) 液体による処理装置
US5464478A (en) Method of rubbing an orientation controlling film of a liquid crystal display in deionized water
JPH0143452B2 (cs)
WO2023109470A1 (zh) 一种光刻胶掩模的显影方法、装置、系统及储存介质
US6010255A (en) Acoustic wave enhanced developer
JPS61125017A (ja) 塗布装置
JPH0428299B2 (cs)
JPH0391232A (ja) 現像装置
JPS6334620B2 (cs)
JPS6360897B2 (cs)
US4772345A (en) Method and apparatus for manufacturing phosphor screen
KR100713398B1 (ko) 음파를 이용한 반도체 웨이퍼의 현상장치
JPS5941300B2 (ja) 現像処理装置
JPH0314221A (ja) 半導体用現像装置
JP4080061B2 (ja) Ｃｂｄ成膜装置
JPH11109648A (ja) レジスト層を現像する方法及び装置
JPH01122125A (ja) 半導体基板の湿式処理法及びその装置
JP2911152B2 (ja) 現像装置および現像方法
JPH03211819A (ja) ホトレジスト供給装置
JPH03278060A (ja) 超音波による処理液の揺動方法
JPS61104621A (ja) ポジレジスト現像装置
JPH05315237A (ja) 半導体装置の製造方法
JPH03212930A (ja) レジスト現像装置
JPH0327038B2 (cs)